Patrick James Harder

US Patent:

20110250116, Oct 13, 2011

Filed:

Nov 17, 2009

Appl. No.:

13/127987

Inventors:

Patrick James Harder - Midland MI, US
Arthur James Tselepis - Midland MI, US

International Classification:

C01B 33/107

US Classification:

423342

Abstract:

A process for reducing waste and increasing yield of chlorosilane monomers is performed by cracking polychlorosiloxane and polychlorosilane by-products generated during production of trichlorosilane useful for the manufacture of polycrystalline silicon.

US Patent:

54362075, Jul 25, 1995

Filed:

Dec 10, 1993

Appl. No.:

8/164865

Inventors:

William H. Atwell - Midland MI
Donald M. Bartos - Midland MI
Patrick J. Harder - Bay City MI
Jonathan Lipowitz - Midland MI
Chandan K. Saha - Midland MI

Assignee:

Dow Corning Corporation - Midland MI

International Classification:

C04B 35571

US Classification:

501 88

Abstract:

Disclosed is a process for the formation of silicon carbide powder in which vaporized polysiloxanes are reacted and pyrolyzed in a single heating step to form the silicon carbide powder. The process is simple and inexpensive and yields powder having desirable characteristics.

US Patent:

54220882, Jun 6, 1995

Filed:

Jan 28, 1994

Appl. No.:

8/188852

Inventors:

Richard A. Burgie - Midland MI
Patrick J. Harder - Bay City MI
David H. Sawyer - Midland MI

Assignee:

Hemlock Semiconductor Corporation - Hemlock MI

International Classification:

C01B 33107

US Classification:

423342

Abstract:

An improved process for contacting hydrogen gas and tetrachlorosilane in a reactor comprising a pressurizable shell having located therein a reaction vessel forming a substantially closed inner chamber for reacting the hydrogen gas with the tetrachlorosilane. The improvement comprises feeding to an outer chamber between the pressurizable shell and the reaction vessel a gas or gaseous mixture having a chlorine to silicon molar ratio greater than about 3. 5. The improvement reduces the concentration of hydrogen and tetrachlorosilane in the outer chamber that results from leakage of these gases from the substantially closed inner chamber and the detrimental reactions associated with such leakage on structural elements and performance of the reactor.

US Patent:

20190030506, Jan 31, 2019

Filed:

Oct 4, 2018

Appl. No.:

16/151520

Inventors:

- Hemlock MI, US
Raymond Anthony Cocco - Elmhurst IL, US
Max E. Dehtiar - Saginaw MI, US
Patrick J. Harder - Saginaw MI, US
Ted M. Knowlton - Willowbrook, US
Michael J. Molnar - Freeland MI, US

International Classification:

B01J 8/24
B01J 8/18
C01B 33/03
C01B 33/027
G01N 15/02
B01J 8/44

Abstract:

A fluidized bed reactor includes a gas distributor, a tapered section above the gas distributor, and an expanded head above the tapered section. The gas distributor defines a plurality of inlets surrounding a product withdrawal tube, which extends away from the fluidized bed reactor. The fluidized bed reactor is useful in a process for fluidizing relatively large particles, such as Geldart Group B particles and/or Geldart Group D particles, where said particles are in a bubbling fluidized bed residing, in whole or in part, in the tapered section. The fluidized bed reactor and process may be used for manufacturing polycrystalline silicon.

US Patent:

20180021747, Jan 25, 2018

Filed:

Mar 15, 2016

Appl. No.:

15/541583

Inventors:

- Midland MI, US
Aaron Coppernoll - Crestwood KY, US
Patrick James Harder - Midland MI, US
Dimitris Katsoulis - Midland MI, US
Vladimir Pushkarev - Midland MI, US

Assignee:

Dow Corning Corporation - Midland MI

International Classification:

B01J 8/18
C01B 33/06
C01B 33/107

Abstract:

A method is useful for maintaining a uniformly fluidized bed in a fluidized bed apparatus. The method includes the steps of charging a mixture of particles including copper silicide particles and fluidization additive particles into the fluidized bed apparatus, and uniformly fluidizing the particles at a temperature of at least 400 C. in the fluidized bed apparatus.

US Patent:

20150217252, Aug 6, 2015

Filed:

Aug 26, 2013

Appl. No.:

14/423271

Inventors:

- Hemlock MI, US
Raymond Anthony Cocco - Elmhurst IL, US
Max E. Dehtiar - Saginaw MI, US
Patrick J. Harder - Saginaw MI, US
Ted M. Knowlton - Willowbrook IL, US
Michael J. Molnar - Freeland MI, US

International Classification:

B01J 8/24
C01B 33/03
G01N 15/02
B01J 8/18

Abstract:

A fluidized bed reactor includes a gas distributor, a tapered section above the gas distributor, and an expanded head above the tapered section. The gas distributor defines a plurality of inlets surrounding a product withdrawal tube, which extends away from the fluidized bed reactor. The fluidized bed reactor is useful in a process for fluidizing relatively large particles, such as Geldart Group B particles and/or Geldart Group D particles, where said particles are in a bubbling fluidized bed residing, in whole or in part, in the tapered section. The fluidized bed reactor and process may be used for manufacturing polycrystalline silicon.