Nathaniel D Greene

US Patent:

20120161068, Jun 28, 2012

Filed:

Dec 22, 2010

Appl. No.:

12/976013

Inventors:

Nathaniel T. Greene - Aurora IL, US
Jasbir S. Gill - Naperville IL, US
Martin R. Godfrey - Eagan MN, US
Cheryl Williams - Lockport IL, US

International Classification:

C02F 5/10
C02F 5/04

US Classification:

252181, 252180

Abstract:

This invention relates to an improved method for inhibiting the formation and deposition of silica and silicate compounds in a water system. In particular, the method includes adding to the water system a relatively low molecular weight organic, anionic polymer. The polymer preferrably has an acrylic acid or methacrylic acid functionality and is preferrably selected from one or more of homopolymers of acrylic acid, a methacrylic acid/polyethylene glycol allyl ether copolymer, a homopolymer of methacrylic acid, an acrylic acid/polyethylene glycol allyl ether copolymer, and an acrylic acid/1-allyloxy-2-hydroxypropane sulfonic acid copolymer, homopolymers of maleic anhydride, copolymers of maleic anhydride and polyethylene glycol allyl ether, and combinations thereof.