Short sales Residential sales Luxury homes First time home buyers Co-op
Work:
THE BOUKLIS GROUP New York, NY 6465095015 (Phone) License #10401254323
Client type:
Home Sellers Renters
Property type:
Condo/Townhome Residential Rental Co-op
About:
As a resident of New York City for more than 13 years, I have gained a personal familiarity with the varying pace and frequently changing nature of the New York City housing market. My own experience allows me to have a keen focus on the specific requirements and desires of clients from all walks of life who are in need of realtor services.I spent many years working in the high end service industry, running upscale New York City eateries/Lounges and consulting with teams aiming at improving service in their establishments. My work in that field reinforced my own natural tendency to provide the highest level of service and personal courtesy to all. Above all else, as a realtor, I aim to provide clients with solutions to their unique real estate requirements and to open up the world of luxury rentals and sales to any who are seeking an upgraded or updated residence, or the perfect buyer for their current home.As New Yorkers, we know that dealing with the daily grind and challenges of the city surroundings means that it is so important to feel comfortable and content in our homes. We should all feel like a king or queen in our very own castle. ~Not only the rich get to live in luxury~
In a method for determining an endpoint in a chemical mechanical planarization (CMP) operation, the concentration of an oxidizing agent in the slurry byproduct generated during the CMP operation is monitored. The endpoint of the CMP operation is determined based on the concentration of the oxidizing agent in the slurry byproduct. The concentration of the oxidizing agent in the slurry byproduct may be monitored by diverting the slurry byproduct from a surface of a polishing pad, and measuring an optical property of the slurry byproduct diverted from the surface of the polishing pad. A CMP system configured to implement the method for determining an endpoint also is described.
Chemical Mechanical Planarization (Cmp) System And Method For Determining An Endpoint In A Cmp Operation
In a method for determining an endpoint in a chemical mechanical planarization (CMP) operation, the concentration of an oxidizing agent in the slurry byproduct generated during the CMP operation is monitored. The endpoint of the CMP operation is determined based on the concentration of the oxidizing agent in the slurry byproduct. The concentration of the oxidizing agent in the slurry byproduct may be monitored by diverting the slurry byproduct from a surface of a polishing pad, and measuring an optical property of the slurry byproduct diverted from the surface of the polishing pad. A CMP system configured to implement the method for determining an endpoint also is described.
Xuyen Pham - Fremont CA, US Tuan Nguyen - San Jose CA, US Ren Zhou - Fremont CA, US David Wei - Fremont CA, US Linda Jiang - Milpitas CA, US Joseph P. Simon - Newark CA, US Tony Luong - San Jose CA, US Sridharan Srivatsan - Sunnyvale CA, US Anjun Jerry Jin - Milpitas CA, US
Assignee:
Lam Research Corporation - Fremont CA
International Classification:
B24B049/00
US Classification:
451 7, 451 8, 451 53
Abstract:
A temperature controlling system for use in a chemical mechanical planarization (CMP) system having a linear polishing belt, a carrier capable of applying a substrate over a preparation location over the linear polishing belt is provided. The temperature controlling system includes a platen having a plurality of zones. The temperature controlling system further includes a temperature sensor configured determine a temperature of the linear polishing belt at a location that is after the preparation location. The system also includes a controller for adjusting a flow of temperature conditioned fluid to selected zones of the plurality of zones of the platen in response to output received from the temperature sensor.