Joseph P Griffiths

US Patent:

6972268, Dec 6, 2005

Filed:

Mar 27, 2002

Appl. No.:

10/108101

Inventors:

Jonathan S. Ehrmann - Sudbury MA, US
Joseph J. Griffiths - Winthrop MA, US
Donald V. Smart - Boston MA, US
Donald J. Svetkoff - Ann Arbor MI, US

Assignee:

GSI Lumonics Corporation - Billerica MA

International Classification:

H01L021/26
A61N005/00
G21G005/00

US Classification:

438795, 2504922, 25049223

Abstract:

A method and system for locally processing a predetermined microstructure formed on a substrate without causing undesirable changes in electrical or physical characteristics of the substrate or other structures formed on the substrate are provided. The method includes providing information based on a model of laser pulse interactions with the predetermined microstructure, the substrate and the other structures. At least one characteristic of at least one pulse is determined based on the information. A pulsed laser beam is generated including the at least one pulse. The method further includes irradiating the at least one pulse having the at least one determined characteristic into a spot on the predetermined microstructure. The at least one determined characteristic and other characteristics of the at least one pulse are sufficient to locally process the predetermined microstructure without causing the undesirable changes.

US Patent:

7027155, Apr 11, 2006

Filed:

Mar 27, 2002

Appl. No.:

10/107702

Inventors:

James J. Cordingley - Littleton MA, US
Joseph J. Griffiths - Winthrop MA, US
Donald V. Smart - Boston MA, US

Assignee:

GSI Lumonics Corporation - Billerica MA

International Classification:

G01B 11/26

US Classification:

356401, 356121, 21912178

Abstract:

A method and system for locally processing a predetermined microstructure formed on a substrate without causing undesirable changes in electrical or physical characteristics of the substrate or other structures formed on the substrate are provided. The method includes providing information based on a model of laser pulse interactions with the predetermined microstructure, the substrate and the other structures. At least one characteristic of at least one pulse is determined based on the information. A pulsed laser beam is generated including the at least one pulse. The method further includes irradiating the at least one pulse having the at least one determined characteristic into a spot on the predetermined microstructure. The at least one determined characteristic and other characteristics of the at least one pulse are sufficient to locally process the predetermined microstructure without causing the undesirable changes.

US Patent:

7192846, Mar 20, 2007

Filed:

May 9, 2005

Appl. No.:

11/125367

Inventors:

James J. Cordingley - Littleton MA, US
Roger D. Dowd - Natick MA, US
Jonathan S. Ehrmann - Sudbury MA, US
Joseph J. Griffiths - Winthrop MA, US
Joohan Lee - Andover MA, US
Donald V. Smart - Boston MA, US
Donald J. Svetkoff - Ann Arbor MI, US

Assignee:

GSI Group Corporation - Billerica MA

International Classification:

H01L 21/00
H01L 21/46

US Classification:

438463, 438 13, 21912167, 21912168, 372 10, 257E21596

Abstract:

A method and system for locally processing a predetermined microstructure formed on a substrate without causing undesirable changes in electrical or physical characteristics of the substrate or other structures formed on the substrate are provided. The method includes providing information based on a model of laser pulse interactions with the predetermined microstructure, the substrate and the other structures. At least one characteristic of at least one pulse is determined based on the information. A pulsed laser beam is generated including the at least one pulse. The method further includes irradiating the at least one pulse having the at least one determined characteristic into a spot on the predetermined microstructure. The at least one determined characteristic and other characteristics of the at least one pulse are sufficient to locally process the predetermined microstructure without causing the undesirable changes.

US Patent:

7394476, Jul 1, 2008

Filed:

May 2, 2006

Appl. No.:

11/415547

Inventors:

James J. Cordingley - Littleton MA, US
Jonathan S. Ehrmann - Sudbury MA, US
Joseph J. Griffiths - Winthrop MA, US
Shepard D. Johnson - Andover MA, US
Joohan Lee - Andover MA, US
Donald V. Smart - Boston MA, US
Donald J. Svetkoff - Ann Arbor MI, US

Assignee:

GSI Group Corporation - Billerica MA

International Classification:

B41J 2/435
B23K 26/00

US Classification:

347224, 2191216

Abstract:

A method and system for locally processing a predetermined microstructure formed on a substrate without causing undesirable changes in electrical or physical characteristics of the substrate or other structures formed on the substrate are provided. The method includes providing information based on a model of laser pulse interactions with the predetermined microstructure, the substrate and the other structures. At least one characteristic of at least one pulse is determined based on the information. A pulsed laser beam is generated including the at least one pulse. The method further includes irradiating the at least one pulse having the at least one determined characteristic into a spot on the predetermined microstructure. The at least one determined characteristic and other characteristics of the at least one pulse are sufficient to locally process the predetermined microstructure without causing the undesirable changes.

