Neil Hyer Hendricks

age ~74

from Mesquite, NV

Also known as:
  • Neil H Hendricks
Phone and address:
505 Fairways Dr, Mesquite, NV 89027

Neil Hendricks Phones & Addresses

  • 505 Fairways Dr, Mesquite, NV 89027
  • San Jose, CA
  • Los Altos, CA
  • 16525 Habitat Trl, Sonora, CA 95370 • 2095328016
  • Enfield, CT
  • Palo Alto, CA
  • Brea, CA
  • Milpitas, CA
  • Las Cruces, NM

Resumes

Neil Hendricks Photo 1

Owner At 374 Consulting, Llc

view source
Position:
Owner at 374 Consulting, LLC, Certified Shadow Work Coach at Shadow Work Seminars, Inc., Board VP, Grant Writer, Life Coach, Instructor at 374 Consulting, LLC
Location:
Traverse City, Michigan
Industry:
Professional Training & Coaching
Work:
374 Consulting, LLC - Traverse City, MI since Apr 2013
Owner

Shadow Work Seminars, Inc. - Traverse City, Michigan since 2010
Certified Shadow Work Coach

374 Consulting, LLC - Traverse City, Mich since Apr 2009
Board VP, Grant Writer, Life Coach, Instructor

Handy Andys Handyman Service, Inc. Jul 2000 - Aug 2009
Co-Owner - President
Education:
Walden University 2009 - 2014
PhD Organizational Psychology, Consulting, Dissertation Phase
Michigan State University 1995 - 1997
Master of Arts Curriculum and Teaching, Curriculum development and Teacher education
The Ohio State University 1982 - 1985
Agricultural Education/Agronomy, Teaching/Science/Agronomy
Skills:
Clean Talk Trainer
Free at Last Facilitator
Grief Counseling
Program Development
Community Outreach
Public Speaking
Leadership Development
Non-profits
Coaching
Conflict Resolution
Fundraising
Career Counseling
Staff Development
Team Building
Personal Development
Reintegration
Phenomenologcial Research
Training
Social Networking
Stress Management
Volunteer Management
Mental Health
Neil Hendricks Photo 2

Neil Hendricks

view source
Name / Title
Company / Classification
Phones & Addresses
Neil H. Hendricks
Manager
Advanced Wafer Fab Materials, LLC
505 Fairways Dr, Mesquite, NV 89027
Neil H. Hendricks
Managing
Advanced Wafer Fab Materials, LLC
Consulting, Electronic Materials
446 Sumner Ave, Aptos, CA 95003

Us Patents

  • Deposition Of Nanoporous Silica Films Using A Closed Cup Coater

    view source
  • US Patent:
    6335296, Jan 1, 2002
  • Filed:
    Jul 23, 1999
  • Appl. No.:
    09/360131
  • Inventors:
    Neil Hendricks - Sonora CA
    Douglas M. Smith - Albuquerque NM
    Teresa Ramos - Albuquerque NM
    James Drage - Fremont CA
  • Assignee:
    AlliedSignal Inc. - Morristown NJ
  • International Classification:
    H01L 2131
  • US Classification:
    438782, 438780, 438781, 427240
  • Abstract:
    A process for forming a uniform nanoporous dielectric film on a substrate. The process includes horizontally positioning a flat substrate within a cup; depositing a liquid alkoxysilane composition onto the substrate surface; covering the cup such that the substrate is enclosed therein; spinning the covered cup and spreading the alkoxysilane composition evenly on the substrate surface; exposing the alkoxysilane composition to water vapor and base vapor to thereby form a gel; and then curing the gel. The invention also provides an apparatus for spin depositing a liquid coating onto a substrate. The apparatus has a cylindrical cup with an open top section and removable cover which closes the top. A vapor injection port extends through the center of the cover. Suitable means hold a substrate centered within the cup and spin the cup.
  • Poly(Arylene Ether) Compositions And The Method For Their Manufacture

