Nicholas J Conti

US Patent:

20070168918, Jul 19, 2007

Filed:

Nov 10, 2006

Appl. No.:

11/558635

Inventors:

Jeanne Metherall - Doylestown PA, US
Philip DiJoseph - Malvern PA, US
Nicholas Conti - Spring City PA, US
Catherine Britton - Media PA, US

Assignee:

SIEMENS MEDICAL SOLUTIONS HEALTH SERVICES CORPORATION - MALVERN PA

International Classification:

G06F 9/44

US Classification:

717101000

Abstract:

A software development planning and management system includes at least one repository of information associating, sub-tasks of an encompassing software development task to be completed and a timeline of sub-task completion, programmer personnel resources, software development requirements and software defects. A user interface uses the repository in providing data representing at least one display image indicating status of sub-task completion, including status of sub-task software generation and test. A resource processor also uses the repository in determining programmer personnel resources required for completion of a plurality of sub-tasks.

US Patent:

56440235, Jul 1, 1997

Filed:

Apr 21, 1992

Appl. No.:

7/871652

Inventors:

Nicholas Joseph Conti - Flemington NJ
Frederick John Karol - Belle Mead NJ
George Norris Foster - Bloomsbury NJ

Assignee:

Union Carbide Chemicals & Plastics Technology Corporation - Danbury CT

International Classification:

C08G 6702
B01J 3118

US Classification:

528392

Abstract:

A process comprising: (a) introducing a mixture comprising one or more alpha-olefins, carbon monoxide, and, optionally, one or more dienes into a reaction zone under polymerization conditions; (b) contacting the mixture with a catalyst prepared by a process comprising: (i) providing a transition metal in the zero valence state adsorbed on a support; (ii) reacting the supported metal with an oxidant to form a supported compound wherein the metal has a positive valence; (iii) ligating the supported compound with a ligand; and (c) introducing a reoxidant into the reaction zone to maintain the positive valence of the metal.