Martin A Richardson

US Patent:

6377651, Apr 23, 2002

Filed:

Oct 10, 2000

Appl. No.:

09/685291

Inventors:

Martin Richardson - Geneva FL
Guido Shriever - Göttingen, DE

Assignee:

University of Central Florida - Orlando FL

International Classification:

G21K 500

US Classification:

378 34, 378119

Abstract:

A laser produced extreme ultraviolet (EUV) source based on a water droplet target has been implemented an auxiliary electrode system between the source and the first collector mirror. The auxiliary electrode system creates a repeller electric field, possibly a dc voltage imposed on the mirror that slows down and reverses the trajectories of ions from the source before they impact the collection mirror. The source modified according to the invention was evaluated with respect to the demands of EUV lithography and found to have much extended operational lifetimes. The spectral distribution of the generated radiation as well as the conversion efficiency into line radiation at 13 nm was determined. Long time measurements of the reflectivity of silicon/molybdenum multilayer mirrors for up to from 10 to 10 shots show the useful influence of the treatment of ions emitted from the source. Several methods of debris reduction were tested and discussed.

US Patent:

6831963, Dec 14, 2004

Filed:

Jun 14, 2001

Appl. No.:

09/881620

Inventors:

Martin Richardson - Geneva FL

Assignee:

University of Central Florida - Orlando FL

International Classification:

H01J 3508

US Classification:

378119, 378143

Abstract:

Metallic solutions at room temperature used a laser point source target droplets. Using the target metallic solutions results in damage free use to surrounding optical components since no debris are formed. The metallic solutions can produce plasma emissions in the X-rays, XUV, and EUV (extreme ultra violet) spectral ranges of approximately 11. 7 nm and 13 nm. The metallic solutions can include molecular liquids or mixtures of elemental and molecular liquids, such as metallic chloride solutions, metallic bromide solutions, metallic sulphate solutions, metallic nitrate solutions, and organo-metallic solutions. The metallic solutions do not need to be heated since they are in a solution form at room temperatures.

US Patent:

6862339, Mar 1, 2005

Filed:

Mar 8, 2004

Appl. No.:

10/795814

Inventors:

Martin Richardson - Geneva FL, US

Assignee:

University of Central Florida - Orlando FL

International Classification:

H01J035/08

US Classification:

378119, 378143

Abstract:

Special liquid droplet targets that are irradiated by a high power laser and are plasmarized to form a point source EUV, XUV and x-ray source. Various types of liquid droplet targets include metallic solutions, and nano-sized particles in solutions having a melting temperature lower than the melting temperature of some or all of the constituent metals, used a laser point source target droplets. The solutions have no damaging debris and can produce plasma emissions in the X-rays, XUV, and EUV(extreme ultra violet) spectral ranges of approximately 0. 1 nm to approximately 100 nm, approximately 11. 7 nm and 13 nm, approximately 0. 5 nm to approximately 1. 5 nm, and approximately 2. 3 nm to approximately 4. 5 nm. The second type of target consists of various types of liquids which contain as a miscible fluid various nano-size particles of different types of metals and non-metal materials.

US Patent:

6865255, Mar 8, 2005

Filed:

Oct 19, 2001

Appl. No.:

10/082658

Inventors:

Martin Richardson - Geneva FL, US

Assignee:

University of Central Florida - Orlando FL

International Classification:

G21G004/00

US Classification:

378119, 378124, 378143

Abstract:

Special liquid droplet targets that are irradiated by a high power laser and are plasmarized to form a point source EUV, XUV and x-ray source. Various types of liquid droplet targets include metallic solutions, and nano-sized particles in solutions having a melting temperature lower than the melting temperature of some or all of the constituent metals, used a laser point source target droplets. The solutions have no damaging debris and can produce plasma emissions in the X-rays, XUV, and EUV(extreme ultra violet) spectral ranges of approximately 0. 1 nm to approximately 100 nm, approximately 11. 7 nm and 13 nm, approximately 0. 5 nm to approximately 1. 5 nm, and approximately 2. 3 nm to approximately 4. 5 nm. The second type of target consists of various types of liquids which contain as a miscible fluid various nano-size particles of different types of metals and non-metal materials.

