Michael F Power

US Patent:

53644964, Nov 15, 1994

Filed:

Aug 20, 1993

Appl. No.:

8/110021

Inventors:

Lynn D. Bollinger - Ridgefield CT
Michael P. Power - Newtown CT
Richard R. Poole - Norwalk CT
George J. Gardopee - Southbury CT

Assignee:

Hughes Aircraft Company - Los Angeles CA

International Classification:

H01L 21306
B44C 122

US Classification:

156643

Abstract:

A support and positioning apparatus (10) for supporting and positioning a wafer (12), substrate or the like in a plasma assisted chemical etching process. Surround components (14, 16, 18, 20) positioned around the substrate (12) are comprised of substantially pure magnesium or are aluminum coated with a magnesium fluoride coating such that as a plasma tool associated with the plasma etching process traverses the edge of the substrate (12), the plasma etching environment generated from a fluorine containing feed gas emitted from the plasma tool does not significantly erode the surround components (14, 16, 18, 20) or cause contamination of the substrate (12).