Kyusik Shin

age ~61

from Dublin, CA

Also known as:
  • Kyusik L Sin
  • Kyu Sik Shin
  • Kyusik Hin

Kyusik Shin Phones & Addresses

  • Dublin, CA
  • 1631 Centre Pointe Dr, Milpitas, CA 95035
  • Palo Alto, CA
  • Fremont, CA
  • Minneapolis, MN
  • Saint Paul, MN
  • Alameda, CA
  • 1275 Donahue Ct, Pleasanton, CA 94566

Resumes

Kyusik Shin Photo 1

Hw Development Manager, Technologist

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Location:
Milpitas, CA
Industry:
Computer Hardware
Work:
HGST, a Western Digital company since Apr 2013
Director - HW Engineering

Hitachi GST since Feb 2008
Engineering Manager

Samsung Electronics Mar 2007 - Jul 2008
Manager
Education:
University of Minnesota-Twin Cities 1990 - 1995
Ph. D, Materials Science
Skills:
Semiconductors
Thin Films
Design of Experiments
Failure Analysis
Engineering Management
Characterization
Spc
Materials Science
Product Development
Pvd
Engineering
Manufacturing
Electronics
Jmp
Nanotechnology
Nanofabrication
Kyusik Shin Photo 2

Kyusik Shin

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Kyusik Shin Photo 3

Kyusik Shin

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Location:
United States

Us Patents

  • Process To Make Pmr Writer With Leading Edge Shield (Les) And Leading Edge Taper (Let)

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  • US Patent:
    8400733, Mar 19, 2013
  • Filed:
    Nov 24, 2010
  • Appl. No.:
    12/954422
  • Inventors:
    Kyusik Shin - Pleasanton CA, US
    Qiping Zhong - San Jose CA, US
    Honglin Zhu - Fremont CA, US
    Yingjian Chen - Fremont CA, US
    Liubo Hong - San Jose CA, US
    Fenglin Liu - Milpitas CA, US
  • Assignee:
    HGST Netherlands B.V. - Amsterdam
  • International Classification:
    G11B 5/147
  • US Classification:
    36012515
  • Abstract:
    Methods for fabrication of leading edge shields and tapered magnetic poles with a tapered leading edge are provided. The leading edge shield may be formed by utilizing a CMP stop layer. The CMP stop layer may aid in preventing over polishing of the magnetic material. For the tapered magnetic poles with a tapered leading edge, a magnetic material is deposited on a planarized surface, a patterned resist material is formed, and exposed magnetic material is etched to form at least one tapered surface of the magnetic material.
  • Perpendicular Write Head With Wrap Around Shield And Conformal Side Gap

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  • US Patent:
    8470186, Jun 25, 2013
  • Filed:
    Nov 24, 2010
  • Appl. No.:
    12/954458
  • Inventors:
    Yingjian Chen - Fremont CA, US
    Shiwen Huang - Fremont CA, US
    Fenglin Liu - Milpitas CA, US
    Kyusik Shin - Pleasanton CA, US
  • Assignee:
    HGST Netherlands B.V. - Amsterdam
  • International Classification:
    B44C 1/22
  • US Classification:
    216 22, 216 37, 216 67, 3601253, 36012503, 36012516, 36012502
  • Abstract:
    A perpendicular write head having a wrap around shield and a conformal side gap. In fabricating the write head, the leading edge shield may be chemical mechanical polished down to a level that is substantially even with a chemical mechanical polishing stop layer. Because the leading edge shield and the chemical mechanical polishing stop layer are used as RIE stop for trench RIE, a fully conformal side shield may be formed with a LTE/LES.
  • Use Of Magnetic Material For Rie Stop Layer During Damascene Main Pole Formation

