Kyusik Shin

US Patent:

8400733, Mar 19, 2013

Filed:

Nov 24, 2010

Appl. No.:

12/954422

Inventors:

Kyusik Shin - Pleasanton CA, US
Qiping Zhong - San Jose CA, US
Honglin Zhu - Fremont CA, US
Yingjian Chen - Fremont CA, US
Liubo Hong - San Jose CA, US
Fenglin Liu - Milpitas CA, US

Assignee:

HGST Netherlands B.V. - Amsterdam

International Classification:

G11B 5/147

US Classification:

36012515

Abstract:

Methods for fabrication of leading edge shields and tapered magnetic poles with a tapered leading edge are provided. The leading edge shield may be formed by utilizing a CMP stop layer. The CMP stop layer may aid in preventing over polishing of the magnetic material. For the tapered magnetic poles with a tapered leading edge, a magnetic material is deposited on a planarized surface, a patterned resist material is formed, and exposed magnetic material is etched to form at least one tapered surface of the magnetic material.

US Patent:

8470186, Jun 25, 2013

Filed:

Nov 24, 2010

Appl. No.:

12/954458

Inventors:

Yingjian Chen - Fremont CA, US
Shiwen Huang - Fremont CA, US
Fenglin Liu - Milpitas CA, US
Kyusik Shin - Pleasanton CA, US

Assignee:

HGST Netherlands B.V. - Amsterdam

International Classification:

B44C 1/22

US Classification:

216 22, 216 37, 216 67, 3601253, 36012503, 36012516, 36012502

Abstract:

A perpendicular write head having a wrap around shield and a conformal side gap. In fabricating the write head, the leading edge shield may be chemical mechanical polished down to a level that is substantially even with a chemical mechanical polishing stop layer. Because the leading edge shield and the chemical mechanical polishing stop layer are used as RIE stop for trench RIE, a fully conformal side shield may be formed with a LTE/LES.

US Patent:

8508886, Aug 13, 2013

Filed:

Sep 28, 2011

Appl. No.:

13/247883

Inventors:

Yingjian Chen - Fremont CA, US
Shiwen Huang - Fremont CA, US
Edward Hin Pong Lee - San Jose CA, US
Mun Hyoun Park - San Jose CA, US
Kyusik Shin - Pleasanton CA, US
Yuming Zhou - Lakeville MN, US

Assignee:

HGST Netherlands B.V. - Amsterdam

International Classification:

G11B 5/31

US Classification:

3601253

Abstract:

A write head for use in a magnetic disk drive and methods of manufacturing the same. When a non-magnetic reactive ion etching (RIE) stop layer is used in a damascene main pole fabrication process, the leading edge shield and the side shield have a magnetic separation. By replacing a non-magnetic RIE stop layer with a magnetic RIE stop layer, no removal of the RIE stop layer around the main pole is necessary. Additionally, the leading edge shield and the side shield will magnetically join together without extra processing as there will be no magnetic separation between the leading edge shield and the side shield.

US Patent:

8547660, Oct 1, 2013

Filed:

Dec 17, 2009

Appl. No.:

12/641251

Inventors:

Donald G. Allen - Morgan Hill CA, US
Amanda Baer - Campbell CA, US
Yingjian Chen - Fremont CA, US
Andrew Chiu - San Jose CA, US
Liubo Hong - San Jose CA, US
Wen-Chien D. Hsiao - San Jose CA, US
Edward H. P. Lee - San Jose CA, US
Fenglin Liu - Milpitas CA, US
Aron Pentek - San Jose CA, US
Katalin Pentek - San Jose CA, US
Kyusik Shin - Pleasanton CA, US
Yi Zheng - San Ramon CA, US
Qiping Zhong - San Jose CA, US
Honglin Zhu - Fremont CA, US

Assignee:

HGST Netherlands B.V. - Amsterdam

International Classification:

G11B 5/127

US Classification:

36012513, 36012514, 36012515

Abstract:

A magnetic write head having a tapered trailing edge and having a magnetic layer formed over a trailing edge of the write pole at a location recessed from the ABS, the magnetic layer being separated from the trailing edge of the write pole by a thin non-magnetic layer. The thin non-magnetic layer is preferably sufficiently thin that the magnetic layer can function as a portion of the write pole in a region removed from the ABS. A trailing magnetic shield is formed over the write pole and is separated from the write pole by a non-magnetic trailing gap layer. A non-magnetic spacer layer can be formed over the magnetic layer to provide additional separation between the magnetic layer and the trailing magnetic shield.

