Kevin L Stewart

US Patent:

50413589, Aug 20, 1991

Filed:

Apr 17, 1989

Appl. No.:

7/339049

Inventors:

Michael Hatzakis - Chappaqua NY
Jane M. Shaw - Ridgefield CT
Kevin J. Stewart - Lake Peekskill NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G03C 173
G03F 7004

US Classification:

430280

Abstract:

A composition containing a polymeric material obtained by interreacting an epoxy-novolak polymer with an organosilicon compound, a radiation sensitive onium salt, and a near U. V. sensitizer.

US Patent:

50988166, Mar 24, 1992

Filed:

Apr 11, 1991

Appl. No.:

7/683778

Inventors:

Edward D. Babich - Chappaqua NY
Jeffrey D. Gelorme - Plainville CT
Michael Hatzakis - Chappaqua NY
Jane M. Shaw - Ridgefield CT
Kevin J. Stewart - Lake Peekskill NY
David F. Witman - Pleasantville NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G03F 7075
G03F 726

US Classification:

430325

Abstract:

An ultraviolet light sensitive photoinitiator composition that includes at least one anthracene derivative represented by the formula: ##STR1## wherein X is CH. dbd. CH. sub. 2 or --(--CH. sub. 2 --)--. sub. n O--(--R) with R being H or ##STR2## wherein each R. sup. I, R. sup. II and R. sup. III individually is selected from the group of alkyl, alkenyl, aryl, ##STR3## wherein each R. sup. IV, R. sup. V and R. sup. VI individually is selected from the group of alkyl, alkenyl and aryl; wherein m is an integer of 0 to 4, p is an integer of 0 to 4; and is n being 1 to 2; and onium salt; and an organic solvent. The composition is used for cationic polymerization of cationic polymerizable materials including in the formation of a pattern of a photoresist. Also certain novel epoxy-functionalized organosilicons are provided that are sensitive to radiation including E-beam radiation and exhibit resistance to oxygen reactive ion etching.

US Patent:

51107112, May 5, 1992

Filed:

Apr 11, 1991

Appl. No.:

7/683729

Inventors:

Edward D. Babich - Chappaqua NY
Jeffrey D. Gelorme - Plainville CT
Michael Hatzakis - Chappaqua NY
Jane M. Shaw - Ridgefield CT
Kevin J. Stewart - Lake Peekskill NY
David F. Witman - Pleasantville NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G03F 7075
G03F 726

US Classification:

430296

Abstract:

An ultraviolet light sensitive photoinitiator composition that includes at least one anthracene derivative represented by the formula: ##STR1## wherein X is CH. dbd. CH. sub. 2 or --(--CH. sub. 2 --)--. sub. n O--(--R) with R being H or ##STR2## wherein each R. sup. I, R. sup. II and R. sup. III individually is selected from the group of alkyl, alkenyl, aryl, ##STR3## wherein each R. sup. IV, R. sup. V and R. sup. VI individually is selected from the group of alkyl, alkenyl and aryl; wherein m is an integer of 0 to 4, p is an integer of 0 to 4; and is n being 1 to 2; and onium salt; and an organic solvent. The composition is used for cationic polymerization of cationic polymerizable materials including in the formation of a pattern of a photoresist. Also certain novel epoxy-functionalized organosilicons are provided that are sensitive to radiation including E-beam radiation and exhibit resistance to oxygen reactive ion etching.

US Patent:

50595121, Oct 22, 1991

Filed:

Oct 10, 1989

Appl. No.:

7/419047

Inventors:

Edward D. Babich - Chappaqua NY
Jeffrey D. Gelorme - Plainville CT
Michael Hatzakis - Chappaqua NY
Jane M. Shaw - Ridgefield CT
Kevin J. Stewart - Lake Peekskill NY
David F. Witman - Pleasantville NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G03F 7029
C08F 818

US Classification:

430280

Abstract:

An ultraviolet light sensitive photoinitiator composition that includes at least one anthracene derivative represented by the formula: ##STR1## wherein X is CH. dbd. CH. sub. 2 or --(--CH. sub. 2 --)--. sub. n O--(--R) with R being H or ##STR2## wherein each R. sup. I, R. sup. II and R. sup. III individually is selected from the group of alkyl, alkenyl, aryl, ##STR3## wherein each R. sup. IV, R. sup. V and R. sup. VI individually is selected from the group of alkyl, alkenyl and aryl; wherein m is an integer of 0 to 4, p is an integer of 0 to 4; and is n being 1 to 2; and onium salt; and an organic solvent. The composition is used for cationic polymerization of cationic polymerizable materials including in the formation of a pattern of a photoresist. Also certain novel epoxy-functionalized organosilicons are provided that are sensitive to radiation including E-beam radiation and exhibit resistance to oxygen reactive ion etching.

US Patent:

51150956, May 19, 1992

Filed:

Apr 11, 1991

Appl. No.:

7/683713

Inventors:

Edward D. Babich - Chappaqua NY
Jeffrey D. Gelorme - Plainville CT
Michael Hatzakis - Chappaqua NY
Jane M. Shaw - Ridgefield CT
Kevin J. Stewart - Lake Peekskill NY
David F. Witman - Pleasantville NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

C08F28300

US Classification:

525474

Abstract:

An ultraviolet light sensitive photoinitiator composition that includes at least one anthracene derivative represented by the formula: ##STR1## wherein X is CH. dbd. CH. sub. 2 or --(--CH. sub. 2 --)--. sub. n O--(--R) with R being H or ##STR2## wherein each R. sup. I, R. sup. II and R. sup. III individually is selected from the group of alkyl, alkenyl, aryl, ##STR3## wherein each R. sup. IV, R. sup. V and R. sup. VI individually is selected from the group of alkyl, alkenyl and aryl; wherein m is an integer of 0 to 4, p is an integer of 0 to 4; and is n being 1 to 2; and onium salt; and an organic solvent. The composition is used for cationic polymerization of cationic polymerizable materials including in the formation of a pattern of a photoresist. Also certain novel epoxy-functionalized organosilicons are provided that are sensitive to radiation including E-beam radiation and exhibit resistance to oxygen reactive ion etching.

US Patent:

20210049911, Feb 18, 2021

Filed:

Aug 13, 2019

Appl. No.:

16/539850

Inventors:

- San Francisco CA, US
Michael Sasha Frumin - Brooklyn NY, US
Dorian Anthony Goldman - Brooklyn NY, US
Man Geen Harold Li - New York NY, US
Akshay Ramesh Patil - Brooklyn NY, US
David Halsted Riege - San Francisco CA, US
Kevin Stewart - Seattle WA, US
Alexander Michael Weinstein - Seattle WA, US

International Classification:

G08G 1/00
G01C 21/34
G06F 17/18

Abstract:

This disclosure describes a pickup location determination system that determines a pickup location for a received transportation request by filtering out door points based on various factors and by utilizing a pickup location model to select a pickup location from the filtered door points. For example, the disclosed systems generate door points relative to intersection points within a request radius of a request location associated with a received transportation request. The disclosed systems generate potential pickup locations by filtering out door points that are impractical and/or inefficient based on proximity to other door points, locations relative to venues, locations relative to side streets, and/or locations between parallel road segments (e.g., medians). The disclosed systems further utilize a pickup location model to select a pickup location from the potential pickup locations.