Louis E Huber from Allentown, PA

Us Patents

High Purity Tantalum, Products Containing The Same, And Methods Of Making The Same
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US Patent:

6348113, Feb 19, 2002
Filed:

Nov 25, 1998
Appl. No.:

09/199569
Inventors:

Christopher A. Michaluk - Gilbertsville PA
Louis E. Huber - Allentown PA
Mark N. Kawchak - Phoenixville PA
James D. Maguire - Norristown PA
Assignee:

Cabot Corporation - Boston MA
International Classification:

C22F 118
US Classification:

148668, 148423, 148DIG 14, 148DIG 158
Abstract:

High purity tantalum metals and alloys containing the same are described. The tantalum metal preferably has a purity of at least 99. 995% and more preferably at least 99. 999%. In addition, tantalum metal and alloys thereof are described, which either have a grain size of about 50 microns or less, or a texture in which a (100) intensity within any 5% increment of thickness is less than about 15 random, or an incremental log ratio of (111):(100) intensity of greater than about -4. 0, or any combination of these properties. Also described are articles and components made from the tantalum metal which include, but are not limited to, sputtering targets, capacitor cans, resistive film layers, wire, and the like. Also disclosed is a process for making the high purity metal which includes the step of reacting a salt-containing tantalum with at least one compound capable of reducing this salt to tantalum powder and a second salt in a reaction container. The reaction container or liner in the reaction container and the agitator or liner on the agitator are made from a metal material having the same or higher vapor pressure of melted tantalum.

High Purity Tantalum, Products Containing The Same, And Methods Of Making The Same
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US Patent:

6893513, May 17, 2005
Filed:

Aug 6, 2001
Appl. No.:

09/922815
Inventors:

Christopher A. Michaluk - Gilbertsville PA, US
Louis E. Huber - Allentown PA, US
Mark N. Kawchak - Phoenixville PA, US
Assignee:

Cabot Corporation - Boston MA
International Classification:

C22C027/02
US Classification:

148422, 420427
Abstract:

High purity tantalum metals and alloys containing the same are described. The tantalum metal preferably has a purity of at least 99. 995% and more preferably at least 99. 999%. In addition, tantalum metal and alloys thereof are described, which either have a grain size of about 50 microns or less, or a texture in which a (100) intensity within any 5% increment of thickness is less than about 15 random, or an incremental log ratio of (111):(100) intensity of greater than about −4. 0, or any combination of these properties. Also described are articles and components made from the tantalum metal which include, but are not limited to, sputtering targets, capacitor cans, resistive film layers, wire, and the like. Also disclosed is a process for making the high purity metal which includes the step of reacting a salt-containing tantalum with at least one compound capable of reducing this salt to tantalum powder and a second salt in a reaction container. The reaction container or liner in the reaction container and the agitator or liner on the agitator are made from a metal material having the same or higher vapor pressure of melted tantalum.

High Purity Tantalum, Products Containing The Same, And Methods Of Making The Same
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US Patent:

7431782, Oct 7, 2008
Filed:

May 14, 2002
Appl. No.:

10/145336
Inventors:

Christopher A. Michaluk - Gilbertsville PA, US
Louis E. Huber - Allentown PA, US
Mark N. Kawchak - Phoenixville PA, US
Assignee:

Cabot Corporation - Boston MA
International Classification:

C22F 1/18
C22B 3/44
C22B 9/04
US Classification:

148668, 148DIG 158
Abstract:

High purity tantalum metals and alloys containing the same are described. The tantalum metal preferably has a purity of at least 99. 995% and more preferably at least 99. 999%. In addition, tantalum metal and alloys thereof are described, which either have a grain size of about 50 microns or less, or a texture in which a (100) intensity within any 5% increment of thickness is less than about 15 random, or an incremental log ratio of (111):(100) intensity of greater than about −4. 0, or any combination of these properties. Also described are articles and components made from the tantalum metal which include, but are not limited to, sputtering targets, capacitor cans, resistive film layers, wire, and the like. Also disclosed is a process for making the high purity metal which includes the step of reacting a salt-containing tantalum with at least one compound capable of reducing this salt to tantalum powder and a second salt in a reaction container. The reaction container or liner in the reaction container and the agitator or liner on the agitator are made from a metal material having the same or higher vapor pressure of melted tantalum.

High Purity Tantalum, Products Containing The Same, And Methods Of Making The Same
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US Patent:

7585380, Sep 8, 2009
Filed:

Dec 17, 2002
Appl. No.:

10/320980
Inventors:

Christopher A. Michaluk - Gilbertsville PA, US
Louis E. Huber - Allentown PA, US
Mark N. Kawchak - Phoenixville PA, US
Assignee:

Cabot Corporation - Boston MA
International Classification:

C22F 1/18
C22B 3/44
US Classification:

148422, 75622, 148668, 420427
Abstract:

High purity tantalum metals and alloys containing the same are described. The tantalum metal preferably has a purity of at least 99. 995% and more preferably at least 99. 999%. In addition, tantalum metal and alloys thereof are described, which either have a grain size of about 50 microns or less, or a texture in which a (100) intensity within any 5% increment of thickness is less than about 15 random, or an incremental log ratio of (111):(100) intensity of greater than about −4. 0, or any combination of these properties. Also described are articles and components made from the tantalum metal which include, but are not limited to, sputtering targets, capacitor cans, resistive film layers, wire, and the like. Also disclosed is a process for making the high purity metal which includes the step of reacting a salt-containing tantalum with at least one compound capable of reducing this salt to tantalum powder and a second salt in a reaction container. The reaction container or liner in the reaction container and the agitator or liner on the agitator are made from a metal material having the same or higher vapor pressure of melted tantalum.

