Lin U Hu

US Patent:

20190294040, Sep 26, 2019

Filed:

Sep 21, 2018

Appl. No.:

16/137717

Inventors:

- Monmouth Junction NJ, US
Lin HU - Livingston NJ, US
Stephen Y. CHOU - Princeton NJ, US

Assignee:

Nanonex Corporation - Monmouth Junction NJ

International Classification:

G03F 7/00
B82Y 10/00
B29C 43/50
B29C 43/56
B29C 43/58
B29C 59/02
B82Y 40/00

Abstract:

A nanoimprint system and methods for separating imprinted substrates with nano-scale patterns from mold for manufacturing. Generally, the system includes means to create, monitor, and control relative movement between the mold and substrate for separation. It is capable of controlling where and when the separation happens and finishes. The relative movement may be generated by motion stages, springs, stage driven flexures, inflatable O-rings, gas flow, and other mechanical means. It may be monitored by separation force, overhead camera, and vacuum/pressures in different area of the system. The relative movement may be any combination of stages movements and movement sequences. The separation speed, direction, and force can be well controlled in the system to achieve fast and reliable separation between mold and substrate, and at the same time maintain the pattern shape and details on the consolidated imprint resist.

US Patent:

20190263032, Aug 29, 2019

Filed:

Sep 21, 2018

Appl. No.:

16/137660

Inventors:

- Monmouth Junction NJ, US
Lin HU - Livingston NJ, US
Wei ZHANG - Newtown PA, US
Stephen Y. CHOU - Princeton NJ, US

Assignee:

Nanonex Corporation - Monmouth Junction NJ

International Classification:

B29C 43/58
B29C 43/02
G03F 7/00
B29C 39/02
B29C 59/02

Abstract:

A nanoimprint lithography system and method for manufacturing substrates with nano-scale patterns, having a process chamber with transparent sections on both top and side walls, a robot for automatic molds and substrates loading and unloading, and optical and stage apparatuses to obtain the desired spatial relationship between the mold and substrate, with an enclosed volume referring to mold mini-chamber being formed between the mold/holder and top wall of the chamber and with the process chamber and mini-chamber being capable of both vacuuming and pressurizing, and inside the chamber, a ring shape seal assembly is installed and a mold support assembly can be installed that aids in imprinting all the way to the edge of the substrate with various embodiments for carrying out fluid pressure imprinting, separation, measurement and control of mold and substrate gap, substrate thickness, and system axial force.

US Patent:

20180211869, Jul 26, 2018

Filed:

Mar 20, 2018

Appl. No.:

15/926274

Inventors:

- Armonk NY, US
Cheng Chi - Jersey City NJ, US
Lin Hu - Cohoes NY, US
Kafai Lai - Poughkeepsie NY, US
Chi-Chun Liu - Altamont NY, US
Jed W. Pitera - Portola Valley CA, US

International Classification:

H01L 21/768
H01L 21/02
G06F 17/50
H01L 23/528
H01L 23/522

Abstract:

A method for local pattern density control of a device layout used by graphoepitaxy directed self-assembly (DSA) processes includes importing a multi-layer semiconductor device design into an assist feature system and determining overlapping regions between two or more layers in the multi-layer semiconductor device design using at least one Boolean operation. A fill for assist features is generated to provide dimensional consistency of device features by employing the overlapping regions to provide placement of the assist features. An updated device layout is stored in a memory device.

US Patent:

20180012795, Jan 11, 2018

Filed:

Jul 11, 2016

Appl. No.:

15/206789

Inventors:

- Armonk NY, US
Cheng Chi - Jersey City NJ, US
Lin Hu - Cohoes NY, US
Kafai Lai - Poughkeepsie NY, US
Chi-Chun Liu - Altamont NY, US
Jed W. Pitera - Portola Valley CA, US

International Classification:

H01L 21/768
H01L 21/02
G06F 17/50
H01L 23/528
H01L 23/522

Abstract:

A method for local pattern density control of a device layout used by graphoepitaxy directed self-assembly (DSA) processes includes importing a multi-layer semiconductor device design into an assist feature system and determining overlapping regions between two or more layers in the multi-layer semiconductor device design using at least one Boolean operation. A fill for assist features is generated to provide dimensional consistency of device features by employing the overlapping regions to provide placement of the assist features. An updated device layout is stored in a memory device.

US Patent:

20160039126, Feb 11, 2016

Filed:

Mar 16, 2014

Appl. No.:

14/776568

Inventors:

- Monmouth Junction NJ, US
Lin Hu - Livingston NJ, US
Wei Zhang - Newton PA, US
Stephen Y. Chou - Princeton NJ, US

International Classification:

B29C 43/58
B29C 59/02
G03F 7/00
B29C 43/02

Abstract:

A nanoimprint lithography system and method for manufacturing substrates with nano-scale patterns, having a process chamber with transparent sections on both top and side walls, a robot for automatic molds and substrates loading and unloading, and optical and stage apparatuses to obtain the desired spatial relationship between the mold and substrate, with an enclosed volume referring to mold mini-chamber being formed between the mold/holder and top wall of the chamber and with the process chamber and mini-chamber being capable of both vacuuming and pressurizing, and inside the chamber, a ring shape seal assembly is installed and a mold support assembly can be installed that aids in imprinting all the way to the edge of the substrate with various embodiments for carrying out fluid pressure imprinting, separation, measurement and control of mold and substrate gap, substrate thickness, and system axial force.

US Patent:

20160031151, Feb 4, 2016

Filed:

Mar 17, 2014

Appl. No.:

14/776607

Inventors:

- Monmouth Junction NJ, US
Lin HU - Livingston NJ, US
Stephen Y. CHOU - Princeton NJ, US

International Classification:

B29C 59/02
B29C 43/56
B29C 43/50
B29C 43/58

Abstract:

A nanoimprint system and methods for separating imprinted substrates with nano-scale patterns from mold for manufacturing. Generally, the system includes means to create, monitor, and control relative movement between the mold and substrate for separation. It is capable of controlling where and when the separation happens and finishes. The relative movement may be generated by motion stages, springs, stage driven flexures, inflatable O-rings, gas flow, and other mechanical means. It may be monitored by separation force, overhead camera, and vacuum/pressures in different area of the system. The relative movement may be any combination of stages movements and movement sequences. The separation speed, direction, and force can be well controlled in the system to achieve fast and reliable separation between mold and substrate, and at the same time maintain the pattern shape and details on the consolidated imprint resist.

US Patent:

20140239529, Aug 28, 2014

Filed:

Sep 30, 2013

Appl. No.:

14/042618

Inventors:

- Monmouth Junction NJ, US
Lin Hu - Livingston NJ, US
Yi Yao - Jersey City NJ, US
Stephen Y. Chou - Princeton NJ, US

Assignee:

Nanonex Corporation - Monmouth Junction NJ

International Classification:

B29C 59/00

US Classification:

264 405, 264571, 425170

Abstract:

A system and method for patterning a substrate includes a mold holding fixture for holding a mold with nanostructures and a substrate holding fixture for holding a substrate having a molding surface, a stage assembly has two or more independent axis movements for moving either the mold or the substrate therein, a contact force sensor sensing a contact force between the mold surface and the molding surface, a chamber for holding the mold and substrate and for the applying of a pressure inside that is higher or lower than atmospheric pressure, a pressure regulator and a manifold for changing the pressure inside the chamber, a door on the chamber housing provides for selectively allowing the substrate and the mold to pass there through, and means to divide the chamber into two fluidly separate sub-chambers.