Joshua T Cook

US Patent:

6408849, Jun 25, 2002

Filed:

Jun 18, 1999

Appl. No.:

09/336060

Inventors:

Jeffrey J. Spiegelman - La Jolla CA
Daniel Alvarez, Jr. - San Diego CA
Peter K. Shogren - San Diego CA
Joshua T. Cook - San Diego CA

Assignee:

Aeronex, Inc. - San Diego CA

International Classification:

A62B 2302

US Classification:

12820527, 12820512, 12820528, 128898

Abstract:

A method is disclosed for providing a pure gas for use medical procedures in which the gas is contaminated with other gases during the procedure, and then separating the contaminants and recovering and reusing the decontaminated gas. The method is most advantageously used in medical imaging processes, such as magnetic resonance image (MRI), where hyperpolarized image enhancing noble gases, notably He or Xe , are used for image enhancement in brain and lung imaging, and in which the contaminants are normally the exhalant gases from the imaged patient. The contaminated gas is passed through a series of drying and purification steps to remove the exhalant gases and separate the gas. The purified gas is then recovered and stored for reuse. This system prevents the loss of significant amounts of the image enhancing gases, which is important since key gases such as He and Xe are rare and expensive, and (especially He ) permanently lost once vented. Recovery of medical process gases such as those including isotopes of carbon, fluorine or phosphorus is also contemplated.

US Patent:

6638341, Oct 28, 2003

Filed:

Jun 14, 2002

Appl. No.:

10/173335

Inventors:

Jeffrey J. Spiegelman - San Diego CA
Daniel Alvarez, Jr. - San Diego CA
Joshua T. Cook - San Diego CA

Assignee:

Aeronex, Inc. - San Diego CA

International Classification:

B01D 5304

US Classification:

95104, 95128, 95148

Abstract:

A method is described for rapid and economical activation and/or preconditioning of gas purification substrates by providing forced convection of the preconditioning or activating gas through the pores of the substrate. The gas is pumped into the substrate-containing vessel and raised to an elevated pressure, which is maintained for a short predetermined time, followed by venting of contents of the vessel. The vessel is again pressurized with the purging gas to an elevated level, and the elevated pressure is maintained for a short predetermined time, followed by venting of the vessel. This cycle is repeated as often as needed or desired. Activation and/or preconditioning can be accomplished in a much shorter time and with much less gas usage compared to diffusion preconditioning and activation processes. This process is particularly suited for preconditioning and activation of gas purifier substrates for decontamination of gases down to 1 ppm contaminants.

US Patent:

6869463, Mar 22, 2005

Filed:

Oct 23, 2003

Appl. No.:

10/692019

Inventors:

Jeffrey J. Spiegelman - San Diego CA, US
Daniel Alvarez, Jr. - San Diego CA, US
Joshua T. Cook - San Diego CA, US

Assignee:

Mykrolis Corporation - Billerica MA

International Classification:

B01D053/04

US Classification:

95104, 95128, 95148

Abstract:

A method is described for rapid and economical activation and/or preconditioning of gas purification substrates by providing forced convection of the preconditioning or activating gas through the pores of the substrate. The gas is pumped into the substrate-containing vessel and raised to an elevated pressure, which is maintained for a short predetermined time, followed by venting of contents of the vessel. The vessel is again pressurized with the purging gas to an elevated level, and the elevated pressure is maintained for a short predetermined time, followed by venting of the vessel. This cycle is repeated as often as needed or desired. Activation and/or preconditioning can be accomplished in a much shorter time and with much less gas usage compared to diffusion preconditioning and activation processes. This process is particularly suited for preconditioning and activation of gas purifier substrates for decontamination of gases down to ≦1 ppm contaminants.

US Patent:

7510692, Mar 31, 2009

Filed:

Jul 21, 2004

Appl. No.:

10/565353

Inventors:

Daniel Alvarez, Jr. - San Diego CA, US
Jeffrey J. Spiegelman - San Diego CA, US
Joshua T. Cook - Encinitas CA, US
Tram Doan Nguyen - Westminster CA, US
Daniel A. Lev - Somerville MA, US
Troy B. Scoggins - San Diego CA, US

Assignee:

Entegris, Inc. - Chaska MN

International Classification:

B01D 53/38
B01D 53/50
B01D 53/56
B01D 53/62
B01D 53/72
C09K 3/00

US Classification:

423210, 423220, 423230, 423219, 4232451, 4232391, 4232421, 42324401, 42324406, 25218211, 25218232, 25218233

Abstract:

A method for hydride gas purification uses materials having at least one lanthanide metal or lanthanide metal oxide. The method reduces contaminants to less than 100 parts per billion (ppb), preferably 10 ppb, more preferably 1 ppb. The material can also include transition metals and transition metal oxides, rare earth elements and other metal oxides. The invention also includes materials for use in the method of the invention.

