Ram P Gupta

US Patent:

6348591, Feb 19, 2002

Filed:

Jun 18, 1999

Appl. No.:

09/335883

Inventors:

Ram Baboo Gupta - Stamford CT
Dennis John Jakiela - Orange CT

Assignee:

Cytec Technology Corp. - Wilmington DE

International Classification:

C07D25102

US Classification:

544215, 544216, 524100, 430507, 430512, 25230123

Abstract:

This invention relates generally to red-shifted trisaryl-1,3,5-triazines and the use thereof to protect against degradation by environmental forces, inclusive of ultraviolet light, actinic radiation, oxidation, moisture, atmospheric pollutants and combinations thereof. The new class of trisaryl-1,3,5-triazines comprises an aryl ring attached to the triazine ring [and preferably an aryl ring containing a hydroxyl group, either free or blocked to form a latent stabilizer, ortho- to the point of attachment to the triazine ring (2-position) and a hydroxyl group or a moiety joined by an ether linkage para- to the point of attachment to the triazine ring (4-position)] substituted at the 3-position or disubstituted at the 3- and 5-positions with a group comprising an amide and/or an amine. These materials may be incorporated into formulations comprising coatings, polymers, resins, organic compounds and the like. A method for stabilizing a material by incorporating such red-shifted trisaryl-1,3,5-triazines is also disclosed.

US Patent:

6355708, Mar 12, 2002

Filed:

Apr 11, 2001

Appl. No.:

09/832613

Inventors:

Ram Baboo Gupta - Stamford CT
Dennis John Jakiela - Orange CT
Gottfried Haacke - New Canaan CT

Assignee:

Ciba Specialty Chemicals Corporation - Tarrytown NY

International Classification:

C08K 53492

US Classification:

524100, 252403, 524 94, 528423

Abstract:

The present invention relates to novel bondable trisaryl-1,3,5-triazines containing active (acidic) hydrocarbons and the use thereof as an ultraviolet light absorber. The presently claimed compounds are particularly useful, either alone or in combination with other additives, including other ultraviolet light absorbers and stabilizers, in stabilizing polymers and other materials from degradation by environmental forces such as actinic radiation (ultraviolet light), oxidation, moisture, atmospheric pollutants and combinations thereof.

US Patent:

6365652, Apr 2, 2002

Filed:

May 3, 2001

Appl. No.:

09/848195

Inventors:

Ram Baboo Gupta - Stamford CT
Dennis John Jakiela - Orange CT
Thomas P. Sassi - Stamford CT
Gottfried Haacke - New Canaan CT

Assignee:

Ciba Specialty Chemicals Corporation - Tarrytown NY

International Classification:

C08K 53492

US Classification:

524100, 524 94, 428704, 528423

Abstract:

This invention relates generally to amido or carbamate substituted trisaryl-1,3,5-triazines and the use thereof to protect against degradation by environmental forces, inclusive of ultraviolet light, actinic radiation, oxidation, moisture, atmospheric pollutants and combinations thereof. The new class of trisaryl-1,3,5-triazines comprises an aryl ring attached to the triazine ring (and preferably an aryl ring containing a hydroxyl group, either free or blocked to form a latent stabilizer, ortho- to the point of attachment to the triazine ring) substituted with a group comprising a bondable amido/carbamate containing group para- to the point of attachment to the triazine ring. These materials may, under the appropriate circumstances, be bonded to formulations comprising coatings, polymers, resins, organic compounds and the like via reaction of the bondable functionality with the materials of the formulation. A method for stabilizing a material by incorporating such amido or carbamate substituted trisaryl-1,3,5-triazines is also disclosed.

US Patent:

6384113, May 7, 2002

Filed:

Aug 10, 2001

Appl. No.:

09/928098

Inventors:

Ram B. Gupta - Stamford CT
Dennis J. Jakiela - Orange CT
Robert G. Fischer - Fairfield CT

Assignee:

Cytec Technology Corp. - Wilmington DE

International Classification:

C08K 534

US Classification:

524100, 524 83, 524 84, 524 92

Abstract:

This invention relates generally to a new class of benzocycle-substituted pyrimidines and triazines and the use thereof to protect coatings, polymers and organic compounds against degradation by environmental forces, inclusive of ultraviolet light, actinic radiation, oxidation, moisture, atmospheric pollutants and combinations thereof. The new class of benzocycle-substituted pyrimidines and triazines comprises a benzocycle attached to the triazine or pyrimidine ring, and preferably an additional aryl ring containing a hydroxyl group, either free or blocked to form a latent stabilizer, ortho- to the point of attachment to the triazine or pyrimidine ring.