US Patent:

8106329, Jan 31, 2012

Filed:

May 15, 2008

Appl. No.:

12/121684

Inventors:

Bo Gu - North Andover MA, US
Joseph J. Griffiths - Winthrop MA, US
Joohan Lee - Andover MA, US

Assignee:

GSI Group Corporation - Bedford MA

International Classification:

H01L 21/268
G02F 1/01

US Classification:

21912161, 21912169, 438132

Abstract:

A laser system for processing conductive link structures includes a seed laser generating a seed laser beam. The seed laser is sliced by a modulator into a user configurable series of pulses and the pulses are optically amplified and applied to a conductive link structure. Preferably, the bandwidth of the seed laser is less than 1 nm with an IR center frequency, and the frequency of the laser light of the pulses is doubled or quadrupled prior to application to the conductive structure. Preferably, the pulses are about 1-18 second pulsewidth and are separated by 100-400 ns.

US Patent:

8193468, Jun 5, 2012

Filed:

Oct 11, 2005

Appl. No.:

11/247541

Inventors:

James J. Cordingley - Littleton MA, US
Joseph J. Griffiths - Winthrop MA, US
Donald V. Smart - Boston MA, US

Assignee:

GSI Group Corporation - Bedford MA

International Classification:

B23K 26/00

US Classification:

21912169, 21912168, 21912185

Abstract:

A method and system for locally processing a predetermined microstructure formed on a substrate without causing undesirable changes in electrical or physical characteristics of the substrate or other structures formed on the substrate are provided. The method includes providing information based on a model of laser pulse interactions with the predetermined microstructure, the substrate and the other structures. At least one characteristic of at least one pulse is determined based on the information. A pulsed laser beam is generated including the at least one pulse. The method further includes irradiating the at least one pulse having the at least one determined characteristic into a spot on the predetermined microstructure. The at least one determined characteristic and other characteristics of the at least one pulse are sufficient to locally process the predetermined microstructure without causing the undesirable changes.

US Patent:

8269137, Sep 18, 2012

Filed:

Sep 18, 2008

Appl. No.:

12/233476

Inventors:

Jonathan S. Ehrmann - Sudbury MA, US
Joseph J. Griffiths - Winthrop MA, US
James J. Cordingley - Littleton MA, US
Donald J. Svetkoff - Ann Arbor MI, US
Shepard D. Johnson - Andover MA, US
Michael Plotkin - Newton MA, US

Assignee:

GSI Group Corporation - Bedford MA

International Classification:

B23K 26/36

US Classification:

21912169, 438132, 29847

Abstract:

The present invention relates to the field of laser processing methods and systems, and specifically, to laser processing methods and systems for laser processing multi-material devices. Systems and methods may utilize high speed deflectors to improve processing energy window and/or improve processing speed. In some embodiments, a deflector is used for non-orthogonal scanning of beam spots. In some embodiment, a deflector is used to implement non-synchronous processing of target structures.

US Patent:

20060216927, Sep 28, 2006

Filed:

May 26, 2006

Appl. No.:

11/441763

Inventors:

James Cordingley - Littleton MA, US
Jonathan Ehrmann - Sudbury MA, US
Joseph Griffiths - Winthrop MA, US
Joohan Lee - Andover MA, US
Donald Smart - Boston MA, US
Donald Svetkoff - Ann Arbor MI, US

Assignee:

GSI Lumonics Corporation - Billerica MA

International Classification:

H01L 21/4763
H01L 21/302
H01L 21/461

US Classification:

438629000, 438690000

Abstract:

A method and system for locally processing a predetermined microstructure formed on a substrate without causing undesirable changes in electrical or physical characteristics of the substrate or other structures formed on the substrate are provided. The method includes providing information based on a model of laser pulse interactions with the predetermined microstructure, the substrate and the other structures. At least one characteristic of at least one pulse is determined based on the information. A pulsed laser beam is generated including the at least one pulse. The method further includes irradiating the at least one pulse having the at least one determined characteristic into a spot on the predetermined microstructure. The at least one determined characteristic and other characteristics of the at least one pulse are sufficient to locally process the predetermined microstructure without causing the undesirable changes.