A robust method for etching an organic low-k insulating layer on a semiconductor device, as disclosed herein, includes introducing into a processing chamber a substrate with an organic insulating layer and an overlying mask layer having an aperture. A plasma is then developed within the chamber from an oxidizing gas and a passivation gas. The passivation gas is preferably either a silicon containing gas or a boron containing gas, or both. The ratio of the oxidizing gas to the passivation gas is preferably at least 10:1. In addition, an inert carrier gas may be provided. The plasma is then used to etch the organic insulating layer through the mask layer, thereby forming a via having essentially vertical sidewalls in the organic low-k insulating layer.
Richard Tran - Santa Ana CA, US Nancy Tran - Santa Ana CA, US
International Classification:
H05K 5/00
US Classification:
361686, 713201, 709225
Abstract:
A computer system including a switch box and bracket assembly including one or more manual switches are provided for controlling the selective activation and deactivation of the computer systems' memory storage devices and network system. Preferably, the computer system includes a wire harnesses including a network cable for connecting a network to the bracket assembly's input port, a relay cable for connecting the bracket assembly's output port to the computer's network port and a manual switch. Instead of network communications being transmitted directly from the network to the network port, the signals are rerouted through the bracket assembly's input port, manual switch and output port, and then routed to the computer's network port. Access to the network is then controlled by simple manual manipulation of a button, toggle or knob to create an open or closed circuit.
Richard Tran - Santa Ana CA, US Nancy Tran - Santa Ana CA, US
International Classification:
G06F013/00
US Classification:
710100000
Abstract:
A computer system including a switch box is provided for controlling the selective activation and deactivation of the computer systems' memory storage devices. The switch box includes one or more pairs of switches with each pair including a power switch and a signal switch. The power switch selectively provides power to the corresponding power switches. Meanwhile, the signal switch selectively provides an open or closed circuit for allowing or restricting the transmission of data signals between the computers processor and memory storage device.
Richard Tran - Santa Ana CA, US Nancy Tran - Santa Ana CA, US
International Classification:
G06F 13/00
US Classification:
710100000
Abstract:
A computer system is provided including a variety of switch components for controlling the selective activation and deactivation of the computer systems' memory storage devices, network system and interface peripheral devices. The switching components may include a switch box having one or more switches for controlling activation and deactivation of various computer components. The switch components may also include a bracket assembly having an input port, output port and an intermediate manual switch for controlling the communication between a network and a computer's processor. The bracket assembly and switch box may also be constructed to control the transmission or restriction of power or data signals to a memory storage device or may control the transmission of power or data signals to one or more interface peripheral ports.
Methods Of Preventing Post-Etch Corrosion Of An Aluminum Neodymium-Containing Layer
Thomas S. Choi - San Jose CA John P. Holland - Santa Jose CA Nancy Tran - San Jose CA
Assignee:
Lam Research Corporation - Fremont CA
International Classification:
H05H 124 C23D 120
US Classification:
427534
Abstract:
A method for processing a substrate having an aluminum neodymium-containing layer is disclosed. The aluminum neodymium-containing layer has residual chlorine proximate to its etch surface. The method includes providing a first gas chemistry including HBr and SF. sub. 6 which supplies a first plurality of fluorine ions, forming a first plasma from said first gas chemistry, passivating the etch surface of the aluminum neodymium-containing layer with the first plasma to cause a second plurality of fluorine ions to replace a first portion of the residual chlorine. This second plurality of fluorine ions is a subset of the first plurality of fluorine ions. The method further includes providing a second gas chemistry having hydrofluorocarbon and oxygen which provides a third plurality of fluorine ions and oxygen, forming a second plasma with the second gas chemistry, bombarding the etch surface of the aluminum neodymium-containing layer with the second plasma, causing a fourth plurality of fluorine ions to replace a second portion of the residual chlorine. This fourth plurality of fluorine ions is a subset of the third plurality of fluorine ions. The method additionally includes depositing a polymer material using a third plasma having hydrofluorocarbon to coat the etch surface of the aluminum neodymium-containing layer.
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California State University, Northridge Northridge, CA 2014 to 2016 Film ProductionCalifornia State University, Fullerton Fullerton, CA 2012 to 2014 Film Production, ActingOak Hills High School 2009 to 2012 High School Diploma
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Anthem College Sacramento, CA Jun 2011 to Apr 2012 Diploma in PharmacyCollege of the Siskiyous Weed, CA Aug 2006 to May 2011 Associates in Accounting
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Orange Coast College Jan 2009 to May 2011 Certificate in MedicalOrange Coast College Aug 2010 to Dec 2010 Certificate in Medical Assistant InsuranceFountain Valley School 2000 Diploma
Hoag Neuro Sciences Institute Newport Beach, CA Apr 2011 to May 2011 Medical Assistant / InternshipHartmann Law Firm Newport Beach, CA Aug 2010 to Apr 2011 Legal AssistantStandard Pacific Mortgage / Family Lending Services, Inc Irvine, CA May 2003 to Mar 2008 Junior Processor/Operations AssistantAnchor Home Loans Unlimited, Inc Costa Mesa, CA Aug 2002 to May 2003 Assistant Loan ProcessorCoss Shreiar & Laz of Law Offices Irvine, CA Oct 2001 to Jun 2002 Front office coordinator
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Hoag Neuro Sciences Institute Apr 2011 to May 2011 MS Ce in Medical Assistant / InternshipOrange Coast College Jan 2009 to May 2011 Certificate in MedicalOrange Coast College Aug 2010 to Dec 2010 Certificate in Medical Assistant InsuranceFountain Valley School 2000 Diploma
2002 to 2000 RMA CordinatorAdvance Component San Jose, CA 2000 to 2002 Accounting ClerkSolectron Corporation Fremont, CA 1994 to 2000 RF Test-TechnicianSyquest Fremont, CA 1993 to 1994 Clean room Assembler and Test Operator
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Computer Training Academy San Jose, CA 2001 to 2002 Certificate in Computerized Office/Business Administrative SpecialistMission College Santa Clara Santa Clara, CA 1997 to 2001 Associate in Electronics Engineering and an Accounting
Medicine Doctors
Dr. Nancy L Tran, Anaheim CA - MD (Doctor of Medicine)
Dr. Tran graduated from the Rush Medical College in 2000. She works in Pembroke Pines, FL and 3 other locations and specializes in Nephrology and Internal Medicine. Dr. Tran is affiliated with CGH Medical Center, Memorial Hospital Miramar, Memorial Hospital Pembroke, Memorial Hospital West, Memorial Regional Hospital and Memorial Regional Hospital South.