Mike C Chen

US Patent:

20030136683, Jul 24, 2003

Filed:

Jan 18, 2002

Appl. No.:

10/053785

Inventors:

Mike Chen - Daly City CA, US
Thomas Dinan - San Jose CA, US
Neil Robertson - Palo Alto CA, US

Assignee:

INTERNATIONAL BUSINESS MACHINES CORPORATION

International Classification:

C25C003/36

US Classification:

205/365000

Abstract:

A process for electroplating and annealing thin-films of nickel-iron alloys having from 63% to 81% iron content by weight to produce pole pieces having saturation flux density (B) in the range from 1.9 to 2.3 T (19 to 23 kG) with acceptable magnetic anisotropy and magnetostriction and a coercivity (H) no higher than 160 A/m (2 Oe). The desired alloy layer properties, including small crystal size and minimal impurity inclusions, can be produced by including higher relative levels of Fe ions in the electroplating bath while holding the bath at a lower temperature while plating from a suitable seed layer. The resulting alloy layer adopts a small crystal size (BCC) without significant inclusion of impurities, which advantageously permits annealing to an acceptable Hwhile retaining the high Bdesired.

US Patent:

20030137767, Jul 24, 2003

Filed:

Jan 18, 2002

Appl. No.:

10/054554

Inventors:

Mike Chen - Daly City CA, US
Thomas Dinan - San Jose CA, US
Paul Nguyen - San Jose CA, US
Neil Robertson - Palo Alto CA, US

Assignee:

INTERNATIONAL BUSINESS MACHINES CORPORATION

International Classification:

G11B015/18
G11B021/02

US Classification:

360/071000, 360/075000

Abstract:

A thin-film write head employing pole pieces formed of an electroplated body-centered cubic (BCC) nickel-iron alloy with a saturation flux density (B) of 1.9 to 2.3 T (19 to 23 kG) and an acceptable coercivity (H) of about 80 to about 160 A/m (1-2 Oe). The iron content of the electroplated nickel-iron alloy is from 64% to 81% by weight. The two-layer pole fabrication process holds magnetic anisotropy and coercivity to useable values while improving saturation flux density and optimizing magnetostriction. This is accomplished by first electroplating a BCC nickel-iron layer onto an underlying seed layer and then annealing the two layers to reduce coercivity to less than about 160 amps/meter and raise magnetization to acceptable levels.

US Patent:

20050266691, Dec 1, 2005

Filed:

May 9, 2005

Appl. No.:

11/126053

Inventors:

Binxi Gu - Cupertino CA, US
Gerardo Delgadino - Santa Clara CA, US
Yan Ye - Saratoga CA, US
Mike Chen - Santa Clara CA, US

International Classification:

H01L021/302
B44C001/22

US Classification:

438706000, 438710000, 438718000, 438723000, 216067000

Abstract:

Certain embodiments include an etching method including providing an etch material, applying a gas mixture including hydrogen, forming a plasma, and etching the etch material. The etch material can include a low-k dielectric material. The gas mixture can include a hydrogen gas, a hydrogen-free fluorocarbon, and a nitrogen gas, and further include one or more of a hydrofluorocarbon gas, an inert gas, and/or a carbon monoxide gas. The hydrogen gas can be a diatomic hydrogen, a hydrocarbon, a silane and/or a fluorine-free hydrogen gas, including H, CH, CH, NH, and/or HO gases. The hydrogen-free fluorocarbon gas can be a CFgas (where x≧1 and Y≧1) and the hydrofluorocarbon gas can be a CHFgas (where x≧1, y≧1 and z≧1). The gas mixture can be free of oxygen. Embodiments can include reduced pressures, reduced hydrogen flow rates and one or more plasma frequencies.

US Patent:

20070093860, Apr 26, 2007

Filed:

Sep 20, 2006

Appl. No.:

11/533623

Inventors:

Rob Rao - Hercules CA, US
Mike Chen - Richmond VA, US

International Classification:

A61B 17/08

US Classification:

606151000

Abstract:

A surgical method and apparatus of repairing a tear, cut or defect in the body tissue, specifically the dura or vascular wall, is disclosed. An inner plate is placed on the tissue's inner surface in a position completely overlapping the tissue defect. An outer plate is placed on the tissue's outer surface in a position completely overlapping the defect and aligned with the inner plate, whereby the inner and outer plates have perimeters larger than the perimeter of the defect. The inner plate is coupled to the outer plate such that the peripheral edges of the body tissue defect are securely clamped between the inner and outer plates to provide a watertight repair to the tissue defect. An associated clamping apparatus and insertion tool is disclosed. An anastomotic clamping device for a body lumen is also disclosed using opposed annular clamping plates.

