Leonard C Wan from 858 Roxbury Pkwy, Boston, MA 02467, age 83, Phone: 6174690164

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Method Of Fabricating Sub-Micron Hemispherical And Hemicylidrical Structures From Non-Spherically Shaped Templates
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US Patent:

6969472, Nov 29, 2005
Filed:

Apr 25, 2001
Appl. No.:

09/842214
Inventors:

Dmitri V. Vezenov - Natick MA, US
John M. Guerra - Concord MA, US
Leonard Wan - Chestnut Hill MA, US
Paul F. Sullivan - Westwood MA, US
Assignee:

LSI Logic Corporation - Milpitas CA
International Classification:

B29D011/00
G11B007/00
US Classification:

216 24, 216 26, 20419217, 430321
Abstract:

A method for manufacturing hemi-cylindrical and hemi-spherical micro structures is provided. A pattern is formed onto a substrate, and a layer of material is subsequently grown onto the substrate. Due to growth characteristics, the layer will form radially symmetric features when grown to an appropriate thickness.

Optical Storage Medium With Virtual Track Pitch
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US Patent:

20020154590, Oct 24, 2002
Filed:

Apr 25, 2001
Appl. No.:

09/842098
Inventors:

Dmitri Vezenov - Natick MA, US
John Guerra - Concord MA, US
Leonard Wan - Chestnut Hill MA, US
Paul Sullivan - Westwood MA, US
Kenric Nelson - Montclair NJ, US
International Classification:

G11B007/135
US Classification:

369/112260
Abstract:

An optical data storage medium includes a superstructure of micro-lenses defining first and second repeating periods. One of the periods is longer than the other, and the presence of the longer repeating period allows the medium to be used in an optical drive that is configured to use light diffracted by the longer period for tracking purposes. The micro-lenses may be configured such that adjacent lenses have different heights, widths, or shapes. In some embodiments, the spacing between adjacent data tracks is varied to provide the first and second repeating periods.

Lithographic Plate With Disperse Particulate Rubber Additive
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US Patent:

58539581, Dec 29, 1998
Filed:

Oct 17, 1996
Appl. No.:

8/732899
Inventors:

Chieh-Min Cheng - Arlington MA
Anthony C. Giudice - Wakefield MA
William C. Schwarzel - Billerica MA
Leonard C. Wan - Chestnut Hill MA
Assignee:

Polaroid Corporation - Cambridge MA
International Classification:

G03F 7033
G03F 7038
US Classification:

4302861
Abstract:

The present invention discloses the use of rubber and surfactant to enhance the durability and resolution of on-press developable lithographic printing plates. The rubber is preferably incorporated into a photoresist as discrete particulate rubber. To ensure a uniform and stable dispersion, the rubber is suspended in the photoresist by means of a surfactant having an HLB approximately between 7. 0 and 18.

Lithographic Printing Plates With Dispersed Rubber Additives
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US Patent:

56164491, Apr 1, 1997
Filed:

Sep 21, 1995
Appl. No.:

8/531486
Inventors:

Chieh-Min Cheng - Arlington MA
Anthony C. Giudice - Wakefield MA
William C. Schwarzel - Billerica MA
Leonard C. Wan - Chestnut Hill MA
Assignee:

Polaroid Corporation - Cambridge MA
International Classification:

G03F 730
US Classification:

430302
Abstract:

The present invention discloses the use of rubber and surfactant to enhance the durability and resolution of on-press developable lithographic printing plates. The rubber is preferably incorporated into a photoresist as discrete particulate rubber. To ensure a uniform and stable dispersion, the rubber is suspended in the photoresist by means of a surfactant having an HLB approximately between 7. 0 and 18.

On-Press Developable Lithographic Printing Plate Precursor
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US Patent:

56208278, Apr 15, 1997
Filed:

Jun 6, 1995
Appl. No.:

8/469475
Inventors:

Chieh-Min Cheng - Arlington MA
Anthony C. Giudice - Wakefield MA
John M. Hardin - Jamaica Plain MA
Leonard C. Wan - Chestnut Hill MA
Assignee:

Polaroid Corporation - Cambridge MA
International Classification:

G03C 172
US Classification:

430138
Abstract:

A lithographic printing plate precursor for use on a printing press, with minimal or no additional processing after exposure to actinic radiation, comprises a printing plate substrate, a polymeric resist layer capable of imagewise photodegradation or photohardening, and a plurality of microencapsulated developers capable of blanket-wise promoting the washing out of either exposed or unexposed areas of the polymeric resist. The microencapsulated developers may be integrated into the polymeric resist layer, or may form a separate layer deposited atop the polymeric resist layer, or may be coated onto a separate sheet support capable of being brought into face-to-face contact with conventional printing plates.

Method Of On-Press Developing Lithographic Plates Utilizing Microencapsulated Developers
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US Patent:

55166202, May 14, 1996
Filed:

Nov 1, 1993
Appl. No.:

8/146710
Inventors:

Chieh-Min Cheng - Arlington MA
Anthony C. Giudice - Wakefield MA
John M. Hardin - Jamaica Plain MA
Leonard C. Wan - Chestnut Hill MA
Assignee:

Polaroid Corporation - Cambridge MA
International Classification:

G03C 172
US Classification:

430138
Abstract:

A lithographic printing plate for use on a printing press, with minimal or no additional processing after exposure to actinic radiation, comprises a printing plate substrate, a polymeric resist layer capable of imagewise photodegradation or photohardening, and a plurality of microencapsulated developers capable of blanket-wise promoting the washing out of either exposed or unexposed areas of the polymeric resist. The microencapsulated developers may be integrated into the polymeric resist layer, or may form a separate layer deposited atop the polymeric resist layer, or may be coated onto a separate sheet support capable of being brought into face-to-face contact with conventional printing plates.