Mark A O'Neill from 108 Jasmine Ct, Lufkin, TX 75901, age 63, Phone: 9366320799

Business Technology Director, Silicon Precursors At Air Products And Chemicals

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Position:

Business Technology Director, Silicon Precursors at Air Products and Chemicals

Location:

Greater San Diego Area

Industry:

Chemicals

Work:

Air Products and Chemicals - Carlsbad, CA since Oct 2012
Business Technology Director, Silicon Precursors
Air Products and Chemicals - Carlsbad, CA Jan 2011 - Dec 2012
Carlsbad Technology Manager
Air Products & Chemicals, Inc. - Carlsbad, CA Oct 2010 - Dec 2012
Director of Intellectual Property, Electronics Division
Air Products & Chemicals - Carlsbad, CA Sep 2009 - Sep 2012
Lead, Silicon Dielectrics Technology
Air Products and Chemicals, Inc. Jul 2009 - Dec 2010
Manager, New Products Research and Commercialization

Education:

University of Pittsburgh 1997 - 1997
postdoc, Chemical Engineering The University of Texas at Austin 1995 - 1997
postdoc, chemistry, chemical engineering National Research Councel of Canada 1991 - 1994
Doctor of Philosophy (PhD), Physical Chemistry Carleton University 1985 - 1994
PhD, Physical Chemistry

Skills:

Intellectual Property Strategy
New Product Innovation
Semiconductor Manufacturing
Materials
Chemistry
Electronics
Manufacturing
Polymers
R&D
Commercialization
Chemical Engineering
Technology Development
Patents
Characterization
Process Development
Semiconductors
Materials Science
Thin Films
Intellectual Property
Team Leadership
Chemicals
Nanotechnology
Cross-functional Team Leadership
Innovation Management
Competitive Intelligence
Strategy Development

Mark O'neill

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Mark O'neill

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Mark O'neill

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Mark O'neill

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Mark O'neill

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Mark O'neill

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Location:

United States

Mark O'neill

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Location:

United States

Us Patents

Process Stability Of Nbde Using Substituted Phenol Stabilizers
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US Patent:

8173213, May 8, 2012
Filed:

May 21, 2009
Appl. No.:

12/470002
Inventors:

Steven Gerard Mayorga - Oceanside CA, US
Mary Kathryn Haas - Emmaus PA, US
Mark Leonard O'Neill - Allentown PA, US
Dino Sinatore - Whitehall PA, US
Assignee:

Air Products and Chemicals, Inc. - Allentown PA
International Classification:

C09K 15/08
C10L 1/183
C23C 16/40
H01L 21/00
US Classification:

42725537, 42725518, 42725523, 42725528, 25218229, 252404, 438758
Abstract:

A stabilized cyclic alkene composition comprising one or more cyclic alkenes, and at least one stabilizer compound having the Formula (I),R,R,R,R,R(C)OH Formula (I)A method for forming a layer of carbon-doped silicon oxide on a substrate, which uses the stabilized alkene composition and a silicon containing compound.

Low-Impurity Organosilicon Product As Precursor For Cvd
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US Patent:

8329933, Dec 11, 2012
Filed:

Aug 8, 2011
Appl. No.:

13/205015
Inventors:

Steven Gerard Mayorga - Oceanside CA, US
Mark Leonard O'Neill - San Marcos CA, US
Kelly Ann Chandler - San Marcos CA, US
Assignee:

Air Products and Chemicals, Inc. - Allentown PA
International Classification:

C07F 7/04
US Classification:

556470, 556442, 556466, 556467, 556471
Abstract:

The present invention provides an organosilicon composition comprising diethoxymethylsilane, a concentration of dissolved residual chloride, and a concentration of dissolved residual chloride scavenger that does not yield unwanted chloride salt precipitate when combined with another composition comprising diethoxymethylsilane.

Stabilizers For The Stabilization Of Unsaturated Hydrocarbon-Based Precursor
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US Patent:

8440099, May 14, 2013
Filed:

May 28, 2008
Appl. No.:

12/128381
Inventors:

Steven Gerard Mayorga - Oceanside CA, US
Kelly Ann Chandler - San Marcos CA, US
Mary Kathryn Haas - Emmaus PA, US
Mark Leonard O'Neill - Allentown PA, US
Dino Sinatore - Whitehall PA, US
Assignee:

Air Products and Chemicals, Inc. - Allentown PA
International Classification:

C09K 3/00
C09K 15/20
US Classification:

25218229, 252403
Abstract:

A stabilized composition consists essentially of unsaturated hydrocarbon-based materials, and a stabilizer selected from the group consisting of a hydroxybenzophenone and a nitroxyl radical based stabilizer. A stabilized composition consists essentially of unsaturated hydrocarbon-based materials, at least one polar liquid and a stabilizer selected from the group consisting of a hydroxybenzophenone, a nitroxyl radical based stabilizer and a hydroquinone based stabilizer. A method for stabilizing unsaturated hydrocarbon-based precursor material against the polymerization comprises providing a stabilizer selected from the group consisting of a hydroxybenzophenone and a nitroxyl radical based stabilizer. A method for stabilizing a mixture of unsaturated hydrocarbon-based precursor material with at lease one polar liquid against the polymerization comprises adding to the mixture, a stabilizer selected from the group consisting of a hydroxybenzophenone and a nitroxyl radical based stabilizer.

