An implantable device, appliance or component thereof is provided which includes a porous coating of conductive ceramic material, which porous coating is prepared by subjecting a blend of conductive ceramic material and a reductive gas atmosphere to plasma deposition conditions and spraying same onto the device, appliance or component onto which the porous coating is thereby formed.
Process For Making An Implantable Device Having Plasma Sprayed Metallic Porous Surface
An implantable device, appliance or component thereof is provided which includes a porous coating of elemental metal, which porous coating is prepared by subjecting a blend of elemental metal powder and a reductive gas atmosphere to plasma deposition conditions and spraying same onto the device, appliance or component onto which the porous coating is thereby formed.
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