Andrew Felker - Livermore CA, US Nicholas A. Vickers - Hayward CA, US Rafael Aldaz - Pleasanton CA, US David Press - San Francisco CA, US Nicholas J. Pfister - Goleta CA, US James W. Raring - Goleta CA, US Mathew C. Schmidt - Goleta CA, US Kenneth John Thomson - San Francisco CA, US
Assignee:
Soraa, Inc. - Fremont CA
International Classification:
H01L 33/06 H01L 33/32
US Classification:
257 14, 438 33, 257E33008, 257E33025
Abstract:
A method for forming optical devices includes providing a gallium nitride substrate having a crystalline surface region and a backside region. The backside is subjected to a laser scribing process to form scribe regions. Metal contacts overly the scribe regions.
An optical apparatus comprises a semiconductor substrate, and a supermode filtering waveguide (SFW) emitter disposed on the semiconductor substrate. The SFW emitter comprises a first optical waveguide, a spacer layer, and a second optical waveguide spaced apart from the first optical waveguide by the spacer layer. The second optical waveguide is evanescently coupled with the first optical waveguide and is configured, in conjunction with the first waveguide, to selectively propagate only a first mode of a plurality of optical modes. The SFW emitter further comprises an optically active region disposed in one of the first optical waveguide and the second optical waveguide.
- San Jose CA, US Kenneth J. THOMSON - San Francisco CA, US
International Classification:
H01S 5/026 H01S 5/22 H01S 5/34
Abstract:
An optical apparatus comprises a semiconductor substrate, and a supermode filtering waveguide (SFW) emitter disposed on the semiconductor substrate. The SFW emitter comprises a first optical waveguide, a spacer layer, and a second optical waveguide spaced apart from the first optical waveguide by the spacer layer. The second optical waveguide is evanescently coupled with the first optical waveguide and is configured, in conjunction with the first waveguide, to selectively propagate only a first mode of a plurality of optical modes. The SFW emitter further comprises an optically active region disposed in one of the first optical waveguide and the second optical waveguide.
Iii-V Component With Multi-Layer Silicon Photonics Waveguide Platform
- San Jose CA, US Kenneth J. THOMSON - San Francisco CA, US Dominic F. SIRIANI - Allentown PA, US
International Classification:
G02B 6/122 G02B 6/13
Abstract:
Embodiments provide for a photonic platform, comprising: a silicon component; a III-V component; and a bonding layer contacting the silicon component on one side and the III-V component on the opposite side; wherein the silicon component comprises: a silicon substrate; a dielectric, contacting the silicon substrate on one face and the bonding layer on the opposite face; a silicon cores disposed in the dielectric; and wherein the III-V component comprises: a III-V cladding; a III-V contact, having a first side that contacts the bonding layer; and an active region, disposed on the III-V contact and separating the III-V contact from the III-V cladding, wherein the active region is located relative to the silicon cores to define an optical path that includes the active region and the silicon cores.
Laser Integration Into A Silicon Photonics Platform
- San Jose CA, US Kenneth J. THOMSON - San Francisco CA, US Dominic F. SIRIANI - Allentown PA, US
International Classification:
H01S 5/02 H01S 5/10
Abstract:
The present disclosure provides for laser integration into photonic platforms in which a first wafer, including a first substrate and a first insulator that includes a first plurality of dies that each include a first set of optical waveguides, is bonded to a second wafer, including a second substrate and a second insulator that includes a second plurality of dies that each include a second set of optical waveguides. The bond between the two wafers defines a wafer bond interface joining the first insulator with the second insulator and vertically aligning the first plurality of dies with the second plurality of dies such that respective first sets of optical waveguides are optically coupled with respective second sets of optical waveguides.
Contacts For An N-Type Gallium And Nitrogen Substrate For Optical Devices
- FREMONT CA, US KENNETH JOHN THOMSON - FREMONT CA, US
International Classification:
H01L 33/00 H01L 33/22 H01L 33/38
Abstract:
A method for fabricating LED devices. The method includes providing a gallium and nitrogen containing substrate member (e.g., GaN) comprising a backside surface and a front side surface. The method includes subjecting the backside surface to a polishing process, causing a backside surface to be characterized by a surface roughness, subjecting the backside surface to an anisotropic etching process exposing various crystal planes to form a plurality of pyramid-like structures distributed spatially in a non-periodic manner on the backside surface, treating the backside surface comprising the plurality of pyramid-like structures, to a plasma species, and subjecting the backside surface to a surface treatment. The method further includes forming a contact material comprising an aluminum bearing species or a titanium bearing species overlying the surface-treated backside to form a plurality of LED devices with the contact material.
Contacts For An N-Type Gallium And Nitrogen Substrate For Optical Devices
- Fremont CA, US Kenneth Jonh Thomson - Fremont CA, US
International Classification:
H01L 33/40 H01L 33/00
Abstract:
A method for fabricating LED devices. The method includes providing a gallium and nitrogen containing substrate member (e.g., GaN) comprising a backside surface and a front side surface. The method includes subjecting the backside surface to a polishing process, causing a backside surface to be characterized by a surface roughness, subjecting the backside surface to an anisotropic etching process exposing various crystal planes to form a plurality of pyramid-like structures distributed spatially in a non-periodic manner on the backside surface, treating the backside surface comprising the plurality of pyramid-like structures, to a plasma species, and subjecting the backside surface to a surface treatment. The method further includes forming a contact material comprising an aluminum bearing species or a titanium bearing species overlying the surface-treated backside to form a plurality of LED devices with the contact material.
Contacts For An N-Type Gallium And Nitrogen Substrate For Optical Devices
- Fremont CA, US KENNETH JOHN THOMSON - FREMONT CA, US
International Classification:
H01L 33/32 H01L 33/22
US Classification:
257 76, 438 34
Abstract:
A method for fabricating LED devices. The method includes providing a gallium and nitrogen containing substrate member (e.g., GaN) comprising a backside surface and a front side surface. The method includes subjecting the backside surface to a polishing process, causing a backside surface to be characterized by a surface roughness, subjecting the backside surface to an anisotropic etching process exposing various crystal planes to form a plurality of pyramid-like structures distributed spatially in a non-periodic manner on the backside surface, treating the backside surface comprising the plurality of pyramid-like structures, to a plasma species, and subjecting the backside surface to a surface treatment. The method further includes forming a contact material comprising an aluminum bearing species or a titanium bearing species overlying the surface-treated backside to form a plurality of LED devices with the contact material.
Wayne Burgett, Karen Farrier, Norm Harley, Don Hoge, Leon Cotton, Harold Farrier, Roger Harley, Rexene Sigman, Navonne Schmidt, Norma Weller, Bernice Sudduth