US Patent:

20100057115, Mar 4, 2010

Filed:

Sep 7, 2009

Appl. No.:

12/554941

Inventors:

Rob K. Rao - Hercules CA, US
Mike Y. Chen - San Marino CA, US

International Classification:

A61B 17/08

US Classification:

606151

Abstract:

A surgical method and apparatus of repairing a tear, cut or defect in the body tissue, specifically the dura or vascular wall, is disclosed. An inner plate is placed on the tissue's inner surface in a position completely overlapping the tissue defect. An outer plate is placed on the tissue's outer surface in a position completely overlapping the defect and aligned with the inner plate. The inner and outer plates have perimeters larger than the perimeter of the defect and include coiled ribs. The inner plate is coupled to the outer plate such that the peripheral edges of the body tissue defect are securely clamped between the inner and outer plates to provide a watertight repair to the tissue defect.

US Patent:

62400274, May 29, 2001

Filed:

Oct 23, 2000

Appl. No.:

9/693503

Inventors:

Peter Wung Lee - Saratoga CA
Fu-Chang Hsu - Saratoga CA
Mike Hsinyih Chen - San Jose CA

Assignee:

Aplus Flash Technology, Inc. - Santa Clara CA

International Classification:

G11C 700
H03K 190175

US Classification:

36518911

Abstract:

In this invention external high voltages are connected to a chip containing a flash memory that are connected to selected cells to be erased. Internal pump circuits contained on the chip are turned off while the external voltages are used. The external voltages, a high negative voltage and a high positive voltage, are connected to gates and sources respectively of selected cells to be erased by a voltage control module. The external voltages are used during manufacture during program/erase operations to perform the erase function efficiently. The internal high voltage pump circuits are used to erase flash memory cells after being assembled on a circuit board by a user. Two level shifter circuits are disclosed that form a part of the voltage control module. The level shifter circuits apply voltages to the flash memory cells and provide voltages that select and deselect the cells for erasure.

US Patent:

6166961, Dec 26, 2000

Filed:

Aug 19, 1999

Appl. No.:

9/377545

Inventors:

Peter Wung Lee - Saratoga CA
Fu-Chang Hsu - Saratoga CA
Mike Hsinyih Chen - San Jose CA

Assignee:

Aplus Flash Technology, Inc. - Santa Clara CA

International Classification:

G11C 1604

US Classification:

36518529

Abstract:

In this invention external high voltages are connected to a chip containing a flash memory that are connected to selected cells to be erased. Internal pump circuits contained on the chip are turned off while the external voltages are used. The external voltages, a high negative voltage and a high positive voltage, are connected to gates and sources respectively of selected cells to be erased by a voltage control module. The external voltages are used during manufacture during program/erase operations to perform the erase function efficiently. The internal high voltage pump circuits are used to erase flash memory cells after being assembled on a circuit board by a user. Two level shifter circuits are disclosed that form a part of the voltage control module. The level shifter circuits apply voltages to the flash memory cells and provide voltages that select and deselect the cells for erasure.

US Patent:

20210081989, Mar 18, 2021

Filed:

Sep 29, 2020

Appl. No.:

17/036933

Inventors:

- Chicago IL, US
Brian TOTTY - Los Altos CA, US
Ed HASLAM - San Francisco CA, US
Paul GAUTHIER - San Francisco CA, US
Gary LERHAUPT - San Francisco CA, US
Mike Y. CHEN - San Francisco CA, US
Christopher COLBY - Piedmont CA, US

International Classification:

G06Q 30/02
G06Q 50/00
G06F 16/35

Abstract:

Social media networking applications, web sites, and services creates implicit relationships between users based on their interest or participation in real-world and optionally virtual or online activities in addition to explicitly defined peer relationships. User profiles, activity entities, and expressions may be associated with metadata to assist in searching and navigation. Metadata is implicitly associated with user profiles, activity entities, expressions, or other data entities based on user behavior using metadata collector. A metadata collector is a poll, survey, list, questionnaire, census, test, game, or other type of presentation adapted to solicit user interaction. A metadata collector is associated with metadata elements. When users interact with a metadata collector, their user profiles and the data entities included in their interactions become associated with the metadata elements of the metadata collector. These metadata element associations may then be used for any purpose.