Methods For Depositing Silicon Dioxide Or Silicon Oxide Films Using Aminovinylsilanes
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US Patent:

8460753, Jun 11, 2013
Filed:

Dec 9, 2010
Appl. No.:

12/964266
Inventors:

Manchao Xiao - San Diego CA, US
Liu Yang - Yorba Linda CA, US
Kirk Scott Cuthill - Vista CA, US
Heather Regina Bowen - Vista CA, US
Bing Han - Lansdale PA, US
Mark Leonard O'Neill - San Marcos CA, US
Assignee:

Air Products and Chemicals, Inc. - Allentown PA
International Classification:

C23C 16/40
US Classification:

42725531, 42725537, 117 84, 117 88
Abstract:

Described herein are methods to form silicon dioxide films that have extremely low wet etch rate in HF solution using a thermal CVD process, ALD process or cyclic CVD process in which the silicon precursor is selected from one of:.

Process For Producing Silicon And Oxide Films From Organoaminosilane Precursors
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US Patent:

8530361, Sep 10, 2013
Filed:

Dec 22, 2010
Appl. No.:

12/976041
Inventors:

Manchao Xiao - San Diego CA, US
Xinjian Lei - Vista CA, US
Heather Regina Bowen - Vista CA, US
Mark Leonard O'Neill - San Marcos CA, US
Assignee:

Air Products and Chemicals, Inc. - Allentown PA
International Classification:

H01L 21/31
US Classification:

438781, 438739, 438784, 438793, 438794, 438795, 257E21274
Abstract:

A method for depositing a silicon containing film on a substrate using an organoaminosilane is described herein. The organoaminosilanes are represented by the formulas:.

Low-Impurity Organosilicon Product As Precursor For Cvd
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US Patent:

20070287849, Dec 13, 2007
Filed:

May 24, 2007
Appl. No.:

11/753153
Inventors:

Steven Mayorga - Oceanside CA, US
Mark O'Neill - Allentown PA, US
Kelly Chandler - San Marcos CA, US
Assignee:

AIR PRODUCTS AND CHEMICALS, INC. - Allentown PA
International Classification:

C07F 7/08
US Classification:

556467000
Abstract:

The present invention provides an organosilicon composition comprising diethoxymethylsilane, a concentration of dissolved residual chloride, and a concentration of dissolved residual chloride scavenger that does not yield unwanted chloride salt precipitate when combined with another composition comprising diethoxymethylsilane.

Organoaminosilane Precursors And Methods For Depositing Films Comprising Same
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US Patent:

20120128897, May 24, 2012
Filed:

May 24, 2011
Appl. No.:

13/114287
Inventors:

Manchao Xiao - San Diego CA, US
Mark Leonard O'Neill - San Marcos CA, US
Heather Regina Bowen - Vista CA, US
Hansong Cheng - Singapore, SG
Xinjian Lei - Vista CA, US
Assignee:

AIR PRODUCTS AND CHEMICALS, INC. - Allentown PA
International Classification:

C23C 16/44
C23C 16/50
C23C 16/36
C23C 16/40
C07F 7/10
C23C 16/34
US Classification:

427579, 556410, 548406, 4272481, 427569, 427578
Abstract:

Described herein are precursors and methods of forming dielectric films. In one aspect, there is provided a silicon precursor having the following formula I:wherein Ris independently selected from hydrogen, a linear or branched Cto Calkyl, a linear or branched Cto Calkenyl, a linear or branched Cto Calkynyl, a Cto Calkoxy, a Cto Cdialkylamino and an electron withdrawing group and n is a number selected from 0, 1, 2, 3, 4, and 5; and Ris independently selected from hydrogen, a linear or branched Cto Calkyl, a linear or branched Cto Calkenyl, a linear or branched Cto Calkynyl, a Cto Calkoxy, a Cto Cdialkylamino, a Cto Caryl, a linear or branched Cto Cfluorinated alkyl, and a Cto Ccyclic alkyl group.

Halogenated Organoaminosilane Precursors And Methods For Depositing Films Comprising Same
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US Patent:

20130078392, Mar 28, 2013
Filed:

Sep 18, 2012
Appl. No.:

13/622117
Inventors:

Manchao Xiao - San Diego CA, US
Xinjian Lei - Vista CA, US
Mark Leonard O'Neill - San Marcos CA, US
Bing Han - Beijing, CN
Ronald Martin Pearlstein - San Marcos CA, US
Haripin Chandra - Vista CA, US
Heather Regina Bowen - Vista CA, US
Agnes Derecskei-Kovacs - Macungie PA, US
Assignee:

AIR PRODUCTS AND CHEMICALS, INC. - Allentown PA
International Classification:

C07F 7/02
US Classification:

427579, 427255394, 427578, 4272481, 118715, 556410, 546 14, 548406, 544105, 10628711
Abstract:

Described herein are precursors and methods of forming films. In one aspect, there is provided a precursor having Formula I:wherein X is selected from Cl, Br, I; Ris selected from linear or branched C-Calkyl group, a C-Calkenyl group, a C-Calkynyl group, a C-Ccyclic alkyl, and a C-Caryl group; Ris selected from a linear or branched C-Calkyl, a C-Calkenyl group, a C-Calkynyl group, a C-Ccyclic alkyl group, and a C-Caryl group; Ris selected from a branched C-Calkyl group, a C-Calkenyl group, a C-Calkynyl group, a C-Ccyclic alkyl group, and a C-Caryl group; m is 1 or 2; n is 0, 1, or 2; p is 0, 1 or 2; and m+n+p is less than 4, wherein Rand Rare linked or not linked to form a ring.