Rajesh Mehta

US Patent:

6443611, Sep 3, 2002

Filed:

Dec 15, 2000

Appl. No.:

09/738734

Inventors:

Dirk J. Hasberg - Rochester NY
Rajesh V. Mehta - Rochester NY
Michael Bryan - Watford, GB
Ramesh Jagannathan - Rochester NY

Assignee:

Eastman Kodak Company - Rochester NY

International Classification:

B01F 1502

US Classification:

3661721, 3661722, 3661781, 366262, 366292, 366315, 422225, 430567, 430569

Abstract:

An apparatus and method for mixing at least two reactants is taught wherein a first reactant is delivered to a reaction zone through a first annular flow path and a second reactant is delivered to the reaction zone through a second annular flow path. The first and second annular flow paths are concentric with one another and the two reactants intermix with one another in the reaction zone. There is a rotating disc having a surface, defining one boundary of the reaction zone. The flow of the first and second reactants across the rotating disc and through the reaction zone is generally radial and has a residence time in the reaction zone of not more than about 100 msec, and preferably not more than about 50 msec. The reaction zone resides in a main reactor vessel and there is a driven agitator residing in the main reactor vessel to stir the contents thereof.

US Patent:

6513965, Feb 4, 2003

Filed:

Nov 6, 2001

Appl. No.:

09/992512

Inventors:

Dirk J. Hasberg - Rochester NY
Rajesh V. Mehta - Rochester NY
Michael Bryan - Watford, GB
Ramesh Jagannathan - Rochester NY

Assignee:

Eastman Kodak Company - Rochester NY

International Classification:

B01F 1500

US Classification:

3661681, 3661721, 3661731, 3661722, 3661752

Abstract:

An apparatus and method for mixing at least two reactants is taught wherein a first reactant is delivered to a reaction zone through a first annular flow path and a second reactant is delivered to the reaction zone through a second annular flow path. The first and second annular flow paths are concentric with one another and the two reactants intermix with one another in the reaction zone. There is a rotating disc having a surface, defining one boundary of the reaction zone. The flow of the first and second reactants across the rotating disc and through the reaction zone is generally radial and has a residence time in the reaction zone of not more than about 100 msec, and preferably not more than about 50 msec. The reaction zone resides in a main reactor vessel and there is a driven agitator residing in the main reactor vessel to stir the contents thereof.

US Patent:

6623918, Sep 23, 2003

Filed:

May 29, 2002

Appl. No.:

10/157689

Inventors:

Dirk J. Hasberg - Rochester NY
Rajesh V. Mehta - Rochester NY

Assignee:

Eastman Kodak Company - Rochester NY

International Classification:

G03C 1015

US Classification:

430569

Abstract:

A process for the preparation of a radiation-sensitive silver halide emulsion comprised of high bromide tabular silver halide grains is described, the process comprising: (a) providing in a stirred reaction vessel a dispersing medium and high bromide silver halide tabular seed grains, the seed grains comprising at least 5 mole % of the final emulsion silver, and (b) precipitating a silver halide shell which comprises at least 5 mole % of the final emulsion silver onto the seed grains by introducing at least a silver salt solution into the dispersing medium at a rate such that the normalized shell molar addition rate, R , is above 1. 0Ã10 min , R satisfying the formula: where M is the number of moles of silver halides added to the reaction vessel during the formation of the shell, t is the run time, in minutes, of the silver salt solution for the formation of the shell, and M is total moles of silver halide in the reaction vessel at the end of the precipitation of the shell; wherein the concentration of silver halide grains in the reaction vessel at the end of the precipitation of the shell is at least 0. 5 mole/L. The invention provides an improved manufacturing process for the preparation of high bromide silver halide tabular grain emulsion enabling concentrated emulsion batches to be prepared with desired photographic properties.

US Patent:

6666548, Dec 23, 2003

Filed:

Nov 4, 2002

Appl. No.:

10/287579

Inventors:

Sridhar Sadasivan - Rochester NY
David J. Nelson - Rochester NY
Seshadri Jagannathan - Pittsford NY
Thomas C. Jackson - Honeoye Falls NY
Ramesh Jagannathan - Rochester NY
Suresh Sunderrajan - Rochester NY
Rajesh V. Mehta - Rochester NY

Assignee:

Eastman Kodak Company - Rochester NY

International Classification:

B41J 202

US Classification:

347 77

Abstract:

A method and an apparatus for continuously delivering a solvent free marking material to a receiver includes a printhead with a discharge device is provided. The discharge device has an outlet and is in fluid communication with a pressurized reservoir of a thermodynamically stable mixture of a compressed fluid solvent and a marking material. The marking material becomes free of the solvent after ejected through the discharge device. A deflection mechanism is positioned relative to the outlet of the discharge device. The deflection mechanism is adapted to selectively deflect the marking material away from a first path to a second path. A gutter is positioned at an end of the first path, and the solvent free marking material is collected by the gutter. A receiver transporting mechanism is positioned at an end of the second path and the receiver transporting mechanism is adapted to provide a receiver to allow solvent free marking material be deposited on the receiver.

