Ramya Viswanathan

age ~43

from Irving, TX

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Ramya Viswanathan Phones & Addresses

Irving, TX
Frisco, TX
Carrollton, TX
Fair Lawn, NJ
Park Ridge, NJ
Chicago, IL
Jersey City, NJ
The Woodlands, TX
Burr Ridge, IL

Work

Company:

Mary kay inc.
Aug 2016
Position:

Senior hcm analyst

Education

Degree:

Bachelor of Engineering, Bachelors
School / High School:

Bharathiar University College of Arts and Science
1999 to 2003
Specialities:

Electronics Engineering

Skills

Business Analysis • Vendor Management • Human Resources • Talent Acquisition • Management • Sdlc • Requirements Gathering • Consulting • Peoplesoft • Process Improvement • Business Process Improvement • Integration • Requirements Analysis • Technical Recruiting • Change Management • Software Development Life Cycle • Sql • Data Analysis • Testing • Oracle Applications • Project Management • Oracle • Erp • Business Intelligence • Analysis • Business Process • Peopletools

Languages

English • Hindi • Tamil • French

Industries

Information Technology And Services

Resumes

Senior Hcm Analyst

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Location:

Frisco, TX

Industry:

Information Technology And Services

Work:

Mary Kay Inc.
Senior Hcm Analyst
Texas Health Resources
Peoplesoft 9.2 Hcm Functional Analyst
Cbre Jul 2014 - Mar 2015
Peoplesoft Functional Lead
Willis Towers Watson Dec 2010 - Jan 2014
Senior Peoplesoft Business Analyst
Standard Chartered Bank Mar 2008 - Dec 2008
Peoplesoft Product Analyst

Education:

Bharathiar University College of Arts and Science 1999 - 2003
Bachelor of Engineering, Bachelors, Electronics Engineering

Skills:

Business Analysis
Vendor Management
Human Resources
Talent Acquisition
Management
Sdlc
Requirements Gathering
Consulting
Peoplesoft
Process Improvement
Business Process Improvement
Integration
Requirements Analysis
Technical Recruiting
Change Management
Software Development Life Cycle
Sql
Data Analysis
Testing
Oracle Applications
Project Management
Oracle
Erp
Business Intelligence
Analysis
Business Process
Peopletools

Languages:

English
Hindi
Tamil
French

Us Patents

Figurative Models Calibrated To Correct Errors In Process Models
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US Patent:

20180322228, Nov 8, 2018
Filed:

May 5, 2017
Appl. No.:

15/587602
Inventors:

- Grand Cayman, KY
Alan E. ROSENBLUTH - Yorktown Heights NY, US
Ramana Murthy PUSULURI - Bangalore, IN
Ramya VISWANATHAN - Austin TX, US
International Classification:

G06F 17/50
Abstract:

A method for correcting a lithographic pattern includes selecting, by a processor, first stage input factors for utilization with a first computer-implemented model. The processor measures pattern data from existing measured dimensions of a semiconductor to obtain values for the first stage input factors and the first model against the measured pattern data. The processor applies the calibrated first model to predict printed dimensions and the printed dimensions from applying the calibrated first model comprise residuals. The processor establishes, based on the residuals, second stage input factors for a second model and calibrates the second model against the measured pattern data to predict deviations of the printed dimensions from the printed dimensions from the first stage input factors by utilizing the second stage input factors. The method produces predicted printed dimensions of a lithographic pattern by using the second model to revise the printed dimensions of the first model.