    view source
  • US Patent:
    RE37599, Mar 19, 2002
  • Filed:
    Sep 8, 2000
  • Appl. No.:
    09/659380
  • Inventors:
    Kreisler Lau - Sunnyvale CA
    Neil Hendricks - Sonora CA
    William Wan - Mountain View CA
    Aaron Smith - Ben Lomond CA
  • Assignee:
    AlliedSignal Inc. - Morristown NJ
  • International Classification:
    C08G 7324
  • US Classification:
    528401, 528 86, 528503, 428195, 428209, 428421, 428901
  • Abstract:
    A method is disclosed for making hydroxy-substituted ethynylated biphenyl compounds and for reacting such compounds with a family of noncross-linking thermosetting poly(arylene ethers) to produce novel poly(arylene ether) compositions which, when cured at glass transition temperatures greater than about 350Â C. to form thin films, possess properties such as low dielectric constant, low moisture absorption, and high thermal stability. These films are suitable for use as intermetal dielectrics for multilevel interconnection.
  • Silane-Based Nanoporous Silica Thin Films And Precursors For Making Same

    view source
  • US Patent:
    6410149, Jun 25, 2002
  • Filed:
    Aug 23, 1999
  • Appl. No.:
    09/378705
  • Inventors:
    Neil Hendricks - Sonora CA
    Douglas M. Smith - Albuquerque NM
    Teresa Ramos - Albuquerque NM
    Stephen Wallace - Albuquerque NM
    James Drage - Fremont CA
  • Assignee:
    AlliedSignal Inc. - Morristown NJ
  • International Classification:
    B23B 904
  • US Classification:
    428447, 428448, 438761, 438763, 438782, 438787, 427 96, 427387, 427421, 4274301
  • Abstract:
    Improved processes for forming hydrophobic nanoporous dielectric coatings on substrates are provided. The improved processes involve forming a reaction mixture that combines at least one mono-, di- or trifunctional precursor with at least one tetrafunctional precursor, recovering the reaction product, and then depositing the reaction product onto a suitable substrate, followed by gelling of the deposited film. Precursors include alkoxy, acetoxy and halogen leaving groups. Optional processes to enhance the hydrophobicity of a nanoporous silica film are also provided, as well as improved nanoporous silica films, coated substrates and integrated circuits prepared by the new processes.
  • Oxidizing Polishing Slurries For Low Dielectric Constant Materials

    view source
  • US Patent:
    6610114, Aug 26, 2003
  • Filed:
    Jun 14, 2001
  • Appl. No.:
    09/882000
  • Inventors:
    Dan Towery - Santa Clara CA
    Neil Hendricks - Sonora CA
    Paul Schilling - Granite Bay CA
  • Assignee:
    Honeywell International Inc. - Morristown NJ
  • International Classification:
    C09G 102
  • US Classification:
    51308, 51307, 51309, 106 3
  • Abstract:
    An oxidizing slurry for removal of low dielectric constant materials. The slurry is formed utilizing non-oxidizing particles with a separate oxidizing agent, oxidizing particles alone or reducible abrasive particles with a compatible oxidizing agent. The particles can be formed of a metal oxide, nitride, or carbide material, by itself or mixtures thereof, or can be coated on a core material such as silicon dioxide or can be coformed therewith. A preferred oxidizing slurry is multi-modal in particle size distribution. Although developed for utilization in CMP semiconductor processing the oxidizing slurry of the present invention also can be utilized for other high precision polishing processes.
  • Deposition Of Nanoporous Silica Films Using A Closed Cup Coater

