Michael E Malinowski

US Patent:

6847463, Jan 25, 2005

Filed:

Jun 5, 2002

Appl. No.:

10/163477

Inventors:

Michael E. Malinowski - Livermore CA, US

Assignee:

EUV, LLC - Santa Clara CA

International Classification:

G01B 1128
G01N 2155

US Classification:

356630, 356445

Abstract:

The characteristics of radiation that is reflected from carbon deposits and oxidation formations on highly reflective surfaces such as Mo/Si mirrors can be quantified and employed to detect and measure the presence of such impurities on optics. Specifically, it has been shown that carbon deposits on a Mo/Si multilayer mirror decreases the intensity of reflected HeNe laser (632. 8 nm) light. In contrast, oxide layers formed on the mirror should cause an increase in HeNe power reflection. Both static measurements and real-time monitoring of carbon and oxide surface impurities on optical elements in lithography tools should be achievable.

US Patent:

20020134934, Sep 26, 2002

Filed:

Mar 21, 2001

Appl. No.:

09/816307

Inventors:

Steven Haney - Tracy CA, US
Michael Malinowski - Livermore CA, US

International Classification:

H01J049/04

US Classification:

250/288000, 250/282000

Abstract:

A portable device for detecting surface outgas contaminants of an article includes: (i) a portable housing that has a chamber which is in communication with a port that is adapted to be sealably attached to a surface of the article; (ii) a mass spectrometer that is coupled to the chamber for analyzing gaseous materials in the chamber; and (iii) means for generating a vacuum within the chamber thereby drawing outgas contaminants from the surface of the article into the chamber for analysis by the mass spectrometer. By performing a mass spectrometric analysis of the surface of interest and comparing the data with mass spectrometric data ascertained with the device from a clean surface, the type and amount of outgas contaminants, if any, can be determined.

US Patent:

20030064161, Apr 3, 2003

Filed:

Jul 17, 2002

Appl. No.:

10/198307

Inventors:

Michael Malinowski - Livermore CA, US

International Classification:

B05D001/36

US Classification:

427/402000

Abstract:

A method for reducing carbon contamination of surfaces and particularly the surfaces of multilayer mirrors used for extreme ultraviolet (EUV) lithography by manipulating the surface electric phase field to reduce photoemission. Manipulation of the surface electric phase field can be by depositing a film, such as Si, or other low absorber of EUV radiation, to form a capping layer whose thickness is such that the near-surface electric field is a minimum. For extreme ultraviolet applications, where a multilayer Mo/Si mirror is used as a reflective optic, a capping layer of Si in the range of about 2-4 nm, and preferably 3 nm, is used.