Mark C Contreras

US Patent:

6055150, Apr 25, 2000

Filed:

Nov 6, 1998

Appl. No.:

9/188038

Inventors:

Jon Clinton - San Jose CA
Mark Contreras - San Jose CA
Anand H. Kumar - Milpitas CA
Shamouil Shamouilian - San Jose CA
You Wang - Sunnyvale CA
Surinder Bedi - Fremont CA

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

H02N 1300

US Classification:

361234

Abstract:

A failure resistant electrostatic chuck 20 for holding a substrate 35 during processing of the substrate 35 comprises one or more electrodes 25 covered by an insulator 30, the electrodes 25 capable of electrostatically holding a substrate 35 when a voltage is applied thereto. An electrical power bus 40 comprises one or more output terminals 45 that conduct voltage to the electrodes 25. The fuses 50 are positioned in hollow cavities 55 in the insulator 30, and electrically connect the electrodes 25 in series to the output terminals 45 of the power bus 40. Each fuse 50 can electrically disconnect an electrode 25 from an output terminal 45 when the insulator 30 covering the electrode 25 punctures and exposes the electrode 25 to a plasma process environment thereby causing a plasma current discharge to flow through the fuse 50.

US Patent:

57371776, Apr 7, 1998

Filed:

Oct 17, 1996

Appl. No.:

8/730885

Inventors:

Richard Raymond Mett - Santa Clara CA
Mahmoud Dahimene - Sunnyvale CA
Paul E. Luscher - Sunnyvale CA
Siamak Salimian - Sunnyvale CA
Mark Steven Contreras - Sunnyvale CA

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

H02N 1300

US Classification:

361234

Abstract:

A method and apparatus for actively controlling the DC cathode potential of a wafer support pedestal within a semiconductor wafer processing system. The apparatus contains a variable DC power supply coupled through an RF filter to a cathode pedestal. The variable DC power supply is actively controlled by a control signal generated by a cathode bias control unit, e. g. , a computer or other control circuitry. The cathode bias control unit can be as simple as an operator adjustable control signal, e. g. , a rheostat. However, for more accurate control of the DC power supply, a feedback circuit is used that generates a control signal that is proportional to the peak-to-peak voltage on a cathode pedestal. The application of the DC bias to the pedestal reduces the DC potential difference between the wafer and the cathode and, thereby avoids arcing from the wafer to the pedestal.