    view source
  • US Patent:
    6610145, Aug 26, 2003
  • Filed:
    Sep 19, 2001
  • Appl. No.:
    09/956361
  • Inventors:
    Neil Hendricks - Sonora CA
    Douglas M. Smith - Albuquerque NM
    Teresa Ramos - Albuquerque NM
    James Drage - Fremont CA
  • Assignee:
    AlliedSignal Inc. - Morristown NJ
  • International Classification:
    B05C 1102
  • US Classification:
    118 52, 427240, 427425
  • Abstract:
    A process for forming a uniform nanoporous dielectric film on a substrate. The process includes horizontally positioning a flat substrate within a cup; depositing a liquid alkoxysilane composition onto the substrate surface; covering the cup such that the substrate is enclosed therein; spinning the covered cup and spreading the alkoxysilane composition evenly on the substrate surface; exposing the alkoxysilane composition to water vapor and base vapor to thereby form a gel; and then curing the gel. The invention also provides an apparatus for spin depositing a liquid coating onto a substrate. The apparatus has a cylindrical cup with an open top section and removable cover which closes the top. A vapor injection port extends through the center of the cover. Suitable means hold a substrate centered within the cup and spin the cup.
  • Complex Shaped Fiber For Particle And Molecular Filtration

    view source
  • US Patent:
    6623715, Sep 23, 2003
  • Filed:
    Apr 12, 2001
  • Appl. No.:
    09/834581
  • Inventors:
    Neil H. Hendricks - Sonora CA
    Jeff Miller - Los Gatos CA
    Ron P. Rohrbach - Flemington NJ
    Dan E. Bause - Flanders NJ
    Peter D. Unger - Morris Township NJ
    Adel G. Tannous - Santa Clara CA
    Randy R. LeClaire - Pleasanton CA
    William E. McGeever - Morgan Hill CA
  • Assignee:
    Honeywell International, Inc - Morristown NJ
  • International Classification:
    C01C 110
  • US Classification:
    423237, 4232391, 4232441, 4232451, 55524, 55527, 95211, 95214, 96296
  • Abstract:
    An ultra-efficient multilobal cross-sectioned fiber filter for chemical contaminant filtering applications is described. An absorptive chemically reactive reagent, preferably an acid or base and in liquid or an adsorptive chemically reactive reagent (an acid or base) in solid form, is disposed within longitudinal slots in each length of fiber. The reagent may be used alone or in conjunction with solid adsorptive particles which may also be utilized with the reagents in the longitudinal slots within the fibers. Reagents within the fibers remain exposed to a base-contaminated airstream passing through the filter. Base contaminants in the airstream, chemicals such as ammonium and amines (as well as particles), react with the acid reagent within the longitudinal slots of the fibers. As the contaminant and reagent react, the ammonium or amine becomes irreversibly absorbed (or adsorbed if reagent is a solid acid) to the liquid acid reagent and multilobal fiber.
  • Electron-Beam Processed Films For Microelectronics Structures

    view source
  • US Patent:
    6652922, Nov 25, 2003
  • Filed:
    May 23, 1996
  • Appl. No.:
    08/652893
  • Inventors:
    Lynn Forester - San Jose CA
    Neil H. Hendricks - Sonora CA
    Dong-Kyu Choi - Campbell CA
  • Assignee:
    Alliedsignal Inc. - Morristown NJ
  • International Classification:
    B05D 306
  • US Classification:
    427551, 427585, 427596, 427314, 427387, 427569, 42725528
  • Abstract:
    An improved method for producing substrates coated with dielectric films for use in microelectronic applications wherein the films are processed by exposing the coated substrate surfaces to a flux of electron beam. Substrates cured via electron beam exposure possess superior dielectric properties, density, uniformity, thermal stability, and oxygen stability.
  • Composition And Chemical Vapor Deposition Method For Forming Organic Low K Dielectric Films

    view source
  • US Patent:
    6878641, Apr 12, 2005
  • Filed:
    Oct 1, 2002
  • Appl. No.:
    10/065302
  • Inventors:
    Neil H. Hendricks - Sonora CA, US
  • Assignee:
    Advanced Technology Materials, Inc. - Danbury CT
  • International Classification:
    H01L021/31
  • US Classification:
    438758, 438710, 526251, 526250
  • Abstract:
    Precursor compositions for the CVD formation of low k dielectric films on a substrate, e. g. , as an interlayer dielectric for fabrication of microelectronic device structures. The precursor composition includes a gaseous mixture of (i) at least one aromatic compound, (ii) an inert carrier medium and (iii) optionally at least one unsaturated constituent that is ethylenically and/or acetylenically unsaturated The unsaturated constituent can include either (a) a compound containing ethylenic unsaturation and/or acetylenic unsaturation, or (b) an ethylenically unsaturated and/or acetylenically unsaturated moiety of the aromatic compound (i) of the precursor composition. The low k dielectric film material may be usefully employed in integrated circuitry utilizing copper metallization, to achieve low RC time constants and superior microelectronic device performance.

