Jennifer J. Patterson - Mesa AZ Mark S. Swenson - Higley AZ Clifford I. Drowley - Scottsdale AZ
Assignee:
Motorola, Inc. - Schuamburg IL
International Classification:
H01L 27148
US Classification:
257225, 257229, 257233, 257240, 438 75
Abstract:
An electronic component having an image sensing device ( ) and a method for improving pixel charge transfer in the image sensing device ( ). The image sensing device ( ) has a transfer gate ( ) between a source region ( ) and an image sensing region. The image sensing region is formed to have a wider device width proximate to the transfer gate ( ) than at a point distal from the transfer gate ( ).
Method Of Forming A Semiconductor Image Sensor And Structure
Clifford I. Drowley - Phoenix AZ Robert M. Guidash - Rush NY Mark S. Swenson - Higley AZ
Assignee:
Motorola Inc. - Schaumburg IL Eastman Kodak Co. - Rochester NY
International Classification:
H01L 2972
US Classification:
257292
Abstract:
An image sensor (10) has an image sensing element that includes an N-type conducting region (26) and a P-type pinned layer (37). The two regions form two P-N junctions at different depths that increase the efficiency of charge carrier collection at different frequencies of light. The conducting region (26) is formed by an angle implant that ensures that a portion of the conducting region (26) can function as a source of an MOS transistor (32).
Clifford I. Drowley - Phoenix AZ Mark S. Swenson - Higley AZ Jennifer J. Patterson - Mesa AZ Shrinath Ramaswami - Gilbert AZ
Assignee:
Motorola, Inc. - Schaumburg IL
International Classification:
H01L 2100
US Classification:
438 57
Abstract:
An image sensor (10) has an image sensing element that includes an N-type conducting region (26) and a P-type pinned layer (37). The two regions form two P-N junctions at different depths that increase the efficiency of charge carrier collection at different frequencies of light. The conducting region (26) is formed by an angle implant that ensures that a portion of the conducting region (26) can function as a source of a MOS transistor (32).
Clifford I. Drowley - Phoenix AZ Mark S. Swenson - Higley AZ Jennifer J. Patterson - Mesa AZ Shrinath Ramaswami - Gilbert AZ
Assignee:
Motorola, Inc. - Schaumburg IL
International Classification:
H01L 31062 H01L 31113
US Classification:
257292
Abstract:
An image sensor (10) has an image sensing element that includes an N-type conducting region (26) and a P-type pinned layer (37). The two regions form two P-N junctions at different depths that increase the efficiency of charge carrier collection at different frequencies of light. The conducting region (26) is formed by an angle implant that ensures that a portion of the conducting region (26) can function as a source of an MOS transistor (32).
Knollwood Elementary School Sheffield Lake OH 1974-1975, Hutchinson Elementary School Pelham NY 1975-1978, Pleasantville Middle School Pleasantville NY 1978-1981
Community:
Gene Malone, Denise Rubbo, Amy Mittelstadt, Janice Carey, Joanna Daniele, Bob Doe, Mary Angel, Lisa Scavelli, Kirsten Briese, Jimmy Nobody, Joseph Parise, Maureen Patrick