Intellectual Property Licensing Corporate Law Mergers and Acquisitions Corporate/Business Intellectual Property Internet Law Contracts & Agreements Solo & Small Firm Practice
A carrier head assembly of a substrate polishing apparatus and a substrate supporting carrier pad is disclosed. A down force is uniformly distributed over the backside of the substrate by the carrier pad adapted to be internally pressurized by the down force.
Methods For Chemical-Mechanical Polishing Of Semiconductor Wafers
Method for polishing the surface of a semiconductor wafer is provided in which the polishing pad has on its surface a multiplicity of abrasive particles which contact the wafer surface in combination with a reactive liquid solution essentially free of abrasive particles wherein the ionic strength of the solution is changed to effect a change in polishing.
Polishing Pads For Chemical Mechanical Planarization And/Or Other Polishing Methods
Embodiments herein provide polishing pads that produce high post-polish planarity, such as on a wafer substrate or other substrates. Exemplary pads include a bulk matrix and embedded polymer particles. Pads according to embodiments herein may be used to remove material over a composite substrate, comprised of two or more different materials, or a substrate comprised of a single material.
Chemical Mechanical Polishing Of Dielectric Materials
Michael Oliver - Portland OR, US Lee Cook - Steelville PA, US
International Classification:
B24B001/00
US Classification:
451/036000, 451/041000, 451/054000
Abstract:
A semiconductor wafer has, an underlying dielectric layer with non-planarity features at its surface due to damascene topology, and a successive dielectric layer that is without damascene topology overlying the first dielectric layer, the successive dielectric layer having a smooth polished planar surface that minimizes cumulative non-planarity. The surface is polished by chemical-mechanical planarization with a reactive liquid borne by an aqueous polishing fluid applied at an interface of the successive dielectric layer and a polishing pad.
Polishing Pads For Chemical Mechanical Planarization And/Or Other Polishing Methods
Embodiments herein provide polishing pads that produce high post-polish planarity, such as on a wafer substrate or other substrates. Exemplary pads include a bulk matrix and embedded polymer particles. Pads according to embodiments herein may be used to remove material over a composite substrate, comprised of two or more different materials, or a substrate comprised of a single material.
Orbital Motion Chemical-Mechanical Polishing Apparatus And Method Of Fabrication
Joseph R. Breivogel - Aloha OR Samuel F. Louke - Beaverton OR Michael R. Oliver - Tigard OR Leopoldo D. Yau - Portland OR Christopher E. Barns - Portland OR
Assignee:
Intel Corporation - Santa Clara CA
International Classification:
B24B 2900 B24B 722
US Classification:
451 41
Abstract:
A method and apparatus for polishing a thin film formed on a semiconductor substrate. A table covered with a polishing pad is orbited about an axis. Slurry is fed through a plurality of spaced-apart holes formed through the polishing pad to uniformly distribute slurry across the pad surface during polishing. A substrate is pressed face down against the orbiting pad's surface and rotated to facilitate, along with the slurry, the polishing of the thin film formed on the substrate.
Orbital Motion Chemical-Mechanical Polishing Method And Apparatus
Joseph R. Breivogel - Aloha OR Samuel F. Louke - Beaverton OR Michael R. Oliver - Tigard OR Leopoldo D. Yau - Portland OR Christopher E. Barns - Portland OR
Assignee:
Intel Corporation - Santa Clara CA
International Classification:
B24B 722
US Classification:
451 41
Abstract:
A method and apparatus for polishing a thin film formed on a semiconductor substrate. A table covered with a polishing pad is orbited about an axis. Slurry is fed through a plurality of spaced-apart holes formed through the polishing pad to uniformly distribute slurry across the pad surface during polishing. A substrate is pressed face down against the orbiting pad's surface and rotated to facilitate, along with the slurry, the polishing of the thin film formed on the substrate.
Method Of Polishing Substrates Comprising Silicon Dioxide And Composition Relating Thereto
A method of manufacturing semiconductor devices or precursors to semiconductor devices by hydrophobically modifying a device layer to thereby decrease the rate of polishing of the layer by at least 15%. The hydrophobically modified layer can be used as a stop layer to thereby allow for improved planarization of at least one layer of the device.
Dr. Oliver graduated from the Lake Erie College of Osteopathic Medicine, Erie Campus in 2001. He works in Beaver, PA and specializes in Internal Medicine and Urgent Care Medicine. Dr. Oliver is affiliated with Heritage Valley Health System Beaver.
