Mien Li

US Patent:

20100055809, Mar 4, 2010

Filed:

Sep 8, 2008

Appl. No.:

12/206310

Inventors:

James M. Pak - Sunnyvale CA, US
Mien Li - Sunnyvale CA, US
Go Nagatani - Mountain View CA, US
Yana Matsushita - Mountain View CA, US
Julie Diane Segal - Palo Alto CA, US

Assignee:

SPANSION LLC - Sunnyvale CA

International Classification:

H01L 21/66

US Classification:

438 17, 257E21531

Abstract:

A product workpiece can be processed to form product dice. A test mask can allow intentional changes to be made to a feature on the product workpiece to examine how the altered feature performs. Use of the test mask may be used or not used based on the needs or desires of skilled artisans. By using the test mask, a separate dedicated test structure is not required to be formed in a scribe lane or within an area that could otherwise be used for a product die. Thus, the sampling level by using the test mask can be varied. Also, separate test workpieces, which may not be processed using a significantly different process flow or at significantly different times as compared to product workpieces, are not required. The product workpiece with the altered feature can be electrically tested without the need to form test or bond pads.