Mats G Ottosson

US Patent:

8061820, Nov 22, 2011

Filed:

Feb 19, 2009

Appl. No.:

12/389317

Inventors:

Mats Ottosson - Cupertino CA, US
Christoph Menzel - New London NH, US
Paul A. Hoisington - Hanover NH, US

Assignee:

FUJIFILM Corporation

International Classification:

B41J 2/045
H01L 41/00
H02N 2/00

US Classification:

347 68, 347 71, 310317, 310365

Abstract:

Methods, systems, and apparatus for drive a pumping chamber of a fluid ejection system are disclosed. In one implementation, the actuator for drive the pumping chamber includes a continuous piezoelectric layer between a pair of drive electrodes and a continuous reference electrode. The pair of drive electrodes includes an inner electrode and an outer electrode surrounding the inner electrode. The actuator is further coupled to a controller which, during a fluid ejection cycle, applies a negative voltage pulse differential to the outer electrode to expand the pumping chamber for a first time period, then applies another negative voltage pulse differential to the inner electrode during a second time period after the first time period to contract the pumping chamber to eject a fluid drop.

US Patent:

8133362, Mar 13, 2012

Filed:

Feb 26, 2010

Appl. No.:

12/714409

Inventors:

Jeffrey Birkmeyer - San Jose CA, US
Youming Li - San Jose CA, US
Steve Deming - San Jose CA, US
Mats G. Ottosson - Cupertino CA, US

Assignee:

FUJIFILM Corporation - Tokyo

International Classification:

C23C 14/34

US Classification:

20419218, 20419215, 20419212, 20429806, 20429808, 20429815, 20429814

Abstract:

A physical vapor deposition apparatus includes a vacuum chamber having side walls, a cathode inside the vacuum chamber, wherein the cathode is configured to include a sputtering target, a radio frequency power supply configured to apply power to the cathode, an anode inside and electrically connected to the side walls of the vacuum chamber, a chuck inside and electrically isolated from the side walls of the vacuum chamber, the chuck configured to support a substrate, a clamp configured to hold the substrate to the chuck, wherein the clamp is electrically conductive, and a plurality of conductive electrodes attached to the clamp, each electrode configured to compress when contacted by the substrate.

US Patent:

8240796, Aug 14, 2012

Filed:

Jul 9, 2009

Appl. No.:

12/500557

Inventors:

Kevin Von Essen - San Jose CA, US
Andreas Bibl - Los Altos CA, US
John A. Higginson - Santa Clara CA, US
Steve Deming - San Jose CA, US
Mats G. Ottosson - Cupertino CA, US

Assignee:

FUJIFILM Corporation - Tokyo

International Classification:

B41J 29/38

US Classification:

347 9

Abstract:

A fluid ejector includes a fluid ejection assembly, a housing, and an insert. The fluid ejection assembly includes one or more silicon bodies and a plurality of actuators. The one or more silicon bodies includes a silicon body having a plurality of fluid passages for fluid flow and a plurality of nozzles fluidically connected to the plurality of fluid passages. The plurality of actuators cause fluid in the plurality of fluid passages to be ejected from the plurality of nozzles. The housing assembly includes one or more plastic bodies, at least one plastic body attached to at least one silicon body to form a sealed volume on a side of the fluid ejection assembly opposite the nozzles. The insert is embedded in the at least one plastic body in proximity to the at least one silicon body, the insert having a coefficient of thermal expansion of less than 9 ppm/ C.

US Patent:

8403465, Mar 26, 2013

Filed:

Feb 25, 2010

Appl. No.:

12/712614

Inventors:

Kevin Von Essen - San Jose CA, US
Mats G. Ottosson - Cupertino CA, US
Paul A. Hoisington - Hanover NH, US
Christoph Menzel - New London NH, US

Assignee:

FUJIFILM Corporation - Tokyo

International Classification:

B41J 2/175

US Classification:

347 85

Abstract:

A fluid droplet ejection apparatus includes a substrate having a fluid inlet passage, a plurality of nozzles, and a plurality of flow paths each fluidically connecting the fluid inlet passage to an associated nozzle of the plurality of nozzles. Each flow path includes a pumping chamber connected to the associated nozzle and an ascender fluidically connected between the fluid inlet passage and the pumping chamber. The ascender is located proximate to an outside edge of the fluid inlet passage.