amber capital access, llc 87-87 Francis Lewis Blvd, Suite 3 8889690022 (Office)
Name / Title
Company / Classification
Phones & Addresses
Michael Oliver Manager
Air Base Cafe Restaurants
6030 Hangar Rd, Tillamook, OR 97141 5038421130, 5038423054
Michael Oliver Manager
Tillamook Air Museum Museums and Art Galleries
6030 Hangar Rd, Lees Camp, OR 97141 Website: tillamookair.com
Michael Oliver Manager
Tillamook Air Museum Museums
6030 Hangar Rd, Tillamook, OR 97141 5038421130, 5038423054
Michael Oliver Manager
Air Base Cafe Restaurants · Bar & Grill Restaurants · Burger Restaurants · Family Restaurants · Mexican Restaurants · Southwestern Restaurants
6030 Hangar Rd, Tillamook, OR 97141 5038421130, 5038423054
Michael Oliver
PRESTON MILES KIDS LLC
Michael D. Oliver
DESTINY FULFILLED RECORDS, LLC
Michael J. Oliver
MOLIVER LLC
Michael J. Oliver
VMJ OLIVER ENTERPRISE, LLC
Googleplus
Michael Oliver
Work:
Safmarine - Purser (1984-2009) Beehive Development Trust - Coordinator (2010-2011) Eerste River Community Initiative - Financial Director (2011-2011)
Education:
RSA Culinary Shcool
Relationship:
Married
About:
I am a cooking instructor at a Non Profit Organisation. We serve the Eerste River Community. I do Functions for special events.I have more than 25 years experience in the cooking industry. I used to w...
Bragging Rights:
Have two girls namely Gail and Claren
Michael Oliver
Work:
Niagara Bottling LLC - Black Ops (2010) CHEP USA - Secret Missions (2007-2009)
Education:
University of California, Irvine - MBA, University of Tennessee
Tagline:
Took a pair of binoculars and stared at the sun for over an hour
Michael Oliver
Work:
BCOT - Assistant Lecturer (3)
About:
All opinions and views are my own and do not necessarily reflect those of my employer or any other third party.Â
Tagline:
Computers can never replace human stupidity
Michael Oliver
Work:
PC News
Tagline:
Nao deixe para manha o que se pode fazer hoje.
Bragging Rights:
Perseverança
Michael Oliver
Work:
Stores
Tagline:
A jack-ass
Bragging Rights:
Still awaiting the armageddon
Michael Oliver
Work:
POPP Communications - Systems Design Specialist (2008)
Michael Oliver
Education:
Sait - Mechanical design
Michael Oliver
Education:
University of Chicago - Mathematics, Physics
About:
I like Math, Science (esp. Physics), Scuba Diving, Chipotle, and Minecraft
News
Apple TV+ Leads Final Emmy Predictions With The Studio and Adolescence
Editing Unstructured: Will Win: Welcome to Wrexham (FX) Down to the Wire Sam Fricke, Jenny Krochmal, Mohamed el Manasterly, Michael Oliver, Tim Roche, Matt Wafaie, Steve Welch, Tim WilsbachCould Win: Deadliest Catch (National Geographic)Should Win: Love on the Spectrum (Netflix)
Date: Sep 04, 2025
Category: Entertainment
Source: Google
Michael Oliver’s ‘blatant’ Mohamed Salah mistake cost Liverpool derby win
"How was this not a foul on Salah? Michael Oliver is a clown," one fan said. "Blatant foul from the Everton defender here on Mohamed Salah. Everton went on to score moments after," one supporter claimed after sharing a replay of the incident.
Date: Feb 12, 2025
Category: Sports
Source: Google
Euro 2024: Germany vs. Denmark interrupted by dazzling lightning storm
With just over half an hour of the first half played, and the teams still scoreless, lightning and thunder lashed the field and caused referee Michael Oliver to order the teams to head back to their locker rooms.
Date: Jun 29, 2024
Category: Sports
Source: Google
Premier League referee suffers UEFA demotion after Virgil van Dijk's pointed comment
change the perception that the Premier League's officials are worse than in other top leagues, even if UEFA's own data doesn't necessarily back that up. Taylor is very well regarded on the European stage and Attwell is one of UEFA's top VAR officials. Michael Oliver is also at Euro 2024 from England.
Date: Jun 22, 2024
Category: Sports
Source: Google
Audio for VAR mistake in Tottenham-Liverpool to be released - ESPN
Brentford on Sunday and Monday's Fulham vs.Chelsea game -- in the wake of the controversy, and the pair will have no involvement in this weekend's matches. The on-field referee from the Liverpool game, Simon Hooper, and the fourth official, Michael Oliver, have both been selected for weekend duties.
Date: Oct 03, 2023
Category: Sports
Source: Google
Fabio Paratici's job interviews and the Antonio Conte words that might make Tottenham fans happy
There was also referee Michael Oliver's reluctance to book Fabinho, who spent much of his time bringing down Spurs players as they broke, with late sliding tackles and an unpleasant elbow to the face for Son Heung-min. It took until the 79th minute for the Liverpool man to finally go into the book w
Date: May 08, 2022
Category: Sports
Source: Google
Man City – Arsenal stream: How to watch, updates, more
However, referee Michael Oliver pointed to his watch and indicated that the Goal Decision System (GDS) system didnt tell him it was a goal. No goal was awarded and VAR didnt intervene as Sheffield Uniteds players and staff couldnt believe it.
Date: Jun 17, 2020
Category: Sports
Source: Google
The Antonio Brown helmet situation goes from weird to weirder
On Monday, a reader named Tim Fernandez informed me that NOCSAE executive director Michael Oliver explained that the group would consider for certification any Schutt AiR Advantage that is less than 10 years old. After confirming with Oliver that he indeed had taken that position, I informed Browns