Leonard C Wan

US Patent:

6969472, Nov 29, 2005

Filed:

Apr 25, 2001

Appl. No.:

09/842214

Inventors:

Dmitri V. Vezenov - Natick MA, US
John M. Guerra - Concord MA, US
Leonard Wan - Chestnut Hill MA, US
Paul F. Sullivan - Westwood MA, US

Assignee:

LSI Logic Corporation - Milpitas CA

International Classification:

B29D011/00
G11B007/00

US Classification:

216 24, 216 26, 20419217, 430321

Abstract:

A method for manufacturing hemi-cylindrical and hemi-spherical micro structures is provided. A pattern is formed onto a substrate, and a layer of material is subsequently grown onto the substrate. Due to growth characteristics, the layer will form radially symmetric features when grown to an appropriate thickness.

US Patent:

20020154590, Oct 24, 2002

Filed:

Apr 25, 2001

Appl. No.:

09/842098

Inventors:

Dmitri Vezenov - Natick MA, US
John Guerra - Concord MA, US
Leonard Wan - Chestnut Hill MA, US
Paul Sullivan - Westwood MA, US
Kenric Nelson - Montclair NJ, US

International Classification:

G11B007/135

US Classification:

369/112260

Abstract:

An optical data storage medium includes a superstructure of micro-lenses defining first and second repeating periods. One of the periods is longer than the other, and the presence of the longer repeating period allows the medium to be used in an optical drive that is configured to use light diffracted by the longer period for tracking purposes. The micro-lenses may be configured such that adjacent lenses have different heights, widths, or shapes. In some embodiments, the spacing between adjacent data tracks is varied to provide the first and second repeating periods.

US Patent:

58539581, Dec 29, 1998

Filed:

Oct 17, 1996

Appl. No.:

8/732899

Inventors:

Chieh-Min Cheng - Arlington MA
Anthony C. Giudice - Wakefield MA
William C. Schwarzel - Billerica MA
Leonard C. Wan - Chestnut Hill MA

Assignee:

Polaroid Corporation - Cambridge MA

International Classification:

G03F 7033
G03F 7038

US Classification:

4302861

Abstract:

The present invention discloses the use of rubber and surfactant to enhance the durability and resolution of on-press developable lithographic printing plates. The rubber is preferably incorporated into a photoresist as discrete particulate rubber. To ensure a uniform and stable dispersion, the rubber is suspended in the photoresist by means of a surfactant having an HLB approximately between 7. 0 and 18.

US Patent:

56164491, Apr 1, 1997

Filed:

Sep 21, 1995

Appl. No.:

8/531486

Inventors:

Chieh-Min Cheng - Arlington MA
Anthony C. Giudice - Wakefield MA
William C. Schwarzel - Billerica MA
Leonard C. Wan - Chestnut Hill MA

Assignee:

Polaroid Corporation - Cambridge MA

International Classification:

G03F 730

US Classification:

430302

Abstract:

The present invention discloses the use of rubber and surfactant to enhance the durability and resolution of on-press developable lithographic printing plates. The rubber is preferably incorporated into a photoresist as discrete particulate rubber. To ensure a uniform and stable dispersion, the rubber is suspended in the photoresist by means of a surfactant having an HLB approximately between 7. 0 and 18.

US Patent:

56208278, Apr 15, 1997

Filed:

Jun 6, 1995

Appl. No.:

8/469475

Inventors:

Chieh-Min Cheng - Arlington MA
Anthony C. Giudice - Wakefield MA
John M. Hardin - Jamaica Plain MA
Leonard C. Wan - Chestnut Hill MA

Assignee:

Polaroid Corporation - Cambridge MA

International Classification:

G03C 172

US Classification:

430138

Abstract:

A lithographic printing plate precursor for use on a printing press, with minimal or no additional processing after exposure to actinic radiation, comprises a printing plate substrate, a polymeric resist layer capable of imagewise photodegradation or photohardening, and a plurality of microencapsulated developers capable of blanket-wise promoting the washing out of either exposed or unexposed areas of the polymeric resist. The microencapsulated developers may be integrated into the polymeric resist layer, or may form a separate layer deposited atop the polymeric resist layer, or may be coated onto a separate sheet support capable of being brought into face-to-face contact with conventional printing plates.

US Patent:

55166202, May 14, 1996

Filed:

Nov 1, 1993

Appl. No.:

8/146710

Inventors:

Chieh-Min Cheng - Arlington MA
Anthony C. Giudice - Wakefield MA
John M. Hardin - Jamaica Plain MA
Leonard C. Wan - Chestnut Hill MA

Assignee:

Polaroid Corporation - Cambridge MA

International Classification:

G03C 172

US Classification:

430138

Abstract:

A lithographic printing plate for use on a printing press, with minimal or no additional processing after exposure to actinic radiation, comprises a printing plate substrate, a polymeric resist layer capable of imagewise photodegradation or photohardening, and a plurality of microencapsulated developers capable of blanket-wise promoting the washing out of either exposed or unexposed areas of the polymeric resist. The microencapsulated developers may be integrated into the polymeric resist layer, or may form a separate layer deposited atop the polymeric resist layer, or may be coated onto a separate sheet support capable of being brought into face-to-face contact with conventional printing plates.