Margaret Isabel Lawson

US Patent:

20150369789, Dec 24, 2015

Filed:

Jun 23, 2014

Appl. No.:

14/311380

Inventors:

- Armonk NY, US
Martin Glodde - Mahwah NJ, US
Margaret C. Lawson - Lagrangeville NY, US
Janine L. Protzman - Poughkeepsie NY, US
Qin Yuan - Poughquag NY, US

International Classification:

G01N 33/44

Abstract:

A method of testing the cleanability of polymerized sublimate outgassed from a lithography material during a thermal heating process including; placing a wafer on a wafer hotplate inside a chamber with the wafer being covered by a lithography material; placing a target, having a starting composition, above the wafer in the chamber; heating the wafer using the wafer hotplate in an attempt to outgas a sublimate, where the sublimate condenses on the target; forming a polymerized sublimate on the target; and applying organic solvents to the target to determine the cleanability of the polymerized sublimate.