US Patent:

6414155, Jul 2, 2002

Filed:

Nov 3, 2000

Appl. No.:

09/704527

Inventors:

Thomas Patrick Sassi - Stamford CT
Ram Baboo Gupta - Stamford CT

Assignee:

Cytec Technology Corp. - Wilmington DE

International Classification:

C07D40114

US Classification:

546188, 546186, 546190

Abstract:

Oligomeric compounds and methods of making the compound having the formula: wherein i, j, k, and l are integers from about 0 to 300 and the sum of i, j, k, and l is greater than 2, wherein the units F, Fâ and T are derived from one or more multi-functional carbonyl compounds of general structure wherein n is an integer from 1 to 15, m is either 0 or 1; R , R , R , and R , are each a hydrogen or a hydrocarbyl group; Y is COâ(CR R ) , wherein R and R are each a hydrogen or hydrocarbyl group and p is zero or an integer from 1 to 20 or COâC H â, wherein the substitution pattern on the phenylene group is an ortho, meta, or para substitution pattern, and one or more of the hydrogens of the phenylene group may be substituted by a hydrocarbyl group or a functional group; and D is a hydrocarbyl group and the units E, Eâ and S are derived from one or more 1-substituted piperidin-4-ol or 4-aminopiperidines of general structure wherein Z is OH or NHG, wherein G is H or C -C alkyl, R is â(CH ) âOH or â(CH ) âNH , wherein s is an integer from 1 to 10; R represents hydrogen, C -C alkyl, or benzyl; R , R , R , and R are each a hydrogen, C -C alkyl, benzyl or phenethyl, or two geminal R moieties, which together with the carbon to which they are attached form a C -C cycloalkyl. The compounds are useful for stabilizing polymer compositions against photo- and thermal degradation.

US Patent:

6486316, Nov 26, 2002

Filed:

Nov 17, 1999

Appl. No.:

09/442000

Inventors:

Ram B. Gupta - Stamford CT
Dennis J. Jakiela - Orange CT
Sampath Venimadhavan - Stamford CT
Russell C. Cappadona - Norwalk CT
Venkatrao K. Pai - Stamford CT

Assignee:

Cytec Technology Corp. - Wilmington DE

International Classification:

C07D25124

US Classification:

544216, 544217

Abstract:

It has been now surprisingly discovered after extensive research that 2-halo-4,6-bisaryl-1,3,5-triazine can be prepared with unprecedented selectivity, efficiency, mild conditions, and in high yield by the reaction of cyanuric halide with aromatics in the presence of at least one Lewis acid and at least one reaction promoter. This reaction is also unprecedently general as a variety of aromatics can be used to produce a wide selection of 2-halo-4,6-bisaryl-1,3,5-triazines. The novel approach includes the use of the reaction promoters in combination with at least one Lewis acid under certain reaction conditions to promote the formation of 2-halo-4,6-bisaryl-1,3,5-triazine compounds from cyanuric halide. Preferably, the Lewis acids and reaction promoters are combined to form a complex. 2-Halo-4,6-bisaryl-1,3,5-triazines are key intermediates for making 2-(2-oxyaryl)-4,6-bisaryl-1,3,5-triazine class of UV absorbers.

US Patent:

6486317, Nov 26, 2002

Filed:

Oct 18, 2000

Appl. No.:

09/691502

Inventors:

Ram B. Gupta - Stamford CT
Dennis J. Jakiela - Orange CT
Sampath Venimadhavan - Norwalk CT
Russell C. Cappadona - Norwalk CT
Venkatrao K. Pai - Stamford CT

Assignee:

Ciba Specialty Chemicals Corporation - Tarrytown NY

International Classification:

C07D25124

US Classification:

544216, 544217

Abstract:

The invention provides new processes for preparing compositions containing at least one triazine compound, including new compounds for use in these processes to form the compositions and the new compositions that are formed.

US Patent:

6492521, Dec 10, 2002

Filed:

Oct 25, 2001

Appl. No.:

10/045333

Inventors:

Thomas P. Sassi - Stamford CT
Ram B. Gupta - Stamford CT

Assignee:

Cytec Technology Corp. - Wilmington DE

International Classification:

C07D40112

US Classification:

546188, 546190, 546242, 546248, 546 16, 524 86, 525167

Abstract:

Compounds and methods of preparing compounds of the formula: wherein n is an integer from 1 to 15, m is either 0 or 1; R , R , R , and R are each a hydrogen or a hydrocarbyl group; Y is COâ(CR R ) , wherein R and R are each a hydrogen or hydrocarbyl group and p is zero or an integer from 1 to 20 or COâC H â, wherein the substitution pattern on the phenylene group is an ortho, meta, or para substitution pattern and one or more of the hydrogens of the phenylene group may be substituted by a hydrocarbyl group or a functional group; Z is âOâ or âNGâ, wherein G is H, C -C alkyl or the radical R; wherein R is wherein R is hydrogen, C -C alkyl, O, OH, CH CN, C -C alkoxy, C -C hydroxyalkoxy, C -C cycloalkoxy, C -C hydroxycycloalkoxy, C -C alkenyl, C -C alkynyl, C -C phenylalkyl, unsubstituted or substituted on the phenyl with 1, 2 or 3 C -C alkyls, or an aliphatic C -C acyl; R is hydrogen, C -C alkyl, or benzyl; R , R , R , and R are each a hydrogen, C -C alkyl, benzyl or phenethyl, or two geminal R moieties, which together with the carbon to which they are attached form a C -C cycloalkyl; and A is either ZR or a hydrocarbyl group, which are useful for stabilizing polymer compositions against photo- and thermal degradation.