Max W Reed

US Patent:

8163089, Apr 24, 2012

Filed:

Dec 16, 2009

Appl. No.:

12/639043

Inventors:

Christopher Rathweg - Louisville CO, US
Max William Reed - Niwot CO, US
Mark Jeffrey Pavol - Arvada CO, US

Assignee:

PrimeStar Solar, Inc. - Arvada CO

International Classification:

H01L 31/18

US Classification:

118715, 118729, 118732, 438 57

Abstract:

An apparatus and related process are provided for vapor deposition of a sublimated source material as a thin film on a photovoltaic (PV) module substrate. A receptacle is disposed within a vacuum head chamber and is configured for receipt of a source material. A heated distribution manifold is disposed below the receptacle and includes a plurality of passages defined therethrough. The receptacle is indirectly heated by the distribution manifold to a degree sufficient to sublimate source material within the receptacle. A molybdenum distribution plate is disposed below the distribution manifold and at a defined distance above a horizontal plane of a substrate conveyed through the apparatus. The molybdenum distribution plate includes a pattern of holes therethrough that further distribute the sublimated source material passing through the distribution manifold onto the upper surface of the underlying substrate. The molybdenum distribution plate includes greater than about 75% by weight molybdenum.

US Patent:

8187555, May 29, 2012

Filed:

Dec 15, 2009

Appl. No.:

12/638731

Inventors:

Max William Reed - Niwot CO, US
Mark Jeffrey Pavol - Arvada CO, US
Christopher Rathweg - Louisville CO, US

Assignee:

PrimeStar Solar, Inc. - Arvada CO

International Classification:

B01D 5/00

US Classification:

422244, 23294 R

Abstract:

A conveyor assembly for use in a vapor deposition apparatus wherein a sublimed source material is deposited as a thin film on a photovoltaic (PV) module substrate. The assembly includes a conveyor movable in an endless loop path that includes an upper leg that moves in a conveyance direction to carry a substrate through a deposition area of the vapor deposition apparatus. A heat source is disposed relative to the endless loop path so as to heat the conveyor at a location generally after the point where substrates leave the conveyor. The heat source heats the conveyor to a temperature effective for sublimating source material from the conveyor. A cold trap is disposed relative to the endless loop path downstream of the heat source in a direction of movement of the conveyor and is maintained at a temperature effective for causing sublimated source material generated from heating the conveyor to plate out onto a collection member configured with the cold trap. An associated process for reclamation of source material from conveyor components is also provided.

US Patent:

8247255, Aug 21, 2012

Filed:

Dec 15, 2009

Appl. No.:

12/638653

Inventors:

Mark Jeffrey Pavol - Arvada CO, US
Russell Weldon Black - Longmont CO, US
Brian Robert Murphy - Golden CO, US
Christopher Rathweg - Louisville CO, US
Edwin Jackson Little - Denver CO, US
Max William Reed - Niwot CO, US

Assignee:

PrimeStar, Inc. - Arvada CO

International Classification:

H01L 21/00

US Classification:

438 57, 438 61, 438 62, 257E21001

Abstract:

A process and associated system for vapor deposition of a thin film layer on a photovoltaic (PV) module substrate is includes establishing a vacuum chamber and introducing the substrates individually into the vacuum chamber. The substrates are pre-heated as they are conveyed through the vacuum chamber, and are then conveyed in serial arrangement through a vapor deposition apparatus in the vacuum chamber wherein a thin film of a sublimed source material is deposited onto an upper surface of the substrates. The substrates are conveyed through the vapor deposition apparatus at a controlled constant linear speed such that leading and trailing sections of the substrate in a conveyance direction are exposed to the same vapor deposition conditions within the vapor deposition apparatus. The vapor deposition apparatus may be supplied with source material in a manner so as not to interrupt the vapor deposition process or non-stop conveyance of the substrates through the vapor deposition apparatus.

US Patent:

8252117, Aug 28, 2012

Filed:

Jan 7, 2010

Appl. No.:

12/683831

Inventors:

Edwin Jackson Little - Denver CO, US
Max William Reed - Niwot CO, US
Christopher Rathweg - Louisville CO, US
Mark Jeffrey Pavol - Arvada CO, US

Assignee:

PrimeStar Solar, Inc. - Arvada CO

International Classification:

C23C 16/00
G01F 11/00
B65G 53/40
B65B 1/04
B65B 3/04
B67C 3/00

US Classification:

118726, 118727, 118303, 118308, 118309, 118310, 118311, 118312, 222220, 222217, 222272, 222271, 406128, 406129, 141320

Abstract:

A feed system and related process are configured to continuously feed measured doses of source material to a vapor deposition apparatus wherein the source material is sublimated and deposited as a thin film on a substrate. The system includes a bulk material hopper, and an upper dose cup disposed to receive source material from the hopper. A lower dose cup is disposed in a vacuum lock chamber to receive a measured dose of source material from the upper dose cup. A transfer mechanism is disposed below the vacuum lock chamber to receive the measured dose of source material from the lower dose cup and to transfer the source material to a downstream deposition head while isolating the deposition conditions and sublimated source material within the deposition head.

