Quan Li

US Patent:

20210314298, Oct 7, 2021

Filed:

Apr 1, 2020

Appl. No.:

16/837298

Inventors:

- Denver CO, US
Quan Li - Fremont CA, US
Zifang Huang - Redwood City CA, US

Assignee:

The Western Union Company - Denver CO

International Classification:

H04L 29/06
H04L 12/24
G06N 20/00
G06N 7/00

Abstract:

Techniques and systems for optimizing and cleaning rules for network-based authentication transactions are provided herein. A network-based authentication system may determine a plurality of rules that were previously used to evaluate a plurality of transactions. The network-based authentication system may also generate a false positive rate for one or more of the plurality of rules, A cleaning coefficient for a first rule of the plurality of rules may be generated by the network-based authentication system. Based on the cleaning coefficient and the false positive rate, the network-based authentication system may identify one or more rules from the plurality of rules to eliminate from the plurality of rules. The network-based authentication system may eliminate the one or more rules to generate a modified set of rules. Using the modified set of rules, the network-based authentication system may authenticate a network transaction.

US Patent:

20180182714, Jun 28, 2018

Filed:

Dec 18, 2017

Appl. No.:

15/845256

Inventors:

- Chandler AZ, US
Quan Bang LI - Gilbert AZ, US

Assignee:

EVERSPIN TECHNOLOGIES, INC. - Chandler AZ

International Classification:

H01L 23/552
H01L 49/02
H01L 21/56
H01L 21/28
H01L 23/28
H01L 23/13
H01L 23/00
H05K 1/02
G11C 16/04
G11C 17/08

Abstract:

The present disclosure is drawn to, among other things, a method of forming a semiconductor shield from a stock material having a thickness. In some aspects the methods includes providing a first layer of material on a first surface of the stock material, wherein at least a portion of the first layer of material includes a first window that exposes a portion of the first surface; providing a second layer of material on a second surface of the stock material, wherein the second surface of the stock material is spaced from the first surface by the thickness of the stock material, and wherein at least portion of the second layer of material includes a second window that exposes a portion of the second surface; and selectively removing a portion of the stock material exposed at the first or second windows, wherein the portion removed includes less than an entirety of the thickness of the stock material.