Randall G Lee

US Patent:

6354438, Mar 12, 2002

Filed:

Aug 9, 1999

Appl. No.:

09/370753

Inventors:

Randall Grafton Lee - Byfield MA
Charles J. Libby - Winchester MA
Donald E. Yansen - Lexington MA
Gregory J. Athas - Newton MA
Raymond Hill - Rowley MA
Russell Mello - Stoneham MA

Assignee:

Micrion Corporation - Peabody MA

International Classification:

C23C 1454

US Classification:

20729836, 20429832, 156345, 2504921, 25049221, 25049222, 2504923

Abstract:

This invention relates to a multi-layer lithographically fabricated device used to produce improved thin-film recording heads. It further relates to a focused particle beam system for milling a recording head pole-tip assembly without irradiating a sensitive structure, e. g. a read head, of the recording head. The invention precisely forms a pole-tip assembly by milling a second structural element without irradiating a first structural element. The invention avoids irradiating the first structural element by placing a first marker element, which can be imaged and/or damaged, in the same layer of a multi-layer lithographically fabricated device as the first structural element. The marker element has a fixed spatial relationship to the first structural element. Thus, by imaging the first marker element and the second structural element, and knowing the separation between the first structural element and the first marker element, a focused particle beam system can determine the relative location of the first and second structural elements. Consequently, the focused particle beam system can determine, without irradiating the sensitive first structural element, which portions of the second structural element require milling.

US Patent:

6579665, Jun 17, 2003

Filed:

Feb 28, 2002

Appl. No.:

10/085490

Inventors:

Randall Grafton Lee - Byfield MA
Charles J. Libby - Winchester MA

Assignee:

FEI Company - Hillsboro OR

International Classification:

G11B 5127

US Classification:

430311, 430313, 430322, 360 55, 360110, 360122, 428694, 428692

Abstract:

This invention relates to a multi-layer lithographically fabricated device used to produce improved thin-film recording heads. It further relates to a focused particle beam system for milling a recording head pole-tip assembly without irradiating a sensitive structure, e. g. a read head, of the recording head. The invention precisely forms a pole-tip assembly by milling a second structural element without irradiating a first structural element. The invention avoids irradiating the first structural element by placing a first marker element, which can be imaged and/or damaged, in the same layer of a multi-layer lithographically fabricated device as the first structural element. The marker element has a fixed spatial relationship to the first structural element. Thus, by imaging the first marker element and the second structural element, and knowing the separation between the first structural element and the first marker element, a focused particle beam system can determine the relative location of the first and second structural elements. Consequently, the focused particle beam system can determine, without irradiating the sensitive first structural element, which portions of the second structural element require milling.

US Patent:

7032437, Apr 25, 2006

Filed:

Jan 22, 2004

Appl. No.:

10/763061

Inventors:

Randall Lee - Georgetown MA, US
Thomas Owen Mitchell - Fort Collins CO, US
Johannes Jacobus Lambertus Mulders - Eindhoven, NL

Assignee:

FEI Company - Hillsboro OR

International Classification:

G02B 5/28

US Classification:

73105, 250306, 250307

Abstract:

A method of fabricating a nanotube probe tip and the resultant probe tip, particularly for use in an atomic force microscope. A moderately sharply peaked support structure has its tip cut or flattened to have a substantially flat end of size of about 20 to 200 nm across. The support structure may be formed by etching a conical end into a silica optical fiber. Nickel or other catalyzing metal such as iron is directionally sputtered onto the flat end and the sloped sidewalls of the support structure. The nickel is anisotropically etched to remove all the nickel from the sidewalls but leaving at least 15 nm on the flat end to form a small nickel dot. A nanotube is then grown with the nickel catalyzing its growth such that only a single nanotube forms on the nickel dot and its diameter conforms to the size of the nickel dot. In another preferred embodiment of the invention, a catalyst material can be directly deposited on to the probe end using charged particle beam deposition, such as electron beam deposition.

US Patent:

7045275, May 16, 2006

Filed:

Jun 16, 2003

Appl. No.:

10/462389

Inventors:

Randall Grafton Lee - Byfield MA, US
Charles J. Libby - Winchester MA, US

Assignee:

FEI Company - Hillsboro OR

International Classification:

G11B 5/187
G03C 5/00

US Classification:

430296, 430397, 430 30, 430942, 430320

Abstract:

This invention relates to a multi-layer lithographically fabricated device used to produce improved thin-film recording heads. It further relates to a focused particle beam system for milling a recording head pole-tip assembly without irradiating a sensitive structure, e. g. a read head, of the recording head. The invention precisely forms a pole-tip assembly by milling a second structural element without irradiating a first structural element. The invention avoids irradiating the first structural element by placing a first marker element, which can be imaged and/or damaged, in the same layer of a multi-layer lithographically fabricated device as the first structural element. The marker element has a fixed spatial relationship to the first structural element. Thus, by imaging the first marker element and the second structural element, and knowing the separation between the first structural element and the first marker element, a focused particle beam system can determine the relative location of the first and second structural elements. Consequently, the focused particle beam system can determine, without irradiating the sensitive first structural element, which portions of the second structural element require milling.

US Patent:

60044373, Dec 21, 1999

Filed:

Mar 4, 1997

Appl. No.:

8/810837

Inventors:

Randall Grafton Lee - Byfield MA
Charles J. Libby - Winchester MA

Assignee:

Micrion Corporation - Peabody MA

International Classification:

C23F 102
C23C 1446
B23K 2606

US Classification:

20419234

Abstract:

This invention relates to a multi-layer lithographically fabricated device used to produce improved thin-film recording heads. It further relates to a focused particle beam system for milling a recording head pole-tip assembly without irradiating a sensitive structure, e. g. a read head, of the recording head. The invention precisely forms a pole-tip assembly by milling a second structural element without irradiating a first structural element. The invention avoids irradiating the first structural element by placing a first marker element, which can be imaged and/or damaged, in the same layer of a multi-layer lithographically fabricated device as the first structural element. The marker element has a fixed spatial relationship to the first structural element. Thus, by imaging the first marker element and the second structural element, and knowing the separation between the first structural element and the first marker element, a focused particle beam system can determine the relative location of the first and second structural elements. Consequently, the focused particle beam system can determine, without irradiating the sensitive first structural element, which portions of the second structural element require milling.