Lili Wang

US Patent:

20130054227, Feb 28, 2013

Filed:

Aug 28, 2011

Appl. No.:

13/219680

Inventors:

George Mizhen Wang - Fremont CA, US
Lili Ni Wang - Fremont CA, US

International Classification:

G06F 17/27

US Classification:

704 9, 704E11001

Abstract:

A phonetic symbol system formed by phonetic symbols using letters of English Alphabet is described. The cases or the styles of the letters do not affect the sounds of the phonetic symbols. The phonetic symbols are systematically and logically defined. The phonetic symbol system can be used where language is involved. The phonetic symbol system provides convenient ways to represent languages. In some embodiments, the phonetic symbol system provides ways to represent English language.

US Patent:

20110103228, May 5, 2011

Filed:

Oct 30, 2009

Appl. No.:

12/609837

Inventors:

Nischal Sheth - Los Altos CA, US
Zhaohui Zhang - Westford MA, US
Lili Wang - Chelmsford MA, US

Assignee:

JUNIPER NETWORKS, INC. - Sunnyvale CA

International Classification:

H04L 12/56

US Classification:

370238

Abstract:

A network device identifies an Open Shortest Path First (OSPF) link between the network device and a layer 2 network as one of a point-to-multipoint over broadcast interface or a point-to-multipoint over non-broadcast multi access (NBMA) interface, and performs database synchronization and neighbor discovery and maintenance using one of a broadcast model or a NBMA model. The network device also generates a link-state advertisement for the network device, where the link-state advertisement includes a separate link description for each point-to-point link within the layer 2 network; and sends the link-state advertisement to each fully adjacent neighbor in the layer 2 network.

US Patent:

20220380705, Dec 1, 2022

Filed:

Sep 24, 2020

Appl. No.:

17/753256

Inventors:

- Tempe AZ, US
LILI WANG - Chandler AZ, US
AIPING WU - Chandler AZ, US
YI-CHIA LEE - Chupei City, TW
TIANNIU CHEN - Westford MA, US

Assignee:

Versum Materials US, LLC - Tempe AZ

International Classification:

C11D 11/00
G03F 7/42
C11D 7/32
C11D 7/26
C11D 7/34

Abstract:

A method and cleaning composition for microelectronic devices or semiconductor substrates including at least one N alkanolamine; at least one hydroxylamine or derivatives of hydroxylamine or mixtures thereof; at least one polyfunctional organic acid with at least two carboxylic acid groups and water. The cleaning compositions can further include at least one corrosion inhibitor.

US Patent:

20220293808, Sep 15, 2022

Filed:

Mar 3, 2022

Appl. No.:

17/686288

Inventors:

- Fremont CA, US
Ricky DUNBAR - Fremont CA, US
Lili WANG - Fremont CA, US

International Classification:

H01L 31/05
H01L 31/072
H01L 31/0224
H01L 31/18

Abstract:

A semiconductor module comprises a string made up of a plurality of cells or strips arranged in series. A front surface of at least one cell or strip, has a polarity opposite to that of the front surface of another cell or strip in the string. In some embodiments the strips may comprise photovoltaic devices of different structures, for example Heterojunction (HJT) and Tunnel Oxide Passivated Contact (TOPCon). According to certain embodiments, one or more cells or strips of the string may be arranged in an overlapping shingled configuration, such that a front surface of the overlapped strip exhibits the appropriate polarity. For particular embodiments, one or more cells or strips may be adjacent in the string, such that a cell or strip has a front or back surface of polarity appropriate to connect with the adjacent cell or strip (e.g., using a ribbon located on a same surface).

US Patent:

20220251480, Aug 11, 2022

Filed:

Jul 14, 2020

Appl. No.:

17/597530

Inventors:

- Tempe AZ, US
LILI WANG - Chandler AZ, US
YI-CHIA LEE - Chupei City, TW
TIANNIU R. CHEN - Westford MA, US

Assignee:

Versum Materials US, LLC - Tempe AZ

International Classification:

C11D 7/32
C11D 7/26
C11D 11/00
G03F 7/42

Abstract:

This disclosed and claimed subject matter relates to a post etch residue cleaning compositions that include an alkanolamine having two or more or more than two alkanol groups, an alpha-hydroxy acid and water as well as methods for use thereof in microelectronics manufacturing.

US Patent:

20200032177, Jan 30, 2020

Filed:

Jun 28, 2019

Appl. No.:

16/457119

Inventors:

- Tempe AZ, US
Yi-Chia Lee - Chupei, TW
Lili Wang - Chandler AZ, US
Aiping Wu - Chandler AZ, US

International Classification:

C11D 11/00
C11D 7/26
C11D 7/32
H01L 21/02
B08B 3/08

Abstract:

A microelectronic device (semiconductor substrate) cleaning composition is provided that comprises water; oxalic acid, and two or more corrosion inhibitors and methods of using the same.