Joseph L Laganza

US Patent:

6822731, Nov 23, 2004

Filed:

Jun 18, 2003

Appl. No.:

10/464840

Inventors:

Joseph Laganza - Norwalk CT
Jorge Ivaldi - Trumbull CT

Assignee:

ASML Holding N.V. - Veldhoven

International Classification:

G03B 2762

US Classification:

355 75, 355 53, 355 72

Abstract:

A method and apparatus for maintaining an optical gap between optical structures in a photolithography system is described. A frame defines first and second opposing surfaces. The first opposing surface defines a first opening and the second opposing surface defines a second opening. A plurality of spacing members are spaced apart on the first opposing surface around the first opening. The spacing members have substantially co-planar surfaces configured to mate with a surface of a first optical structure. A bonding agent seals a space around the first opening between the first opposing surface and the first optical structure. The frame thereby encloses the optical gap between the first optical structure and a second optical structure.

US Patent:

6847434, Jan 25, 2005

Filed:

Dec 9, 2002

Appl. No.:

10/314419

Inventors:

Joseph Laganza - Norwalk CT, US
Jorge Ivaldi - Trumbull CT, US
Florence Luo - Valley Cottage NY, US

Assignee:

ASML Holding N.V. - Veldhoven

International Classification:

G03B 2762
G03B 2752
G03B 2742
G03F 900

US Classification:

355 75, 355 30, 355 53, 430 5

Abstract:

A method and apparatus for maintaining a purged optical gap between a pellicle and a reticle in a photolithography system. A frame between a reticle and a pellicle maintains the purged optical gap. The frame defines first and second opposing surfaces. The first opposing surface defines a first opening, and is configured to mate with the pellicle. The second opposing surface defines a second opening, and is configured to mate with the reticle to enclose the optical gap between the pellicle and the reticle. At least one edge of the frame has an opening therethrough. A porous sintered material fills each opening through an edge of the frame.

US Patent:

7004715, Feb 28, 2006

Filed:

Jan 9, 2002

Appl. No.:

10/040375

Inventors:

Glenn M. Friedman - Redding CT, US
Peter Kochersperger - Easton CT, US
Joseph Laganza - East Norwalk CT, US

Assignee:

ASML Holding N.V. - Veldhoven

International Classification:

B66C 1/00

US Classification:

414737, 294 11, 901 30

Abstract:

An apparatus and method of transferring and loading a reticle onto a receiving station (for example, a reticle exposure stage). The reticle is first retrieved from a storage facility with an end effector having an reticle plate coupled to a mounting plate. The mounting plate connects the end effector to a robotic arm. The reticle is aligned in an out-of-plane position in an off-line alignment station. The alignment is in compliance with the alignment requirement at the receiving station. The reticle is mounted onto the reticle plate after undergoing the alignment at the off-line alignment station. The reticle is then transferred from the off-line alignment station to the receiving station while maintaining the previous alignment at the off-line alignment station. The apparatus further provides rigidity of the mounted reticle to ensure compliance with the alignment requirement at the receiving station.

US Patent:

7136152, Nov 14, 2006

Filed:

Nov 23, 2004

Appl. No.:

10/995077

Inventors:

Richard Joseph Bruls - Eindhoven, NL
Joseph L. Laganza - East Norwalk CT, US
Tammo Uitterdijk - De Bilt, NL
Herman Boom - Eindhoven, NL

Assignee:

ASML Netherlands B.V. - Veldhoven
ASML Holding N.V. - Veldhoven

International Classification:

G03B 27/62
G03B 27/42
G03F 9/00
B31B 1/60

US Classification:

355 75, 355 53, 430 5, 156 60

Abstract:

A method is provided to reduce differences between the way in which reticle chucking forces and gravity force act upon the reticle during use and during assembly of the pellicle, and to combine this with a similar reduction concerning pellicle chucking forces and gravity force acting upon the pellicle during bonding to the reticle and during quality control of the pellicle. The shape of the pellicle is measured for control in the same orientation of the pellicle with respect to gravity force as during use of the pellicle, and during bonding the pellicle and the reticle are held in the same way and in the same orientation as during control of the pellicle and use of the reticle in the lithographic apparatus, respectively.