US Patent:

8317145, Nov 27, 2012

Filed:

Apr 17, 2010

Appl. No.:

12/762334

Inventors:

Max William Reed - Niwot CO, US

International Classification:

A47F 5/08

US Classification:

2482319, 248925, 428 37

Abstract:

A spring loaded camming device and a trigger mechanism therefor. The trigger mechanism may include an axle, an inner and outer cam, a flexible stem, a trigger handle, and a trigger wire passing through the trigger wire and coupling in an efficient and effective manner, the inner and outer cams to each other and to the trigger handle. A bias member may be associated with the trigger wire, particularly in asymmetric type camming devices. Various embodiments are disclosed.

US Patent:

8361229, Jan 29, 2013

Filed:

Apr 22, 2010

Appl. No.:

12/765316

Inventors:

Max William Reed - Niwot CO, US
Russell Weldon Black - Longmont CO, US
Mark Jeffrey Pavol - Arvada CO, US

Assignee:

Primestar Solar, Inc. - Arvada CO

International Classification:

C23C 16/00

US Classification:

118719, 118726, 118733

Abstract:

An apparatus and associated method of operation is provided for vapor deposition of a sublimated source material, such as CdTe, as a thin film on discrete photovoltaic (PV) module substrates that are conveyed in a continuous, non-stop manner through the apparatus. The apparatus includes a deposition head configured for receipt and sublimation of the source material. The deposition head has a distribution plate at a defined distance above a horizontal conveyance plane of an upper surface of the substrates conveyed through a deposition area within the apparatus. The sublimated source material moves through the distribution plate and deposits onto the upper surface of the substrates as they are conveyed through the deposition area. The substrates move into and out of the deposition area through entry and exit slots that are defined by transversely extending entrance and exit seals. The seals are disposed at a gap distance above the upper surface of the substrates that is less than the distance or spacing between the upper surface of the substrates and the distribution plate.

US Patent:

8430966, Apr 30, 2013

Filed:

Dec 16, 2009

Appl. No.:

12/639053

Inventors:

Christopher Rathweg - Louisville CO, US
Max William Reed - Niwot CO, US
Mark Jeffrey Pavol - Arvada CO, US
Russell Weldon Black - Longmont CO, US

Assignee:

Primestar Solar, Inc. - Arvada CO

International Classification:

H01L 21/20
H01L 31/18
C23C 16/00

US Classification:

118726, 118718, 118719, 118724, 118729

Abstract:

An apparatus and related process are provided for vapor deposition of a sublimated source material as a thin film on a photovoltaic (PV) module substrate. A receptacle is disposed within a vacuum head chamber and is configured for receipt of a source material. A heated distribution manifold is disposed below the receptacle and includes a plurality of passages defined therethrough. The receptacle is indirectly heated by the distribution manifold to a degree sufficient to sublimate source material within the receptacle. A distribution plate is disposed below the distribution manifold and at a defined distance above a horizontal plane of a substrate conveyed through the apparatus. The distribution plate includes a pattern of holes therethrough that further distribute the sublimated source material passing through the distribution manifold onto the upper surface of the underlying substrate.

US Patent:

8481355, Jul 9, 2013

Filed:

Dec 15, 2009

Appl. No.:

12/638687

Inventors:

Mark Jeffrey Pavol - Arvada CO, US
Russell Weldon Black - Longmont CO, US
Brian Robert Murphy - Golden CO, US
Christopher Rathweg - Louisville CO, US
Edwin Jackson Little - Denver CO, US
Max William Reed - Niwot CO, US

Assignee:

Primestar Solar, Inc. - Arvada CO

International Classification:

H01L 21/00

US Classification:

438 57, 438 60, 438 61, 438 95, 257E21068, 257E2109, 257E21461, 118729

Abstract:

A system and associated process for vapor deposition of a thin film layer on a photovoltaic (PV) module substrate is includes establishing a vacuum chamber and introducing the substrates individually into the vacuum chamber. A conveyor system is operably disposed within the vacuum chamber and is configured for conveying the substrates in a serial arrangement through a vapor deposition apparatus within the vacuum chamber at a controlled constant linear speed. A post-heat section is disposed within the vacuum chamber immediately downstream of the vapor deposition apparatus in the conveyance direction of the substrates. The post-heat section is configured to maintain the substrates conveyed from the vapor deposition apparatus in a desired heated temperature profile until the entire substrate has exited the vapor deposition apparatus.