US Patent:

20110146062, Jun 23, 2011

Filed:

Dec 17, 2009

Appl. No.:

12/641242

Inventors:

Donald G. Allen - Morgan Hill CA, US
Yingjian Chen - Fremont CA, US
Andrew Chiu - San Jose CA, US
Liubo Hong - San Jose CA, US
Wen-Chien D. Hsiao - San Jose CA, US
Edward H.P. Lee - San Jose CA, US
Fenglin Liu - Milpitas CA, US
Katalin Pentek - San Jose CA, US
Kyusik Shin - Pleasanton CA, US
Yi Zheng - San Ramon CA, US
Qiping Zhong - San Jose CA, US
Honglin Zhu - Fremont CA, US

International Classification:

G11B 5/127

US Classification:

2960318

Abstract:

A method for manufacturing a magnetic write head having a leading magnetic shield and a trailing magnetic shield that are arranged to prevent the lost of magnetic write field to the trailing magnetic shield. The write head includes a non-magnetic step layer that provides additional spacing between the trailing magnetic shield and the write pole at a region removed from the air bearing surface.

US Patent:

20130026131, Jan 31, 2013

Filed:

Jul 28, 2011

Appl. No.:

13/193520

Inventors:

Shiwen Huang - Fremont CA, US
Fenglin Liu - Milpitas CA, US
Qiping Zhong - San Jose CA, US
Kyusik Shin - Pleasanton CA, US
Yingjian Chen - Fremont CA, US

Assignee:

Hitachi Global Storage Technologies Netherlands B.V. - San Jose CA

International Classification:

G11B 5/127

US Classification:

216 22

Abstract:

The present disclosure describes a method for manufacturing a full wraparound shield damascene write head through the implementation of a three layered (tri-layered) hard mask. According to an embodiment of the invention, the various layers of hard mask are used for different purposes during the formation of a write head. The wraparound shield head of the present invention exhibits improved physical characteristics that further result in improved performance characteristics. Use of the hard mask layers according to the present invention allows for use of manufacturing processes that can be more closely controlled than those processes used in other processes. For example, smaller dimension lithographic techniques can be used. Also, reliance on certain CMP processes is not necessary where the use of CMP processes is not as well-controlled as deposition or lithographic techniques as is possible using the present invention.

US Patent:

20170053668, Feb 23, 2017

Filed:

Aug 17, 2015

Appl. No.:

14/827705

Inventors:

- Amsterdam, NL
Ning Shi - San Jose CA, US
Kyusik Shin - Pleasanton CA, US
Suping Song - Fremont CA, US
Brian R. York - San Jose CA, US

International Classification:

G11B 5/31
G11B 5/127

Abstract:

Ionized physical vapor deposition (IPVD) is used to form a magnetic recording disk drive write head main pole with thin side gap layers and a thicker leading gap layer. A metal or metal alloy is formed by IPVD in a trench with a bottom and outwardly sloping sidewalls. An optional Ru seed layer is deposited on the metal or metal alloy. This is followed by atomic layer deposition (ALD) of a Ru smoothing layer. If the IPVD results in metal or metal alloy side gap layers with a rough surface, the ALD process is modified, resulting in a smooth Ru smoothing layer that does not replicate the rough surface of the side gap layers.

US Patent:

20140326699, Nov 6, 2014

Filed:

May 2, 2013

Appl. No.:

13/886088

Inventors:

- Amsterdam, NL
Kyusik SHIN - Pleasanton CA, US
Sue Siyang ZHANG - Saratoga CA, US

International Classification:

G11B 5/855

US Classification:

216 22

Abstract:

The embodiments of the present invention generally relate to a method for forming a trench in which a write pole is deposited therein. The trench is formed with a single mask and multiple reactive ion etching (RIE) processes and has substantially straight side walls and a consistent bevel angle along the length of the write pole. The consistent bevel angle along the length of the write pole allows the bevel angle at the ABS to be consistent regardless of where the cut is when defining the ABS.