Emergency Medicine PhysicianEmergency Medicine Physicians 232 W 25 St, Erie, PA 16544 8556870618 (phone), 3304928489 (fax)
Education:
Medical School Midwestern University/ Chicago College of Osteopathic Medicine Graduated: 1986
Languages:
English
Description:
Dr. McCarthy graduated from the Midwestern University/ Chicago College of Osteopathic Medicine in 1986. He works in Erie, PA and specializes in Emergency Medicine. Dr. McCarthy is affiliated with Saint Vincent Hospital.
Dr. Mccarthy graduated from the Duke University School of Medicine in 2009. He works in Drexel Hill, PA and specializes in Pediatrics. Dr. Mccarthy is affiliated with Delaware County Memorial Hospital and Riddle Hospital.
General Corporate Law and Commercial Transactions Mergers & Acquisitions Real Estate Law Labor and Employment Law
ISLN:
905041900
Admitted:
1973, Missouri 1991, Colorado
University:
Dartmouth College, Hanover, New Hampshire, A.B., cum laude, 1969
Law School:
Vanderbilt University School of Law, Nashville, Tennessee, J.D., 1972
Links:
Site
Biography:
Matthew M. McCarthy has substantial experience in providing legal advice to businesses on a wide variety of contractual and operational issues. Business clients range in size from sole proprietorships...
Arno Jan Bleeker - Westerhoven, NL Pieter Willem Herman De Jager - Rotterdam, NL Jason Douglas Hintersteiner - Bethel CT Borgert Kruizinga - Zoetermer, NL Matthew Eugene McCarthy - Brookfield CT Mark Oskotsky - Mamaroneck NY Lev Ryzhikov - Norwalk CT Lev Sakin - Stamford I CT Stanislav Smirnov - Bethel CT Bart Snijders - Rotterdam, NL Karel Diederick Van Der Mast - Helmond, NL Huibert Visser - Zevenhuizen, NL
Assignee:
ASML Netherlands B.V.
International Classification:
G03B 2754
US Classification:
355 67, 355 53, 355 77, 353 30
Abstract:
An imaging apparatus according to one embodiment of the invention includes a programmable patterning structure configured to pattern a projection beam of radiation according to a desired pattern. The programmable patterning structure includes a plurality of separate patterning sub-elements, each sub-element being configured to generate a patterned sub-beam. At least one of the separate patterning sub-elements is configured to generate a patterned sub-beam whose cross-section contains regions of different intensities. The imaging apparatus also includes a combining structure configured to combine the plurality of patterned sub-beams into a single patterned image, and a projection system configured to project the patterned image onto a target portion of a substrate.
Arno Jan Bleeker - Westerhoven, NL Pieter Willem Herman De Jager - Rotterdam, NL Jason Douglas Hintersteiner - Bethel CT, US Borgert Kruizinga - Zoetermeer, NL Matthew Eugene McCarthy - Brookfield CT, US Mark Oskotsky - Mamaroneck NY, US Lev Ryzhikov - Norwalk CT, US Lev Sakin - Stamford CT, US Stanislav Smirnov - Bethel CT, US Bart Snijders - Rotterdam, NL Karel Diederick Van Der Mast - Helmond, NL Huibert Visser - Zevenhuizen, NL
Assignee:
ASML Netherlands B.V. - Veldhoven
International Classification:
G03B 27/54 G03B 27/42 G03B 27/32 G03B 27/52
US Classification:
355 65, 355 53, 355 30, 355 77
Abstract:
An imaging apparatus according to one embodiment of the invention includes a programmable patterning structure configured to pattern a projection beam of radiation according to a desired pattern. The programmable patterning structure includes a plurality of separate patterning sub-elements, each sub-element being configured to generate a patterned sub-beam. At least one of the separate patterning sub-elements is configured to generate a patterned sub-beam whose cross-section contains regions of different intensities. The imaging apparatus also includes a combining structure configured to combine the plurality of patterned sub-beams into a single patterned image, and a projection system configured to project the patterned image onto a target portion of a substrate.
Method And Apparatus For Variable Polarization Control In A Lithography System
A polarization control device for a lithography system selectively polarizes light in horizontal, vertical and/or circular orientations. A pair of relatively rotatable quarter-wave plates move to provide the desired polarization. When the quarter-wave plates are at a relative angle of 45 degrees, the polarization is circular. When the quarter-wave plates are both at zero or 45 degrees, the resulting polarization is vertical or horizontal. The polarization is selected based on the orientation of an image to be projected. Horizontal polarization is preferably used for images with a strong horizontal orientation, and vertical polarization is selected for images with a strong vertical orientation. Circular orientation is selected when the image has no strong horizontal or vertical orientation.
Method And Apparatus For Variable Polarization Control In A Lithography System
A polarization control device for a lithography system selectively polarizes light in horizontal, vertical and/or circular orientations. A pair of relatively rotatable quarter-wave plates move to provide the desired polarization. When the quarter-wave plates are at a relative angle of 45 degrees, the polarization is circular. When the quarter-wave plates are both at zero or 45 degrees, the resulting polarization is vertical or horizontal. The polarization is selected based on the orientation of an image to be projected. Horizontal polarization is preferably used for images with a strong horizontal orientation, and vertical polarization is selected for images with a strong vertical orientation. Circular orientation is selected when the image has no strong horizontal or vertical orientation.
System And Method For Software Allocation Based On Forecasts And Calendars
Vijay K. Aggarwal - Austin TX, US Lorraine M. Herger - Port Chester NY, US Matthew A. McCarthy - Holly Springs NC, US Clifford A. Pickover - Yorktown Heights NY, US
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
G06F 21/00 G06Q 20/22
US Classification:
705 39, 726 26
Abstract:
Systems and methods provide at least one software application to users from a software monitor computer server. The software application requires a license grant for use. The software monitor computer server tracks usage of the software application to develop historical use patterns. The software monitor computer server also receives calendar input from electronic calendars of the users and analyzing the calendar input to identify future calendared uses of the software application. This allows the software monitor computer server to predict the future license grant needs of the software application based on the historical use patterns and the future calendared uses of the software application. The software monitor computer server also provides substitute software applications to the users when an insufficient number of license grants are available to meet the future calendared uses of the software application.
Transforming Business Policies To Information Technology Security Control Terms For Improved System Compliance
- Armonk NY, US Lorraine M. Herger - Danbury CT, US Shakil M. Khan - Highland Mills NY, US Matthew A. McCarthy - Holly Springs NC, US William J. Rippon - Putnam Valley NY, US
International Classification:
H04L 29/06 G06N 5/04 G06F 17/30
Abstract:
A hierarchically layered group of domain-specific enhanced enterprise ontologies where each domain layer is connected to the immediate domain layer below through a layer policy/control/context translation ontology. Security controls discovery and a mapping ontology is semantically integrated to domain meta models in each layer and a corresponding security controls knowledge base.
City of West Haven - Beach Constable (2011) West Haven Street Sweeping - Maitenance (2010-2010) Whitie Bensens Athletic Equipment - Sales Associate (2006-2010)
Education:
Curry College - Sports Broadcasting, St. Thomas More Prep School, West Haven High School
Relationship:
Single
About:
Hockey. Lacrosse. Skating. Music. Family.
Tagline:
Live everyday as if it were your last
Bragging Rights:
College hockey and lacrosse, captain D-1 prep school hockey, winter all-academic team 2010-2011 (prep school), 2nd team all-SENE lacrosse (prep school), 4 years varsity high school hockey