Michael Paul Nichols

US Patent:

6920765, Jul 26, 2005

Filed:

Apr 17, 2002

Appl. No.:

10/125851

Inventors:

Joseph A. Menapace - Livermore CA, US
John E. Peterson - Livermore CA, US
Bernardino M. Penetrante - San Ramon CA, US
Philip E. Miller - Livermore CA, US
Thomas G. Parham - Livermore CA, US
Michael A. Nichols - Livermore CA, US

Assignee:

The Regents of the University of California - Oakland CA

International Classification:

C03B037/018
C23B025/00
C23F001/00
C23F015/00
B24B001/00

US Classification:

65392, 65 31, 65 61, 65386, 2504923, 216 80, 216 87, 216 97, 451 57

Abstract:

A method for reducing the density of sites on the surface of fused silica optics that are prone to the initiation of laser-induced damage, resulting in optics which have far fewer catastrophic defects, and are better capable of resisting optical deterioration upon exposure to a high-power laser beam.

US Patent:

60993898, Aug 8, 2000

Filed:

Oct 5, 1998

Appl. No.:

9/166817

Inventors:

Michael A. Nichols - Livermore CA
David M. Aikens - Pleasanton CA
David W. Camp - Oakland CA
Ian M. Thomas - Livermore CA
Craig Kiikka - Livermore CA
Lynn M. Sheehan - Livermore CA
Mark R. Kozlowski - Livermore CA

Assignee:

The United States of America as represented by the United States
Department of Energy - Washington DC

International Classification:

B24B 100

US Classification:

451 36

Abstract:

A method for forming optical parts used in laser optical systems such as high energy lasers, high average power lasers, semiconductor capital equipment and medical devices. The optical parts will not damage during the operation of high power lasers in the ultra-violet light range. A blank is first ground using a fixed abrasive grinding method to remove the subsurface damage formed during the fabrication of the blank. The next step grinds and polishes the edges and forms bevels to reduce the amount of fused-glass contaminants in the subsequent steps. A loose abrasive grind removes the subsurface damage formed during the fixed abrasive or "blanchard" removal process. After repolishing the bevels and performing an optional fluoride etch, the surface of the blank is polished using a zirconia slurry. Any subsurface damage formed during the loose abrasive grind will be removed during this zirconia polish. A post polish etch may be performed to remove any redeposited contaminants.

US Patent:

20210116896, Apr 22, 2021

Filed:

Oct 21, 2019

Appl. No.:

16/659557

Inventors:

- Santa Clara CA, US
Michael Nichols - Sunnyvale CA, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

G05B 19/418
G06N 3/08
G06N 3/04
G05B 13/02

Abstract:

A method of detecting and classifying anomalies during semiconductor processing includes executing a wafer recipe a semiconductor processing system to process a semiconductor wafer; monitoring sensor outputs from a sensors that monitor conditions associated with the semiconductor processing system; providing the sensor outputs to models trained to identify when the conditions associated with the semiconductor processing system indicate a fault in the semiconductor wafer; receiving an indication of a fault from at least one of the models; and generating a fault output in response to receiving the indication of the fault.

US Patent:

20210074526, Mar 11, 2021

Filed:

Sep 6, 2019

Appl. No.:

16/563352

Inventors:

- Santa Clara CA, US
Michael Nichols - Santa Clara CA, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

H01J 37/32
H01L 21/67
C23C 16/455
C23C 16/52

Abstract:

System and methods of improving dynamic pressure response during recipe step transitions. An exemplary method may include changing at least one of a plurality of recipe parameters in accordance with a processing recipe while running the processing recipe on a semiconductor substrate in a processing chamber. The method may further include measuring a pressure response in the processing chamber responsive to the changing of the at least one of the plurality of recipe parameters, and determining a response error based on the pressure response and a model pressure response calculated based on the processing recipe. The method may further include, in response to determining that the response error may be greater than a threshold value, calculating an adjustment to an operation of a valve downstream of the processing chamber when changing the at least one of the plurality of recipe parameters in accordance with the processing recipe in subsequent runs.

US Patent:

20210057590, Feb 25, 2021

Filed:

Mar 19, 2019

Appl. No.:

16/982446

Inventors:

- Irvine CA, US
BRIAN JOSEPH FLAHERTY - Alamo CA, US
CHAD MEDCROFT - San Rafael CA, US
MICHAEL JOHN NICHOLS - Emeryville CA, US
TIMOTHY MICHAEL DAVEY - Newport Beach CA, US

International Classification:

H01L 31/02
H02S 20/24
H02S 40/34
H02S 40/36
H02S 30/10

Abstract:

A photovoltaic module generates electrical power when installed on a roof. The module is constructed as a laminated sandwich having a transparent protective upper layer adhered to a photovoltaic layer. The photovoltaic layer is adhered to the top of a rigid layer, preferably formed from a fiber reinforced plastic. A wire support tray assembly is affixed to an edge of the photovoltaic module, the wire support tray assembly includes a base portion and a cover portion. The base portion has at least one base portion flange configured to lock with least one corresponding cover portion flange. The base portion has a longitudinally-extending slot configured to couple with the edge of the photovoltaic module. Preferably the wire tray assembly holds the module wiring and occludes it from view. Preferably, the cover portion is concave to shelter the wiring from inclement weather.

US Patent:

20180122655, May 3, 2018

Filed:

Oct 16, 2017

Appl. No.:

15/784846

Inventors:

- Santa Clara CA, US
Roberto COTLEAR - Sunnyvale CA, US
Michael NICHOLS - Sunnyvale CA, US
Imad YOUSIF - San Jose CA, US
Steven E. BABAYAN - Los Altos CA, US
Rajinder DHINDSA - Pleasanton CA, US
Changhun LEE - San Jose CA, US

International Classification:

H01L 21/67
B01D 39/20
B01D 46/24
B01D 46/10

Abstract:

Methods and apparatus for delivering one or more gases to a process chamber are provided herein. In some embodiments a gas delivery system includes a process chamber having an inner volume; a gas source panel; a gas line coupling the inner volume to the gas source panel; and a first gas filter disposed along the gas line proximate the inner volume, wherein the first gas filter comprises a filter element body having a first end and a second end opposite the first end, and a filtration efficiency of about 1 to about 5 log reduction value (LRV).