US Patent:

20050229947, Oct 20, 2005

Filed:

Jan 13, 2005

Appl. No.:

11/036585

Inventors:

Jeffrey Spiegelman - San Diego CA, US
Daniel Alvarez - San Diego CA, US
Joshua Cook - Encinitas CA, US

Assignee:

Mykrolis Corporation - Billerica MA

International Classification:

H01L021/44

US Classification:

134002000, 134010000

Abstract:

Methods of inserting and removing species from substrates utilizing pressure-vent cycling are revealed in embodiments of the invention. Various embodiments introduce a fluid to a vessel containing the substrate while setting pressure at an elevated level. The pressure is maintained at the elevated level for a predetermined period of time, the lowered by removing fluid from the vessel. The steps of introducing fluid, maintaining pressure, and lowering pressure are repeated at least once. Embodiments of the invention may allow a species to be removed from the voids of a substrate, or allow a new species to be inserted into the voids. Particular embodiments also have special application to preconditioning, activating, and/or regenerating gas purification substrates, or removing and/or delivering species with respect to semiconductor substrates. Embodiments of the invention allow faster transport of species to and from substrates with less use of purging or filling fluids.

US Patent:

6361696, Mar 26, 2002

Filed:

Jan 19, 2000

Appl. No.:

09/487637

Inventors:

Jeffrey J. Spiegelman - La Jolla CA
Daniel Alvarez, Jr. - San Diego CA
Peter K. Shogren - San Diego CA
Joshua T. Cook - San Diego CA

Assignee:

Aeronex, Inc. - San Diego CA

International Classification:

B01D 1504

US Classification:

210662, 95 8, 95143, 210677, 210690

Abstract:

A method for the decontamination of fluid (liquid or supercritical) carbon dioxide fluid, especially of hydrocarbon contaminants, down to 100 ppb concentration are described. The critical component is a high silica zeolite, preferably a high silica Y-type zeolite, ZSM-5 or a high silica mordenite, which in a variety of physical forms is capable of decontaminating such fluid CO to 100 ppb, 10-50 ppb, or Ë1 ppb, without being detrimentally affected by the supercritical operating environment. The high silica zeolite may be produced by the removal of alumina from a natural or synthetic zeolite while retaining the desirable zeolite structure, to a silica:alumina ratio of from 20-2000:1. Preferably the zeolite is disposed in separate quantities in at least two vessels, which operate alternately. A portion of the purified product from the operating vessel is directed to the other vessel and there used to remove accumulated contaminants from that vessels zeolite. The process thus provides self-regeneration, in that regeneration of one vessel occurs while the other vessel decontaminates contaminated fluid carbon dioxide, so that use of the two can be alternated for substantially continual production of purified fluid carbon dioxide.

US Patent:

20200368668, Nov 26, 2020

Filed:

May 20, 2020

Appl. No.:

16/879444

Inventors:

- Billerica MA, US
Rocky D. GIPSON - San Marcos CA, US
Sarah VOGT - Grover Beach CA, US
Joshua T. COOK - San Diego CA, US
Matthew BROWNING - San Luis Obispo CA, US
Marco HOLZNER - San Luis Obispo CA, US

International Classification:

B01D 53/04
B01D 45/12
B01D 50/00

Abstract:

Described are methods, devices, and systems useful for removing gaseous ammonia from a gas mixture at a pressure in an ambient pressure range by allowing the ammonia to adsorb onto a solid adsorbent, as well as related systems and methods.

US Patent:

20200368669, Nov 26, 2020

Filed:

May 20, 2020

Appl. No.:

16/879514

Inventors:

- Billerica MA, US
Rocky D. GIPSON - San Marcos CA, US
Sarah VOGT - Grover Beach CA, US
Joshua T. COOK - San Diego CA, US
Matthew BROWNING - San Luis Obispo CA, US
Marco HOLZNER - San Luis Obispo CA, US

International Classification:

B01D 53/04
B01J 20/28
B01J 20/20
B01J 20/10
B01J 20/08

Abstract:

Described are methods, devices, and systems useful for adsorbing organometallic vapor onto solid adsorbent material to remove the organometallic vapor from a gas mixture that contains the organometallic vapor and other vapor, particulate materials, or both.