Tantalum-Silicon Alloys And Products Containing The Same And Processes Of Making The Same
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US Patent:

20020011290, Jan 31, 2002
Filed:

Aug 3, 2001
Appl. No.:

09/922049
Inventors:

Louis Huber - Allentown PA, US
Christopher Michaluk - Gilbertsville PA, US
International Classification:

C22C027/02
C22F001/18
US Classification:

148/668000, 420/427000
Abstract:

An alloy comprising tantalum and silicon is described. The tantalum is the predominant metal present. The alloy also has a uniformity of tensile strength when formed into a wire, such that the maximum population standard deviation of tensile strength for the wire is about 3 KSI for an unannealed wire at finish diameter and about 2 KSI for an annealed wire at finish diameter. Also described is a process of making a Ta—Si alloy which includes reducing a silicon-containing solid and a tantalum-containing solid into a liquid state and mixing the liquids to form a liquid blend and forming a solid alloy from the liquid blend. Another process of making a Ta—Si alloy is described which involves blending powders containing tantalum or an oxide thereof with powders containing silicon or a silicon-containing compound to form a blend and then reducing the blend to a liquid state and forming a solid alloy from the liquid state. Also, a method of increasing the uniformity of tensile strength in tantalum metal, a method of reducing embrittlement of tantalum metal, and a method of imparting a controlled mechanical tensile strength in tantalum metal are described which involve adding silicon to tantalum metal so as to form a Ta—Si alloy.

High Purity Niobium And Products Containing The Same, And Methods Of Making The Same
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US Patent:

20020072475, Jun 13, 2002
Filed:

May 21, 2001
Appl. No.:

09/861879
Inventors:

Christopher Michaluk - Gilbertsville PA, US
Louis Huber - Allentown PA, US
International Classification:

H01B001/00
H01F001/00
US Classification:

505/100000
Abstract:

High purity niobium metals and alloys containing the same are described. The niobium metal preferably has a purity of at least 99.99% and more preferably at least 99.999%. In addition, niobium metal and alloys thereof are described, which either have a grain size of about 150 microns or less, or a texture in which a (100) intensity within any 5% increment of thickness is less than about 30 random, or an incremental log ratio of (111):(100) intensity of greater than about -4.0, or any combination of these properties. Also described are articles and components made from the niobium metal which include, but are not limited to, sputtering targets, capacitor cans, resistive film layers, wire, and the like. Also disclosed is a process for making the high purity niobium metal which includes the step of reacting a salt-containing niobium and a metal salt along with at least one compound capable of reducing the salt-containing niobium to niobium and in a reaction container. The reaction container or liner in the reaction container and the agitator or liner on the agitator are made from a metal material having the same or higher vapor pressure of melted niobium. The high purity niobium product preferably has a fine and uniform microstructure.

High Integrity Sputtering Target Material And Method For Producing Bulk Quantities Of Same
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US Patent:

20050236076, Oct 27, 2005
Filed:

Dec 20, 2004
Appl. No.:

11/017224
Inventors:

Christopher Michaluk - Gilbertsville PA, US
Louis Huber - Allentown PA, US
P. Alexander - Berwyn PA, US
International Classification:

C23C014/34
C22F001/00
US Classification:

148559000, 204298120, 204298130
Abstract:

A method of making metal plates as well as sputtering targets is described. In addition, products made by the process of the present invention are further described. The present invention preferably provides a product with reduced or minimized marbleizing on the surface of the metal product which has a multitude of benefits.

High Integrity Sputtering Target Material And Method For Producing Bulk Quantities Of Same
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US Patent:

20050252268, Nov 17, 2005
Filed:

Jan 14, 2005
Appl. No.:

11/036759
Inventors:

Christopher Michaluk - Gilbertsville PA, US
Louis Huber - Allentown PA, US
P. Alexander - Berwyn PA, US
Craig Carpenter - Birdsboro PA, US
International Classification:

B21B023/00
US Classification:

072365200
Abstract:

A method of making metal plates as well as sputtering targets is described. In addition, products made by the process of the present invention are further described. The present invention preferably provides a product with reduced or minimized marbleizing on the surface of the metal product which has a multitude of benefits.

St. Philomena's Church (Cincinnati Ohio)

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…The cornerstone was laid August 23, 1846. Rev. Louis Huber, O.S.F., and after him, Rev. B. Hengehold, directed the building of the church. The dedication ceremonies were performed by Archbishop John Baptist Purcell, May 21, 1848, though services had been held since the January previous in th...

Louis Huber - Lawyer

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Office:

Schlee, McMullen, McCarthy & Hansen, P.C.

Specialties:

Civil Litigation
Civil Appeals
Commercial Litigation
Propane Products Liability
Natural Gas
Fire Loss
Explosions
Torts
Personal Injury Litigation
Products Liability
Environmental Litigation
Insurance Coverage
Class Action Defense

ISLN:

906332441

Admitted:

1977

University:

University of Kansas, B.S., 1974

Law School:

Harvard University, J.D., 1977