Hari Hariharan - Pewaukee WI, US Joseph D. Schaefer - Waukesha WI, US
Assignee:
General Electric Company - Schenectady NY
International Classification:
G01V 3/00
US Classification:
324307
Abstract:
A method and apparatus for RF deposition prediction model refinement measures an RF parameter during a scan and refines the RF deposition prediction model by a correction factor based on the measured RF parameter.