Kenneth A Sharp

US Patent:

6489386, Dec 3, 2002

Filed:

Aug 9, 2000

Appl. No.:

09/634288

Inventors:

Irene Greenwald Plotzker - Wilmington DE
Thomas Michael Ford - Greenville DE
Kenneth George Sharp - Landenberg PA
Samuel Tacitus DArcangelis - Randolph NJ

Assignee:

E. I. du Pont de Nemours and Company - Wilmington DE

International Classification:

C08K 509

US Classification:

524291, 524222

Abstract:

A polymer composition and method for reducing the permeability of gases through molded polymeric containers and films by incorporating into the polymer from which the container or film is formed an effective amount of a barrier-enhancing additive, such as monoesters of hydroxybenzoic acid and hydroxynaphthoic acid.

US Patent:

6096460, Aug 1, 2000

Filed:

Apr 20, 1999

Appl. No.:

9/294575

Inventors:

Roger Harquail French - Wilmington DE
Kenneth George Sharp - Landenberg PA

Assignee:

E. I. du Pont de Nemours and Company - Wilmington DE

International Classification:

G03F 900

US Classification:

430 5

Abstract:

Transmissive attenuated embedded phase shifter photomasks comprising at least one polymeric material, preferably an amorphous fluoropolymer or an amorphous fluoropolymer doped with a fluorine functionalized organosilane, and organosilicates, or combinations thereof, the polymeric material having: (a) an index of refraction (n) in a range from 1. 2 to 2. 0, preferably in the range from 1. 26 to 1. 8, at a selected lithographic wavelength below 400 nm; and (b) an extinction coefficient (k) in a range from 0. 04 to 0. 8, preferably in the range from 0. 06 to 0. 59 at the selected lithographic wavelength below 400 nm.

US Patent:

61746312, Jan 16, 2001

Filed:

Jan 18, 2000

Appl. No.:

9/484149

Inventors:

Roger Harquail French - Wilmington DE
Kenneth George Sharp - Landenberg PA

Assignee:

E. I. du Pont de Nemours and Company - Wilmington DE

International Classification:

G03F 900

US Classification:

430 5

Abstract:

Transmissive attenuated embedded phase shifter photomasks comprising at least one polymeric material, preferably an amorphous fluoropolymer or an amorphous fluoropolymer doped with a fluorine functionalized organosilane, and organosilicates, or combinations thereof, the polymeric material having: (a) an index of refraction (n) in a range from 1. 2 to 2. 0, preferably in the range from 1. 26 to 1. 8, at a selected lithographic wavelength below 400 nm; and (b) an extinction coefficient (k) in a range from 0. 04 to 0. 8, preferably in the range from 0. 06 to 0. 59 at the selected lithographic wavelength below 400 nm.