Michael Wayne Quillen - Kingsport TN, US Dale Edward O'Dell - Blountville TN, US Zachary Philip Lee - Covington GA, US John Cleaon Moore - Camarillo CA, US Edward Enns McEntire - Kingsport TN, US
Assignee:
Eastman Chemical Company - Kingsport TN
International Classification:
C11D 7/50
US Classification:
510175, 510176, 134 13
Abstract:
Compositions and methods useful for the removal of organic substances from substrates, for example, electronic device substrates such as microelectronic wafers or flat panel displays, are provided. A method is presented which applies a minimum volume of the composition as a coating to the inorganic substrate whereby sufficient heat is added and immediately rinsed with water to achieve complete removal. These compositions and methods are particularly suitable for removing and completely dissolving photoresists of the positive and negative varieties as well as thermoset polymers from electronic devices.
Compositions And Methods For Removing Organic Substances
Michael Wayne Quillen - Kingsport TN, US Dale Edward O'Dell - Blountville TN, US Zachary Philip Lee - Conyers GA, US John Cleaon Moore - Camarillo CA, US Edward Enns McEntire - Kingsport TN, US
Assignee:
Eastman Chemical Company - Kingsport TN
International Classification:
C11D 3/37 C11D 3/43 C11D 7/34
US Classification:
510175, 510432, 510475, 510492, 510505
Abstract:
Compositions and methods useful for the removal of organic substances from substrates, for example, electronic device substrates such as microelectronic wafers or flat panel displays, are provided. A method is presented which applies a minimum volume of the composition as a coating to the inorganic substrate whereby sufficient heat is added and immediately rinsed with water to achieve complete removal. These compositions and methods are particularly suitable for removing and completely dissolving photoresists of the positive and negative varieties as well as thermoset polymers from electronic devices.
Compositions And Methods For Removing Organic Substances
Michael Wayne Quillen - Kingsport TN, US Dale Edward O'Dell - Blountville TN, US Zachary Philip Lee - Conyers GA, US John Cleaon Moore - Camarillo CA, US Edward Enns McEntire - Kingsport TN, US
Assignee:
Eastman Chemical Company - Kingsport TN
International Classification:
G03F 7/42
US Classification:
134 13, 510175, 510176, 134 26, 134 29, 134 38
Abstract:
Compositions and methods useful for the removal of organic substances from substrates, for example, electronic device substrates such as microelectronic wafers or flat panel displays, are provided. A method is presented which applies a minimum volume of the composition as a coating to the inorganic substrate whereby sufficient heat is added and immediately rinsed with water to achieve complete removal. These compositions and methods are particularly suitable for removing and completely dissolving photoresists of the positive and negative varieties as well as thermoset polymers from electronic devices.
Processess And Compositions For Removing Substances From Substrates
Michael Wayne Quillen - Kingsport TN, US Dale Edward O'Dell - Blountville TN, US Zachary Philip Lee - Conyers GA, US John Cleaon Moore - Camarillo CA, US Edward Enns McEntire - Kingsport TN, US Spencer Erich Hochstetler - Kingsport TN, US Rodney Scott Armentrout - Kingsport TN, US Richard Dalton Peters - Kingsport TN, US Darryl W. Muck - Kingsport TN, US
Assignee:
Eastman Chemical Company - Kingsport TN
International Classification:
G03F 7/26 G03F 7/40 C11D 7/32 G03F 7/42
US Classification:
430329, 430311, 430331, 510175, 510176
Abstract:
Processes associated apparatus and compositions useful for removing organic substances from substrates, for example, electronic device substrates such as microelectronic wafers or flat panel displays, are provided. Processes are presented that apply a minimum volume of a composition as a coating to the inorganic substrate whereby sufficient heat is added and the organic substances are completely removed by rinsing. The compositions and processes may be suitable for removing and, in some instances, completely dissolving photoresists of the positive and negative varieties as well as thermoset polymers from electronic devices.
Substrate Cleaning Processes Through The Use Of Solvents And Systems
Michael W. Quillen - Kingsport TN, US L. Palmer Holbrook - Kingsport TN, US John Cleaon Moore - Camarillo CA, US
International Classification:
C23F 1/00
US Classification:
134 2
Abstract:
A method for removing common contaminates or residues which include but are not limited to ionic residues, particulate residues and moisture from semiconductor wafers used in the manufacture of IC (integrated circuits), liquid crystal displays and flat panel displays. The process includes the use of certain esters or certain esters combined with particular co-solvents. The cleaning method may be utilized in a variety of cleaning processes or process steps and offers economic and performance advantages.
Carrier Solvent Compositions, Coatings Compositions, And Methods To Produce Thick Polymer Coatings
Michael Wayne Quillen - Kingsport TN, US Stephanie Ann Roane - Kingsport TN, US Dale Edward O'Dell - Blountville TN, US John Cleaon Moore - Camarillo CA, US
Assignee:
Eastman Chemical Company - Kingsport TN
International Classification:
B05D 5/12 C09K 3/00 C08K 5/101 C08K 5/07
US Classification:
427 58, 106311, 524315, 524361
Abstract:
Compositions and methods useful for the coating of polymeric materials onto substrates, for example, electronic device substrates such as semiconductor wafers, are provided. These compositions and methods are particularly suitable manipulating thickness of a polymeric coating in a single coating event. Such methods to control photoresist thickness are used to facilitate the layering of electronic circuitry in a three-dimensional fashion. Furthermore, the compositions of the present invention may be effectively used to deposit thick films of polymeric material in a uniform manner onto inorganic substrates which provides a significant benefit over conventional systems.
