Paul G Guilmette

US Patent:

6835300, Dec 28, 2004

Filed:

Sep 13, 2002

Appl. No.:

10/065057

Inventors:

Joseph Shoulian Zhu - Jacksonville FL
Bang Mo Kim - Schenectady NY
Jeffery L. Schworm - Delanson NY
Kevin C. Green - Rutland VT
Paul Guilmette - Rutland VT

Assignee:

General Electric Company - Niskayuna NY

International Classification:

B23H 300

US Classification:

205676, 252 622

Abstract:

An electrolyte solution containing an alkylene glycol and a chloride salt is useful for electropolishing metal substrates. An electropolishing method using the electrolyte solution is effective for polishing a varied of metals, including titanium and noble metals. The method avoids the handling and disposal challenges associated with previous methods using etching solutions containing hydrofluoric acid. A method of recycling the spent electrolyte solution is also described.

US Patent:

20050045491, Mar 3, 2005

Filed:

Oct 6, 2004

Appl. No.:

10/960190

Inventors:

Joseph Zhu - Jacksonville FL, US
Bang Kim - Shenectady NY, US
Jeffery Schworm - Delanson NY, US
Kevin Green - Rutland VT, US
Paul Guilmette - Rutland VT, US

International Classification:

B23H003/08

US Classification:

205676000

Abstract:

An electrolyte solution containing an alkylene glycol and a chloride salt is useful for electropolishing metal substrates. An electropolishing method using the electrolyte solution is effective for polishing a varied of metals, including titanium and noble metals. The method avoids the handling and disposal challenges associated with previous methods using etching solutions containing hydrofluoric acid. A method of recycling the spent electrolyte solution is also described.