US Patent:

7173689, Feb 6, 2007

Filed:

Nov 12, 2004

Appl. No.:

10/986077

Inventors:

Joseph Laganza - Norwalk CT, US
Jorge Ivaldi - Trumbull CT, US

Assignee:

ASML Holding N.V. - Veldhoven

International Classification:

G03B 27/32
G03B 27/58
G03B 27/62

US Classification:

355 77, 355 72, 355 75

Abstract:

A method and apparatus for maintaining an optical gap between optical structures in a photolithography system is described. A frame defines first and second opposing surfaces. The first opposing surface defines a first opening and the second opposing surface defines a second opening. A plurality of spacing members are spaced apart on the first opposing surface around the first opening. The spacing members have substantially co-planar surfaces configured to mate with a surface of a first optical structure. A bonding agent seals a space around the first opening between the first opposing surface and the first optical structure. The frame thereby encloses the optical gap between the first optical structure and a second optical structure.

US Patent:

7278817, Oct 9, 2007

Filed:

Jan 24, 2006

Appl. No.:

11/337439

Inventors:

Glenn M. Friedman - Redding CT, US
Peter Kochersperger - Easton CT, US
Joseph Laganza - East Norwalk CT, US

Assignee:

ASML Holding N.V.

International Classification:

B66C 1/00

US Classification:

414806, 294 11, 414737, 901 30

Abstract:

An apparatus and method of transferring and loading a reticle onto a receiving station (for example, a reticle exposure stage). The reticle is first retrieved from a storage facility with an end effector having a reticle plate coupled to a mounting plate. The mounting plate connects the end effector to a robotic arm. The reticle is aligned in an out-of-plane position in an off-line alignment station. The alignment is in compliance with the alignment requirement at the receiving station. The reticle is mounted onto the reticle plate after undergoing the alignment at the off-line alignment station. The reticle is then transferred from the off-line alignment station to the receiving station while maintaining the previous alignment at the off-line alignment station. The apparatus further provides rigidity of the mounted reticle to ensure compliance with the alignment requirement at the receiving station.

US Patent:

7339653, Mar 4, 2008

Filed:

Feb 6, 2007

Appl. No.:

11/671647

Inventors:

Joseph Laganza - Norwalk CT, US
Jorge Ivaldi - Trumball CT, US

Assignee:

ASML Holding N.V. - Veldhoven

International Classification:

G03B 27/62
G03B 27/32
G03B 27/58

US Classification:

355 75, 355 72, 355 77

Abstract:

A method and apparatus for maintaining an optical gap between optical structures in a photolithography system is described. A frame defines first and second opposing surfaces. The first opposing surface defines a first opening and the second opposing surface defines a second opening. A plurality of spacing members are spaced apart on the first opposing surface around the first opening. The spacing members have substantially co-planar surfaces configured to mate with a surface of a first optical structure. A bonding agent seals a space around the first opening between the first opposing surface and the first optical structure. The frame thereby encloses the optical gap between the first optical structure and a second optical structure.

US Patent:

20050151955, Jul 14, 2005

Filed:

Jan 13, 2005

Appl. No.:

11/034053

Inventors:

Joseph Laganza - Norwalk CT, US
Jorge Ivaldi - Trumbull CT, US
Florence Luo - Valley Cottage NY, US

Assignee:

ASML Holding N.V. - LA Veldhoven

International Classification:

G03B027/62

US Classification:

355075000

Abstract:

A method and apparatus for maintaining a purged optical gap between a pellicle and a reticle in a photolithography system. A frame between a reticle and a pellicle maintains the purged optical gap. The frame defines first and second opposing surfaces. The first opposing surface defines a first opening, and is configured to mate with the pellicle. The second opposing surface defines a second opening, and is configured to mate with the reticle to enclose the optical gap between the pellicle and the reticle. At least one edge of the frame has an opening therethrough. A porous sintered material fills each opening through an edge of the frame.