Carrier Solvent Compositions, Coatings Compositions, And Methods To Produce Thick Polymer Coatings
Michael Wayne Quillen - Kingsport TN, US Loady Palmer Holbrook - Kingsport TN, US Stephanie Ann Roane - Kingsport TN, US Dale Edward O'Dell - Blountville TN, US John Cleaon Moore - Camarillo CA, US
Assignee:
EASTMAN CHEMICAL COMPANY - Kingsport TN
International Classification:
H01L 21/28 H01L 21/31
US Classification:
438612, 438780, 257E21158, 257E2124
Abstract:
Compositions and methods useful for the coating of polymeric materials onto substrates, for example, electronic device substrates such as semiconductor wafers, are provided. These compositions and methods are particularly suitable manipulating thickness of a polymeric coating in a single coating event. Such methods to control photoresist thickness are used to facilitate the layering of electronic circuitry in a three-dimensional fashion. Furthermore, the compositions of the present invention may be effectively used to deposit thick films of polymeric material in a uniform manner onto inorganic substrates which provides a significant benefit over conventional systems.
Polymeric Or Monomeric Compositions Comprising At Least One Mono-Amide And/Or At Least One Diamide For Removing Substances From Substrates And Methods For Using The Same
Michael Wayne Quillen - Kingsport TN, US Dale Edward O'Dell - Blountville TN, US Zachary Philip Lee - Covington GA, US John Cleaon Moore - Camarillo CA, US Edward Enns McEntire - Kingsport TN, US Spencer Erich Hochstetler - Kingsport TN, US
International Classification:
B08B 3/00 G03F 7/42
US Classification:
134 19, 510176
Abstract:
Compositions and methods useful for removing organic substances from substrates, for example, electronic device substrates such as microelectronic wafers or flat panel displays, are provided. Methods are presented that apply a minimum volume of a composition as a coating to the inorganic substrate whereby sufficient heat is added and immediately rinsed with water to achieve complete removal. The compositions and methods may be suitable for removing and completely dissolving photoresists of the positive and negative varieties as well as thermoset polymers from electronic devices.
Resumes
Account Manager-Electronic Materials At Eastman Chemical Company
Alpha Natural Resources, Inc. Bituminous Coal Underground Mining
1 Alpha Pl, Abingdon, VA 24210
Michael Quillen Chief Executive Officer And President
Alpha Natural Resources, Inc. Bituminous Coal Underground Mining
1 Alpha Pl, Abingdon, VA 24210
Michael Quillen CEO
Alpha Natural Resources Inc Bituminous Coal and Lignite Surface Mining
Po Box 2345, Abingdon, VA 24212 Website: alphanr.com
Michael Quillen Director of Engineering
City of Clearwater Executive Office · City Government Parks and Recreation Department · Library Executive Office · Administrative Social/Manpower Programs · Refuse System · Water Supply Service Executive Office · Legislative Body · Economic Development of Housing
7275624040, 7275624538, 7275624970, 7275624060
Michael J. Quillen Chairman
Alpha Natural Resources, Inc Coal Mining
1 Alpha Pl, Bristol, VA 24209 PO Box 16429, Bristol, VA 24209 PO Box 2345, Abingdon, VA 24212 1 Alpha Pl, Abingdon, VA 24210 2766194410
Michael J. Quillen
Amci Energy LLC Coal Mining Services
179 E Jackson St, Gate City, VA 24251
Michael J. Quillen President
WHITE TOP COAL, INC
PO Box 4000, Lebanon, VA 24266 PO Box 968, Gate City, VA 24251
Michael J. Quillen President
ROCKY TOP DEVELOPMENT INC
Ct Corporation System, Charleston, WV 25313 PO Box 968, Gate City, VA 24251
Louisville Bone/Joint SpecsLouisville Bone & Joint Specialists 4001 Kresge Way STE 100, Louisville, KY 40207 5028976579 (phone)
Education:
Medical School University of Louisville School of Medicine Graduated: 1996
Procedures:
Hallux Valgus Repair Hip/Femur Fractures and Dislocations Lower Leg/Ankle Fractures and Dislocations Arthrocentesis Hip Replacement Joint Arthroscopy Knee Arthroscopy Lower Arm/Elbow/Wrist Fractures and Dislocations Shoulder Surgery
Conditions:
Plantar Fascitis Fractures, Dislocations, Derangement, and Sprains Hallux Valgus Internal Derangement of Knee Internal Derangement of Knee Cartilage
Languages:
English
Description:
Dr. Mc Quillen graduated from the University of Louisville School of Medicine in 1996. He works in Louisville, KY and specializes in Orthopaedic Surgery and Orthopedic Sports Medicine. Dr. Mc Quillen is affiliated with Baptist Health Louisville, Norton Audubon Hospital and Norton Brownsboro Hospital.
Mike Quillen (1976-1980), Susan Perry (1986-1990), Sharon Wells (1957-1961), Anita Backrub (1980-1984), Linda Music (1958-1962), Teresa Daniels (1986-1990)
Colleges used to offer sixteen-week, semester-long courses and that was about it. But today, thanks to creative scheduling and technology, Rowan-Cabarrus is able to offer classes in half the time, or less, said Dr. Michael Quillen, vice president of academic programs.