Paul G Connors

US Patent:

20170178758, Jun 22, 2017

Filed:

Dec 5, 2016

Appl. No.:

15/369219

Inventors:

- Santa Clara CA, US
Paul CONNORS - San Mateo CA, US
Jianhua ZHOU - Campbell CA, US
Juan Carlos ROCHA-ALVAREZ - San Carlos CA, US
Kwangduk Douglas LEE - Redwood City CA, US
Ziqing DUAN - Sunnyvale CA, US
Nicolas J. BRIGHT - Arlington WA, US
Feng BI - Cupertino CA, US

International Classification:

G21F 3/00
C23C 16/458
C23C 16/50
C23C 16/448

Abstract:

The present disclosure generally relates to a radiation shield for a process chamber which improves substrate temperature uniformity. The radiation shield may be disposed between a slit valve door of the process chamber and a substrate support disposed within the process chamber. In some embodiments, the radiation shield may be disposed under a heater of the process chamber. Furthermore, the radiation shield may block radiation and/or heat supplied from the process chamber, and in some embodiments, the radiation shield may absorb and/or reflect radiation, thus providing improved temperature uniformity as well as improving a planar profile of the substrate.