Percy V Crocker

US Patent:

20040127025, Jul 1, 2004

Filed:

Aug 26, 2003

Appl. No.:

10/647430

Inventors:

Percy Crocker - Chicago IL, US
Linette Demers - Evanston IL, US
Nabil Amro - Skokie IL, US

International Classification:

H01L021/44
B05D005/12

US Classification:

438/677000, 427/125000

Abstract:

Nanolithographic deposition of metallic nanostructures using coated tips for use in microelectronics, catalysis, and diagnostics. AFM tips can be coated with metallic precursors and the precursors patterned on substrates. The patterned precursors can be converted to the metallic state with application of heat. High resolution and excellent alignment can be achieved.

US Patent:

20040175631, Sep 9, 2004

Filed:

Oct 21, 2003

Appl. No.:

10/689547

Inventors:

Percy Van Crocker - Chicago IL, US
Sylvain Cruchon-Dupeyrat - Chicago IL, US
Linette Demers - Chicago IL, US
Robert Elghanian - Chicago IL, US
Sandeep Disawal - Chicago IL, US
Nabil Amro - Chicago IL, US
Hua Zhang - Chicago IL, US

Assignee:

NanoInk, Inc.

International Classification:

G03F009/00
G21K005/00

US Classification:

430/005000, 430/004000, 378/035000

Abstract:

Photomask repair and fabrication with use of direct-write nanolithography, including use of scanning probe microscopic tips for deposition of ink materials including sol-gel and metallic inks. Additive methods can be combined with substractive methods. Holes can be filled with nanostructures. Height of the nanostructure filling the hole can be controlled without losing control of the lateral dimensions of the nanostructure. Chrome-on-Glass masks can be used and fabricated, as well as more advanced masks including masks for nanoimprint nanolithography.