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  • US Patent:
    8508886, Aug 13, 2013
  • Filed:
    Sep 28, 2011
  • Appl. No.:
    13/247883
  • Inventors:
    Yingjian Chen - Fremont CA, US
    Shiwen Huang - Fremont CA, US
    Edward Hin Pong Lee - San Jose CA, US
    Mun Hyoun Park - San Jose CA, US
    Kyusik Shin - Pleasanton CA, US
    Yuming Zhou - Lakeville MN, US
  • Assignee:
    HGST Netherlands B.V. - Amsterdam
  • International Classification:
    G11B 5/31
  • US Classification:
    3601253
  • Abstract:
    A write head for use in a magnetic disk drive and methods of manufacturing the same. When a non-magnetic reactive ion etching (RIE) stop layer is used in a damascene main pole fabrication process, the leading edge shield and the side shield have a magnetic separation. By replacing a non-magnetic RIE stop layer with a magnetic RIE stop layer, no removal of the RIE stop layer around the main pole is necessary. Additionally, the leading edge shield and the side shield will magnetically join together without extra processing as there will be no magnetic separation between the leading edge shield and the side shield.
  • Magnetic Write Head Manufactured By An Enhanced Damascene Process Producing A Tapered Write Pole With A Non-Magnetic Spacer And Non-Magnetic Bump

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  • US Patent:
    8547660, Oct 1, 2013
  • Filed:
    Dec 17, 2009
  • Appl. No.:
    12/641251
  • Inventors:
    Donald G. Allen - Morgan Hill CA, US
    Amanda Baer - Campbell CA, US
    Yingjian Chen - Fremont CA, US
    Andrew Chiu - San Jose CA, US
    Liubo Hong - San Jose CA, US
    Wen-Chien D. Hsiao - San Jose CA, US
    Edward H. P. Lee - San Jose CA, US
    Fenglin Liu - Milpitas CA, US
    Aron Pentek - San Jose CA, US
    Katalin Pentek - San Jose CA, US
    Kyusik Shin - Pleasanton CA, US
    Yi Zheng - San Ramon CA, US
    Qiping Zhong - San Jose CA, US
    Honglin Zhu - Fremont CA, US
  • Assignee:
    HGST Netherlands B.V. - Amsterdam
  • International Classification:
    G11B 5/127
  • US Classification:
    36012513, 36012514, 36012515
  • Abstract:
    A magnetic write head having a tapered trailing edge and having a magnetic layer formed over a trailing edge of the write pole at a location recessed from the ABS, the magnetic layer being separated from the trailing edge of the write pole by a thin non-magnetic layer. The thin non-magnetic layer is preferably sufficiently thin that the magnetic layer can function as a portion of the write pole in a region removed from the ABS. A trailing magnetic shield is formed over the write pole and is separated from the write pole by a non-magnetic trailing gap layer. A non-magnetic spacer layer can be formed over the magnetic layer to provide additional separation between the magnetic layer and the trailing magnetic shield.
  • Method For Manufacturing A Magnetic Write Head Having A Wrap Around Shield That Is Magnetically Coupled With A Leading Magnetic Shield

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  • US Patent:
    20110146062, Jun 23, 2011
  • Filed:
    Dec 17, 2009
  • Appl. No.:
    12/641242
  • Inventors:
    Donald G. Allen - Morgan Hill CA, US
    Yingjian Chen - Fremont CA, US
    Andrew Chiu - San Jose CA, US
    Liubo Hong - San Jose CA, US
    Wen-Chien D. Hsiao - San Jose CA, US
    Edward H.P. Lee - San Jose CA, US
    Fenglin Liu - Milpitas CA, US
    Katalin Pentek - San Jose CA, US
    Kyusik Shin - Pleasanton CA, US
    Yi Zheng - San Ramon CA, US
    Qiping Zhong - San Jose CA, US
    Honglin Zhu - Fremont CA, US
  • International Classification:
    G11B 5/127
  • US Classification:
    2960318
  • Abstract:
    A method for manufacturing a magnetic write head having a leading magnetic shield and a trailing magnetic shield that are arranged to prevent the lost of magnetic write field to the trailing magnetic shield. The write head includes a non-magnetic step layer that provides additional spacing between the trailing magnetic shield and the write pole at a region removed from the air bearing surface.
  • Method For Manufacturing Wraparound Shield Write Head Using Hard Masks

