JFLOCI since 2006
Asst. Manager
CEGCYRA May 2011 - May 2012
Temporary Programs Director
Citizens Real Estate & Property Mgt Oct 2009 - Jul 2010
Secretary/Personal Assistant
Education:
Morton High School
Interests:
I enjoy an office environment involving communication with clients/customers and co-workers. I have worked in a variety of jobs over the years and learned numerous skills along the way. My passion is sports, youth sports especially. There is no greater feeling in the world, than at the end of the day, going home and having the knowledge you did something that made a difference in someone life!
- San Jose CA, US Julie Casperson Brewer - Hoboken NJ, US Wayne Kinney - Emmett ID, US Rene Meyer - Fremont CA, US
International Classification:
G11C 13/00 G11C 11/56 H01L 27/24 H01L 45/00
Abstract:
A memory cell including a memory element comprising an electrolytic insulator in contact with a conductive metal oxide (CMO) is disclosed. The CMO includes a crystalline structure and can comprise a pyrochlore oxide, a conductive binary oxide, a multiple B-site perovskite, and a Ruddlesden-Popper structure. The CMO includes mobile ions that can be transported to/from the electrolytic insulator in response to an electric field of appropriate magnitude and direction generated by a write voltage applied across the electrolytic insulator and CMO. The memory cell can include a non-ohmic device (NOD) that is electrically in series with the memory element. The memory cell can be positioned between a cross-point of conductive array lines in a two-terminal cross-point memory array in a single layer of memory or multiple vertically stacked layers of memory that are fabricated over a substrate that includes active circuitry for data operations on the array layer(s).
Conductive Metal Oxide Structures In Non-Volatile Re-Writable Memory Devices
- Sunnyvale CA, US Julie Casperson Brewer - Hoboken NJ, US Wayne Kinney - Emmett ID, US Rene Meyer - Fremont CA, US
International Classification:
G11C 13/00 G11C 11/56 H01L 27/24 H01L 45/00
Abstract:
A memory cell including a memory element comprising an electrolytic insulator in contact with a conductive metal oxide (CMO) is disclosed. The CMO includes a crystalline structure and can comprise a pyrochlore oxide, a conductive binary oxide, a multiple B-site perovskite, and a Ruddlesden-Popper structure. The CMO includes mobile ions that can be transported to/from the electrolytic insulator in response to an electric field of appropriate magnitude and direction generated by a write voltage applied across the electrolytic insulator and CMO. The memory cell can include a non-ohmic device (NOD) that is electrically in series with the memory element. The memory cell can be positioned between a cross-point of conductive array lines in a two-terminal cross-point memory array in a single layer of memory or multiple vertically stacked layers of memory that are fabricated over a substrate that includes active circuitry for data operations on the array layer(s).
Conductive Metal Oxide Structures In Non-Volatile Re-Writable Memory Devices
- Sunnyvale CA, US Julie Casperson Brewer - Hoboken NJ, US Wayne Kinney - Emmett ID, US Rene Meyer - Fremont CA, US
International Classification:
G11C 13/00 H01L 45/00 G11C 11/56 H01L 27/24
Abstract:
A memory cell including a memory element comprising an electrolytic insulator in contact with a conductive metal oxide (CMO) is disclosed. The CMO includes a crystalline structure and can comprise a pyrochlore oxide, a conductive binary oxide, a multiple B-site perovskite, and a Ruddlesden-Popper structure. The CMO includes mobile ions that can be transported to/from the electrolytic insulator in response to an electric field of appropriate magnitude and direction generated by a write voltage applied across the electrolytic insulator and CMO. The memory cell can include a non-ohmic device (NOD) that is electrically in series with the memory element. The memory cell can be positioned between a cross-point of conductive array lines in a two-terminal cross-point memory array in a single layer of memory or multiple vertically stacked layers of memory that are fabricated over a substrate that includes active circuitry for data operations on the array layer(s).
Conductive Metal Oxide Structures In Non-Volatile Re-Writable Memory Devices
- Sunnyvale CA, US Julie Casperson Brewer - Hoboken NJ, US Wayne Kinney - Emmett ID, US Rene Meyer - Fremont CA, US
International Classification:
G11C 13/00 H01L 45/00 H01L 27/24
Abstract:
A memory cell including a memory element comprising an electrolytic insulator in contact with a conductive metal oxide (CMO) is disclosed. The CMO includes a crystalline structure and can comprise a pyrochlore oxide, a conductive binary oxide, a multiple B-site perovskite, and a Ruddlesden-Popper structure. The CMO includes mobile ions that can be transported to/from the electrolytic insulator in response to an electric field of appropriate magnitude and direction generated by a write voltage applied across the electrolytic insulator and CMO. The memory cell can include a non-ohmic device (NOD) that is electrically in series with the memory element. The memory cell can be positioned between a cross-point of conductive array lines in a two-terminal cross-point memory array in a single layer of memory or multiple vertically stacked layers of memory that are fabricated over a substrate that includes active circuitry for data operations on the array layer(s).
Conductive Metal Oxide Structures In Non Volatile Re Writable Memory Devices
- Sunnyvale CA, US Julie Casperson Brewer - Hoboken NJ, US Wayne Kinney - Emmett ID, US Rene Meyer - Atherton CA, US
Assignee:
Unity Semiconductor Corporation - Sunnyvale CA
International Classification:
H01L 45/00 H01L 27/24
US Classification:
257 2
Abstract:
A memory cell including a memory element comprising an electrolytic insulator in contact with a conductive metal oxide (CMO) is disclosed. The CMO includes a crystalline structure and can comprise a pyrochlore oxide, a conductive binary oxide, a multiple B-site perovskite, and a Ruddlesden-Popper structure. The CMO includes mobile ions that can be transported to/from the electrolytic insulator in response to an electric field of appropriate magnitude and direction generated by a write voltage applied across the electrolytic insulator and CMO. The memory cell can include a non-ohmic device (NOD) that is electrically in series with the memory element. The memory cell can be positioned between a cross-point of conductive array lines in a two-terminal cross-point memory array in a single layer of memory or multiple vertically stacked layers of memory that are fabricated over a substrate that includes active circuitry for data operations on the array layer(s).