US Patent:

8573750, Nov 5, 2013

Filed:

Oct 28, 2009

Appl. No.:

12/607778

Inventors:

Paul A. Hoisington - Hanover NH, US
Andreas Bibl - Los Altos CA, US
Mats G. Ottosson - Cupertino CA, US
Deane A. Gardner - Cupertino CA, US

Assignee:

FUJIFILM Corporation - Tokyo

International Classification:

B41J 2/045
B41J 2/04
H01H 85/04

US Classification:

347 68, 347 54, 337290

Abstract:

Systems and apparatus for ejecting fluid. A fluid injection apparatus includes a fluid ejector unit for ejecting a droplet of fluid, an integrated circuit, and a conductive trace electrically coupling the fluid ejector unit and the integrated circuit. A portion of the conductive trace includes a fuse.

US Patent:

20120050414, Mar 1, 2012

Filed:

Oct 17, 2011

Appl. No.:

13/275201

Inventors:

Mats Ottosson - Cupertino CA, US
Christoph Menzel - New London NH, US
Paul A. Hoisington - Hanover NH, US

Assignee:

FUJIFILM CORPORATION - Tokyo

International Classification:

B41J 2/045
F04B 49/06

US Classification:

347 68, 417 53

Abstract:

Methods, systems, and apparatus for drive a pumping chamber of a fluid ejection system are disclosed. In one implementation, the actuator for drive the pumping chamber includes a continuous piezoelectric layer between a pair of drive electrodes and a continuous reference electrode. The pair of drive electrodes includes an inner electrode and an outer electrode surrounding the inner electrode. The actuator is further coupled to a controller which, during a fluid ejection cycle, applies a negative voltage pulse differential to the outer electrode to expand the pumping chamber for a first time period, then applies another negative voltage pulse differential to the inner electrode during a second time period after the first time period to contract the pumping chamber to eject a fluid drop.

US Patent:

20130293065, Nov 7, 2013

Filed:

Oct 9, 2012

Appl. No.:

13/648225

Inventors:

Arman HAJATI - Santa Clara CA, US
Mats OTTOSSON - Santa Clara CA, US

International Classification:

H01L 41/113

US Classification:

310334

Abstract:

Piezoelectric micromachined ultrasonic transducer (pMUT) arrays and systems comprising pMUT arrays are described. In an embodiment, coupling strength within a population of transducer elements provides degenerate mode shapes that split for wide bandwidth total response while less coupling strength between adjacent element populations provides adequately low crosstalk between the element populations. In an embodiment, differing membrane sizes within a population of transducer elements provides differing frequency response for wide bandwidth total response while layout of the differing membrane sizes between adjacent element populations provides adequately low crosstalk between the element populations. In an embodiment, close packing of membranes within a population of transducer elements provides improved efficiency for the wide bandwidth embodiments. In an embodiment, elliptical piezoelectric membranes provide multiple resonant modes for wide bandwidth total response and high efficiency while orthogonality of the semi-principal axes between adjacent element populations provides adequately low crosstalk between the element populations.

US Patent:

60476001, Apr 11, 2000

Filed:

Aug 28, 1998

Appl. No.:

9/143126

Inventors:

Mats G. Ottosson - Sunnyvale CA
Karen Hong - Mountain View CA

Assignee:

Topaz Technologies, Inc. - Sunnyvale CA

International Classification:

G01H 500

US Classification:

73597

Abstract:

The present invention relates to methods for determining the uniformity of the piezoelectric effect throughout a piezoelectric material using the time-of-flight of an acoustic wave through the material as a gauge of that uniformity.