US Patent:

6672702, Jan 6, 2004

Filed:

Jun 5, 2002

Appl. No.:

10/163326

Inventors:

Sridhar Sadasivan - Rochester NY
David J. Nelson - Rochester NY
Seshadri Jagannathan - Pittsford NY
Suresh Sunderrajan - Rochester NY
Gary E. Merz - Rochester NY
John E. Rueping - Spencerport NY
Ramesh Jagannathan - Rochester NY
Rajesh V. Mehta - Rochester NY

Assignee:

Eastman Kodak Company - Rochester NY

International Classification:

B41J 29393

US Classification:

347 19

Abstract:

A method and apparatus for delivering solvent free marking material to a receiver is provided. A printhead includes a discharge device having an inlet and an outlet with a portion of the discharge device defining a delivery path. An actuating mechanism is moveably positioned along the delivery path. A material selection device has an inlet and an outlet with the outlet of the material selection device being connected in fluid communication to the inlet of the discharge device. The inlet of the material selection device is adapted to be connected to a pressurized source of a thermodynamically stable mixture of a fluid and a marking material, wherein the fluid is in a gaseous state at a location beyond the outlet of the discharge device. A calibration station is positioned relative to the printhead. Additionally, or alternatively, a cleaning station is positioned relative to the printhead.

US Patent:

6695980, Feb 24, 2004

Filed:

Dec 27, 2001

Appl. No.:

10/033422

Inventors:

Glen C. Irvin - Rochester NY
Sridhar Sadasivan - Rochester NY
Ramesh Jagannathan - Rochester NY
Seshadri Jagannathan - Pittsford NY
Suresh Sunderrajan - Rochester NY
Rajesh V. Mehta - Rochester NY

Assignee:

Eastman Kodak Company - Rochester NY

International Classification:

C09D 522

US Classification:

25230116, 2523014 R, 2523014 S, 2523014 F, 2523014 P, 2523014 H, 2523015, 2523016 R, 2523016 P, 2523016 S, 2523016 F, 106 3115, 106 3132, 106 3164, 106 3192

Abstract:

An imaging composition comprises a mixture of a fluid and a functional material; wherein the fluid is compressed and the functional material is an electroluminescent material which is dissolved, dispersed and/or solubilized in the compressed fluid; and wherein the mixture is thermodynamically stable or thermodynamically metastable or both.

US Patent:

6753134, Jun 22, 2004

Filed:

Jul 24, 2002

Appl. No.:

10/202314

Inventors:

Dirk J. Hasberg - Rochester NY
Rajesh V. Mehta - Rochester NY

Assignee:

Eastman Kodak Company - Rochester NY

International Classification:

G03C 1035

US Classification:

430569, 430567

Abstract:

A process for the preparation of a radiation-sensitive silver halide emulsion comprised of high bromide cubical silver halide grains is described, the process comprising: (a) providing in a stirred reaction vessel a dispersing medium and high bromide silver halide seed grains, the seed grains comprising at least 5 mole % of the final emulsion silver, and (b) precipitating a silver halide shell which comprises at least 5 mole % of the final emulsion silver onto the seed grains by introducing at least a silver salt solution into the dispersing medium at a rate such that the normalized shell molar addition rate, R , is above 1. 0Ã10 min , R satisfying the formula: where M is the number of moles of silver halides added to the reaction vessel during the formation of the shell, t is the run time, in minutes, of the silver salt solution for the formation of the shell, and M is total moles of silver halide in the reaction vessel at the end of the precipitation of the shell; wherein the concentration of silver halide grains in the reaction vessel at the end of the precipitation of the shell is at least 0. 5 mole/L. The invention provides an improved manufacturing process for the preparation of high bromide silver halide cubical grain emulsion enabling concentrated emulsion batches to be prepared with desired photographic properties. In certain embodiments of the invention, further advantages are enabled in accordance with the discovery that when the exterior portion of high bromide silver halide cubic grains are grown under specific conditions of high molar addition rates, emulsions of enhanced sensitivity, improved contrast and radiographic curve shape may be produced while controlling the minimum fog level.

US Patent:

6780249, Aug 24, 2004

Filed:

Dec 6, 2002

Appl. No.:

10/313427

Inventors:

David J. Nelson - Rochester NY
Suresh Sunderrajan - Rochester NY
Ramesh Jagannathan - Rochester NY
Seshadri Jagannathan - Pittsford NY
Sridhar Sadasivan - Rochester NY
Rajesh V. Mehta - Rochester NY
John E. Rueping - Rochester NY

Assignee:

Eastman Kodak Company - Rochester NY

International Classification:

B05C 502

US Classification:

118624, 118308, 118721, 118723 R, 427468, 427469, 427282

Abstract:

A system ( ) produces patterned deposition on a substrate ( ) from supercritical fluids. A delivery system ( ) cooperates with a partial enclosure environment ( ) retaining a movable substrate ( ) for receiving precipitated functional material ( ) along a fluid delivery path ( ) from the delivery system ( ). A shadow mask ( ) is arranged in close proximity to the movable substrate ( ) for forming the patterned deposition on the movable substrate ( ).