Mathew O Davis

US Patent:

20100190098, Jul 29, 2010

Filed:

Jan 27, 2009

Appl. No.:

12/360701

Inventors:

QUENTIN E. WALKER - Fremont CA, US
MATHEW F. DAVIS - Felton CA, US
DANNY CHIEN LU - Gilroy CA, US

Assignee:

APPLIED MATERIALS, INC. - Santa Clara CA

International Classification:

G03C 5/00

US Classification:

430 30

Abstract:

Methods and apparatus for monitoring and detecting absorbed infrared radiation endpoint(s) are provided herein. In some embodiments, a method for determining an endpoint of a photoresist removal process may include removing a photoresist from a substrate disposed in a process chamber using reactive species provided to the process chamber from a remote plasma source. Infrared radiation is directed into the at least one of the reactive species or process byproducts while removing the photoresist. A quantity of infrared radiation absorbed by at least one of the reactive species or process byproducts during the removal process is monitored. The photoresist removal process may be ended based upon the monitored quantity reaching a predetermined level.