US Patent:

6998785, Feb 14, 2006

Filed:

Jul 12, 2002

Appl. No.:

10/194387

Inventors:

William T. Silfvast - St. Helena CA, US
Martin C. Richardson - Geneva FL, US

Assignee:

University of Central Florida Research Foundation, Inc. - Orlando FL

International Classification:

H01J 7/24
H05B 31/26

US Classification:

31511171, 31511101, 250504 R, 378119, 31323131, 31323161, 118723 MP

Abstract:

Plasma discharge sources for generating emissions in the VUV, EUV and X-ray spectral regions. Embodiments can include running a current through liquid jet streams within space to initiate plasma discharges. Additional embodiments can include liquid droplets within the space to initiate plasma discharges. One embodiment can form a substantially cylindrical plasma sheath. Another embodiment can form a substantially conical plasma sheath. Another embodiment can form bright spherical light emission from a cross-over of linear expanding plasmas. All the embodiments can generate light emitting plasmas within a space by applying voltage to electrodes adjacent to the space. All the radiative emissions are characteristic of the materials comprising the liquid jet streams or liquid droplets.

US Patent:

7092488, Aug 15, 2006

Filed:

Mar 8, 2004

Appl. No.:

10/795884

Inventors:

Martin Richardson - Geneva FL, US

Assignee:

University of Central Florida Research Foundation, Inc. - Orlando FL

International Classification:

H05G 2/00

US Classification:

378119, 378143

Abstract:

Metallic solutions at room temperature used a laser point source target droplets. Using the target metallic solutions results in damage free use to surrounding optical components since no debris are formed. The metallic solutions can produce plasma emissions in the X-rays, XUV, and EUV(extreme ultra violet) spectral ranges of approximately 11. 7 nm and 13 nm. The metallic solutions can include molecular liquids or mixtures of elemental and molecular liquids, such as metallic chloride solutions, metallic bromide solutions, metallic sulphate solutions, metallic nitrate solutions, and organo-metallic solutions. The metallic solutions do not need to be heated since they are in a solution form at room temperatures.

US Patent:

7391851, Jun 24, 2008

Filed:

Aug 14, 2006

Appl. No.:

11/503703

Inventors:

Martin Richardson - Geneva FL, US

Assignee:

University of Central Florida Research Foundation, Inc. - Orlando FL

International Classification:

H05G 2/00

US Classification:

378119, 378124, 378143, 250504 R

Abstract:

Metallic solutions at room temperature used a laser point source target droplets. Using the target metallic solutions results in damage free use to surrounding optical components since no debris are formed. The metallic solutions can produce plasma emissions in the X-rays, XUV, and EUV(extreme ultra violet) spectral ranges of approximately 11. 7 nm and 13 nm. The metallic solutions can include molecular liquids or mixtures of elemental and molecular liquids, such as metallic chloride solutions, metallic bromide solutions, metallic sulphate solutions, metallic nitrate solutions, and organo-metallic solutions. The metallic solutions do not need to be heated since they are in a solution form at room temperatures.

US Patent:

7492867, Feb 17, 2009

Filed:

Nov 5, 2004

Appl. No.:

10/982380

Inventors:

Martin Richardson - Geneva FL, US

Assignee:

University of Central Flordia Research Foundation, Inc. - Orlando FL

International Classification:

H05G 2/00

US Classification:

378119, 250504 R

Abstract:

Methods, systems and apparatus for using nanoparticle seeded short-wavelength discharge generator sources discharge sources, for use with X-ray, XUV and EUV light emissions. Applications can include EUV lithography. Additional embodiments can use the generator sources for Hollow Cathode Plasma Discharge (HCPD) lamps, and dense plasma focus (DPF) devices and other sources. Target streams of gases such as Xe and nanoparticles such as tin, copper, or lithium can be heated with laser type sources to emit nano-droplets therefrom.