Kurt J Ahmann

US Patent:

7824498, Nov 2, 2010

Filed:

Feb 24, 2004

Appl. No.:

10/786876

Inventors:

Vijay D. Parkhe - San Jose CA, US
Kurt J. Ahmann - San Jose CA, US
Matthew C. Tsai - Cupertino CA, US
Steve Sansoni - Livermore CA, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

C23C 16/00
H01L 21/306
H01L 21/683
C23F 1/00
B23B 31/38

US Classification:

118728, 118724, 118725, 15634551, 15634552, 15634553, 279128, 361234

Abstract:

A substrate support has a support structure and a coating on the support structure having a carbon-hydrogen network. The coating has a contact surface having a coefficient of friction of less than about 0. 3 and a hardness of at least about 8 GPa. The contact surface of the coating is capable of reducing abrasion and contamination of a substrate that contacts the contact surface. In one version, the support structure has a dielectric covering an electrode. A plurality of mesas on the dielectric have a coating with the contact surface thereon.

US Patent:

20070193982, Aug 23, 2007

Filed:

May 22, 2006

Appl. No.:

11/438496

Inventors:

Karl Brown - Mountain View CA, US
Vineet Mehta - Sunnyvale CA, US
Wei Wang - Santa Clara CA, US
John Pipitone - Livermore CA, US
Kurt Ahmann - San Jose CA, US
Armando Valverde - San Jose CA, US

International Classification:

B23K 9/00

US Classification:

219121430

Abstract:

A physical vapor deposition reactor includes a vacuum chamber with a sidewall, a ceiling and a retractable wafer support pedestal near a floor of the chamber, and a vacuum pump coupled to the chamber, the retractable wafer support pedestal having an internal electrode and a grounded base with a conductive annular flange extending from the base. A metal sputter target at the ceiling is energized by a high voltage D.C. source. The reactor has an RF plasma source power generator with a frequency suitable for exciting kinetic electrons is coupled to either the sputter target or to the internal electrode of the pedestal. A removable shield protects the sidewall and is grounded by plural compressible conductive tabs dispersed at generally uniform intervals on the annular flange and engaging a bottom edge of the shield whenever the retractable wafer support pedestal is in an unretracted position, each of the uniform intervals being less than a wavelength corresponding to the frequency of the RF plasma source power generator.

US Patent:

20110017424, Jan 27, 2011

Filed:

Oct 1, 2010

Appl. No.:

12/896272

Inventors:

Vijay D. PARKHE - San Jose CA, US
Kurt J. AHMANN - San Jose CA, US
Matthew C. TSAI - Cupertino CA, US
Steve SANSONI - Livermore CA, US

Assignee:

APPLIED MATERIALS, INC. - Santa Clara CA

International Classification:

F24H 9/00
F25B 29/00
C09K 5/00

US Classification:

165 47, 165 58

Abstract:

A substrate heat exchange pedestal comprises: (i) a support structure having a contact surface comprising a coating of a diamond-like material, and (ii) a heat exchanger in the support structure, the heat exchanger capable of heating or cooling a substrate.

US Patent:

20210212519, Jul 15, 2021

Filed:

Jan 25, 2021

Appl. No.:

17/156952

Inventors:

- Emeryville CA, US
John DIEMER - Lafayette CA, US
Kathleen A. SCHEIBLE - San Francisco CA, US
Kurt J. AHMANN - San Francisco CA, US
Patrick M. GOEBEL - San Francisco CA, US
Shek Fai LAU - Foster City CA, US
Curtis TOM - San Mateo CA, US

International Classification:

A47J 43/044
B01F 7/16
A47J 31/42
A47J 43/07
B01F 13/04
B01F 13/10
B01F 15/00

Abstract:

A method of operating a blender having a rotatable cutting blade in a food preparation chamber includes providing a sensing light assembly, generating at least one sensing light beam below the food preparation chamber, inserting a cup containing food to be blended into the food preparation chamber, generating an error signal if a foreign object crosses the sensing light beam, and preventing or stopping rotation of the cutting blade in response to the error signal.

US Patent:

20180132663, May 17, 2018

Filed:

Nov 16, 2016

Appl. No.:

15/353656

Inventors:

- Emeryville CA, US
John DIEMER - Lafayette CA, US
Kathleen A. SCHEIBLE - San Francisco CA, US
Kurt J. AHMANN - San Francisco CA, US
Patrick M. GOEBEL - San Francisco CA, US
Shek Fai LAU - Foster City CA, US
Curtis TOM - San Mateo CA, US

Assignee:

F'REAL FOODS LLC - Emeryville CA

International Classification:

A47J 43/044
B01F 7/16
B01F 13/10
B01F 15/00
B01F 13/04
A47J 43/07
A61L 2/07

Abstract:

An easily assembled blender with an internal frame holding a cupholder elevator assembly, a mix motor assembly, a food preparation chamber, a water heater assembly and a steamer assembly. The water heater and steamer assemblies are preferably on modular trays that slide into the internal frame. The water heater preferably also serves as a hot water reservoir and, to avoid overheating, has its heating coil located near its bottom. To resist scale deposits, polytetrafluoroethylene (PTFE) tubing is preferably used to transport steam from the steamer to the food preparation chamber. To expedite manufacture, a spring-biased idler assembly with a drive belt for the cupholder elevator assembly preferably snaps into a lower receiving port on the internal frame. Crisscrossing infrared light beams are preferably placed at the entrance of the food preparation chamber to detect whether the cup entering the chamber is the correct size and detect whether any foreign object is below the food preparation chamber.

US Patent:

20140326184, Nov 6, 2014

Filed:

Jul 21, 2014

Appl. No.:

14/337131

Inventors:

- SANTA CLARA CA, US
Kurt J. AHMANN - San Jose CA, US
Matthew C. TSAI - Cupertino CA, US
Steve SANSONI - Livermore CA, US

Assignee:

APPLIED MATERIALS, INC. - SANTA CLARA CA

International Classification:

C23C 16/46

US Classification:

118724, 118 69

Abstract:

A cooling pedestal for supporting a substrate, comprises a support structure having cooling conduits to flow a fluid therethrough to cool the substrate, and a contact surface comprising a coating of a diamond-like carbon. The coating comprises (i) a coefficient of friction of less than about 0.3, (ii) an average surface roughness of less than about 0.4 micrometers, and (iii) a microhardness of at least about 8 GPa.