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  • US Patent:
    20130026131, Jan 31, 2013
  • Filed:
    Jul 28, 2011
  • Appl. No.:
    13/193520
  • Inventors:
    Shiwen Huang - Fremont CA, US
    Fenglin Liu - Milpitas CA, US
    Qiping Zhong - San Jose CA, US
    Kyusik Shin - Pleasanton CA, US
    Yingjian Chen - Fremont CA, US
  • Assignee:
    Hitachi Global Storage Technologies Netherlands B.V. - San Jose CA
  • International Classification:
    G11B 5/127
  • US Classification:
    216 22
  • Abstract:
    The present disclosure describes a method for manufacturing a full wraparound shield damascene write head through the implementation of a three layered (tri-layered) hard mask. According to an embodiment of the invention, the various layers of hard mask are used for different purposes during the formation of a write head. The wraparound shield head of the present invention exhibits improved physical characteristics that further result in improved performance characteristics. Use of the hard mask layers according to the present invention allows for use of manufacturing processes that can be more closely controlled than those processes used in other processes. For example, smaller dimension lithographic techniques can be used. Also, reliance on certain CMP processes is not necessary where the use of CMP processes is not as well-controlled as deposition or lithographic techniques as is possible using the present invention.
  • Method For Making A Perpendicular Magnetic Recording Write Head With Write Pole Having Thin Side Gaps And Thicker Leading Gap

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  • US Patent:
    20170053668, Feb 23, 2017
  • Filed:
    Aug 17, 2015
  • Appl. No.:
    14/827705
  • Inventors:
    - Amsterdam, NL
    Ning Shi - San Jose CA, US
    Kyusik Shin - Pleasanton CA, US
    Suping Song - Fremont CA, US
    Brian R. York - San Jose CA, US
  • International Classification:
    G11B 5/31
    G11B 5/127
  • Abstract:
    Ionized physical vapor deposition (IPVD) is used to form a magnetic recording disk drive write head main pole with thin side gap layers and a thicker leading gap layer. A metal or metal alloy is formed by IPVD in a trench with a bottom and outwardly sloping sidewalls. An optional Ru seed layer is deposited on the metal or metal alloy. This is followed by atomic layer deposition (ALD) of a Ru smoothing layer. If the IPVD results in metal or metal alloy side gap layers with a rough surface, the ALD process is modified, resulting in a smooth Ru smoothing layer that does not replicate the rough surface of the side gap layers.
  • Pmr Overwrite Enhancement By Main Pole Rie Method

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  • US Patent:
    20140326699, Nov 6, 2014
  • Filed:
    May 2, 2013
  • Appl. No.:
    13/886088
  • Inventors:
    - Amsterdam, NL
    Kyusik SHIN - Pleasanton CA, US
    Sue Siyang ZHANG - Saratoga CA, US
  • International Classification:
    G11B 5/855
  • US Classification:
    216 22
  • Abstract:
    The embodiments of the present invention generally relate to a method for forming a trench in which a write pole is deposited therein. The trench is formed with a single mask and multiple reactive ion etching (RIE) processes and has substantially straight side walls and a consistent bevel angle along the length of the write pole. The consistent bevel angle along the length of the write pole allows the bevel angle at the ABS to be consistent regardless of where the cut is when defining the ABS.
Name / Title
Company / Classification
Phones & Addresses
Mr. Kyusik Shin
Owner
Ace Transmission
Shin's Auto Repair
Transmissions - Automobile. Radiators - Automotive. Lubricating Service - Automotive. Brake Service. Auto Repairing - Foreign. Auto Repair & Service. Auto Electric Service. Auto Air Conditioning
1440 S. Highway 121, Suite #6, Lewisville, TX 75067
9724348020, 9724367858

Facebook

Kyusik Shin Photo 4

Xeno Kyusik Shin

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Kyusik Shin Photo 5

KyuSik Shin

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Friends:
Young Jun Ju, Sami Deodato, Kyeong Ho Lee
Kyusik Shin Photo 6

Kyusik Shin

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Kyusik Shin Photo 7

Kyusik Shin

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Friends:
Chulwon Park, Jini Lee, Suji Park, Amy Lee, Takahito Okuyama
Kyusik Shin Photo 8

Kyusik Shin

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Googleplus

Kyusik Shin Photo 9

Kyusik Shin

Youtube

ssd1351 test with arduino nano

  • Duration:
    5s

ssd1351 rgb test

  • Duration:
    7s

how to check list of current directory

check list of pwd.

  • Duration:
    8s

Shin, Kyu Sik

  • Duration:
    21s

FZ@H week 4 skit

Davis Korean Church 603 L St, Davis, CA 95616 daviskoreanchurc... Tha...

  • Duration:
    4m 39s

[ Zia Hyunsu Shin] : '' Invierno Porteo (...

: '' (... 2021.4.14 & '' ...

  • Duration:
    7m 45s

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