Lawrence Allan Hill

US Patent:

20120184591, Jul 19, 2012

Filed:

Feb 23, 2011

Appl. No.:

13/033483

Inventors:

Gary HOEL - Murray UT, US
Lawrence HILL - Farmington UT, US
Kim CARAMELLI - Salt Lake City UT, US

Assignee:

WATSON PHARMACEUTICALS, INC. - Corona CA

International Classification:

A61K 31/4045
A61P 29/00
A61P 15/16

US Classification:

514415

Abstract:

It has been discovered that silodosin is effective in treating patients having symptoms associated with prostatitis with silodosin or a pharmaceutically acceptable salt thereof. In a preferred embodiment, patients are treated with 4 mg once daily.

US Patent:

42384362, Dec 9, 1980

Filed:

May 10, 1979

Appl. No.:

6/037864

Inventors:

Lawrence R. Hill - Short Hills NJ
Dennis Garbis - Dix Hills NY
Robert Heller - Levittown NY

Assignee:

General Instrument Corporation - Clifton NJ

International Classification:

H01L 21205

US Classification:

264 81

Abstract:

Polycrystalline silicon is obtained by providing a silicon wafer having disposed over at least one face thereof a base coating of oxide, nitride or oxynitride composition, forming a substantially pinhole-free and scratch-free layer of carbon on said base coating over at least the face, forming on the face of the carbon layer a layer of polycrystalline silicon, and removing the silicon layer from the protective coating. Any of the carbon layer adhering to the silicon layer is easily removable to provide the silicon layer separate from the substrate. The wafer/coating unit is reusable in the procedure. The wafer/coating/carbon layer unit comprises a workpiece useful in the practice of the invention.

US Patent:

44993544, Feb 12, 1985

Filed:

Oct 6, 1982

Appl. No.:

6/433158

Inventors:

Lawrence B. Hill - Short Hills NJ
Dennis Garbis - Dix Hills NY
Robert C. Heller - Stonybrook NY
Amedeo J. Granata - Flushing NY

Assignee:

General Instrument Corp. - Clifton NJ

International Classification:

H05B 610

US Classification:

219 1049R

Abstract:

A susceptor for use in a chemical vapor deposition process in a radiant absorption heating system comprises a heater adapted to absorb radiant energy and a sheath of high purity quartz completely surrounding the heater. The sheath further comprises dimples inside the sheath spacing the sheath from the heater. The heater may be graphite having a substantially pinhole-free outgas-inhibiting outer-coating such as silicon carbide.

US Patent:

45996075, Jul 8, 1986

Filed:

Oct 31, 1983

Appl. No.:

6/547124

Inventors:

Lawrence R. Hill - New York NY

Assignee:

General Instrument Corporation - New York NY

International Classification:

H04L 100

US Classification:

340365R

Abstract:

An acoustic keyboard comprises a plurality of keys arranged in a matrix. A plurality of reflector members, each one associated with a different one of the keys, reflect acoustic energy when the associated key is actuated. Acoustic energy is emitted from a transducer for reflection from the actuators. The reflected energy is detected, and the actuated key is identified based upon the transit time of acoustic energy from the transducer to the detector via reflection off of the reflector member associated with the actuated key.

US Patent:

42712351, Jun 2, 1981

Filed:

Dec 26, 1979

Appl. No.:

6/106767

Inventors:

Lawrence Hill - Short Hills NJ
Dennis Garbis - Dix Hills, Long Island NY
Robert Heller - Levittown, Long Island NY

International Classification:

B32B 900

US Classification:

428408

Abstract:

Polycrystalline silicon is obtained by providing a silicon wafer having disposed over at least one face thereof a base coating of oxide, nitride or oxynitride composition, forming a substantially pinhole-free and scratch-free layer of carbon on said base coating over at least the face, forming on the face of the carbon layer a layer of polycrystalline silicon, and removing the silicon layer from the protective coating. Any of the carbon layer adhering to the silicon layer is easily removable to provide the silicon layer separate from the substrate. The wafer/coating unit is reusable in the procedure. The wafer/coating/carbon layer unit comprises a workpiece useful in the practice of the invention.