License Records

Neil R Hendricks

License #:
29306 - Active
Category:
Well Driller
Issued Date:
Dec 23, 1998
Effective Date:
Dec 23, 1998
Expiration Date:
Dec 31, 2018
Type:
Pump Installation Contractor

Neil R Hendricks

License #:
59003 - Expired
Category:
Well Driller
Issued Date:
Jan 1, 1987
Effective Date:
Jul 30, 2004
Expiration Date:
Dec 31, 1998
Type:
Pump Installation Supervisor

Googleplus

Neil Hendricks Photo 3

Neil Hendricks

Work:
Police
Neil Hendricks Photo 4

Neil Hendricks

Education:
Ohio State University - Mechanical Engineering
Neil Hendricks Photo 5

Neil Hendricks

Neil Hendricks Photo 6

Neil Hendricks

Neil Hendricks Photo 7

Neil Hendricks

Neil Hendricks Photo 8

Neil Hendricks

Plaxo

Neil Hendricks Photo 9

Neil Hendricks

view source
Rudi Llata Circus

Youtube

Neil Young " From Hank to Hendrix"

Unplugged.

  • Duration:
    5m 43s

From Hank to Hendrix

Provided to YouTube by Reprise From Hank to Hendrix Neil Young Harves...

  • Duration:
    5m 18s

Neil Young - From Hank to Hendrix

Neil Young - From Hank to Hendrix.

  • Duration:
    5m 16s

Neil Young + Promise Of The Real - From Hank ...

Official Music Video for Neil Young's "From Hank To Hendrix (Live)" Fr...

  • Duration:
    5m 4s

Neil Hendrix - They Say About You

  • Duration:
    3m 35s

22: Essential Skills for Conscious Relationsh...

Today's guests are none other than Harville Hendrix and Helen Lakelly ...

  • Duration:
    56m 9s

Classmates

Neil Hendricks Photo 10

Neil Hendricks

view source
Schools:
Kalkaska High School Kalkaska MI 1962-1966
Community:
Scott Harris
Neil Hendricks Photo 11

Kalkaska High School, Kal...

view source
Graduates:
Neil Hendricks (1962-1966),
Karen Klumpp (1955-1959),
Clesson Jackson (1959-1963),
Danielle Larson (2004-2008)

Facebook

Neil Hendricks Photo 12

Neil Hendricks

view source
Friends:
Derek Valet, Henry Hwang, Amanda Morrow, Alex Angove, Neil Hendricks. Photo Log in to contact Neil Hendricks.
Neil Hendricks. Photo Log in to contact Neil Hendricks.
Neil Hendricks Photo 13

Romano Neil Hendricks

view source
Neil Hendricks Photo 14

Neil Allan Hendricks

view source
Neil Hendricks Photo 15

Neil Hendricks

view source
Neil Hendricks Photo 16

Neil Hendricks

view source
Neil Hendricks Photo 17

Phillip Neil Hendricks

view source
Neil Hendricks Photo 18

Neil Hendricks

view source
Neil Hendricks Photo 19

Neil Hendricks

view source

Flickr

Myspace

Neil Hendricks Photo 28

Neil Hendricks

view source
Locality:
thailand, Florida
Gender:
Male
Birthday:
1951
Neil Hendricks Photo 29

Neil Hendricks

view source
Locality:
yo mamas britchess!, Florida
Gender:
Male
Birthday:
1951

Get Report for Neil Hyer Hendricks from Mesquite, NV, age ~74
Control profile