Richard C Devito

US Patent:

20050082480, Apr 21, 2005

Filed:

Aug 25, 2004

Appl. No.:

10/925860

Inventors:

Matthias Wagner - Cambridge MA, US
Ming Wu - Arlington MA, US
Nikolay Nemchuk - North Andover MA, US
Julie Cook - Newburyport MA, US
Richard DeVito - Saugus MA, US
Robert Murano - Melrose MA, US
Lawrence Domash - Conway MA, US

Assignee:

Aegis Semiconductor, Inc. - Wobum MA

International Classification:

G01J005/00

US Classification:

250338100

Abstract:

An IR camera system includes an array of thermally-tunable optical filter pixels, an NIR source and an NIR detector array. The IR camera system further includes IR optics for directing IR radiation from a scene to be imaged onto the array of thermally-tunable optical filter pixels and NIR optics for directing NIR light from the NIR source, to the filter pixels and to the NIR detector arrays. The NIR source directs NIR light onto the array of thermally-tunable optical filter pixels. The NIR detector array receives NIR light modified by the array of thermally-tunable optical filter pixels and for produces an electrical signal corresponding to the NIR light the NIR detector array receives.

US Patent:

20070023661, Feb 1, 2007

Filed:

Sep 19, 2006

Appl. No.:

11/523420

Inventors:

Matthias Wagner - Cambridge MA, US
Ming Wu - Arlington MA, US
Nikolay Nemchuk - North Andover MA, US
Julie Cook - Newburyport MA, US
Richard DeVito - Saugus MA, US
Robert Murano - Melrose MA, US
Lawrence Domash - Conway MA, US

Assignee:

RedShift Systems Corporation - Waltham MA

International Classification:

G01J 5/00

US Classification:

250338100

Abstract:

An IR camera system includes an array of thermally-tunable optical filter pixels, an NIR source and an NIR detector array. The IR camera system further includes IR optics for directing IR radiation from a scene to be imaged onto the array of thermally-tunable optical filter pixels and NIR optics for directing NIR light from the NIR source, to the filter pixels and to the NIR detector arrays. The NIR source directs NIR light onto the array of thermally-tunable optical filter pixels. The NIR detector array receives NIR light modified by the array of thermally-tunable optical filter pixels and produces an electrical signal corresponding to the NIR light the NIR detector array receives.

US Patent:

20070151842, Jul 5, 2007

Filed:

Dec 14, 2006

Appl. No.:

11/610665

Inventors:

Richard DeVito - Saugus MA, US
Martin Klein - Bedford MA, US
Piero Sferlazzo - Marblehead MA, US

Assignee:

FLUENS CORPORATION - Billerica MA

International Classification:

C23C 14/00
C23C 14/32

US Classification:

204192100, 204298020

Abstract:

A reactive sputtering system includes a vacuum chamber and a reactive ion source that is positioned inside the vacuum chamber. The reactive ion source generates a reactive ion beam from a reactant gas. A sputtering chamber is positioned in the vacuum chamber. The sputtering chamber includes a sputter source having a sputtering target that generates sputtering flux, walls that contain an inert gas, and a seal that impedes the reactant gas from entering into the sputtering chamber and that impedes inert gas and sputtered material from escaping into the vacuum chamber. A transport mechanism transports a substrate under the reactive ion source and through the sputtering chamber. The substrate is exposed to the reactive ion beam while passing under the reactive ion source and then is exposed to sputtering flux while passing through the sputtering chamber.

US Patent:

20120045588, Feb 23, 2012

Filed:

Aug 17, 2011

Appl. No.:

13/211884

Inventors:

Richard DeVito - Jamaica Plain MA, US

Assignee:

VAECO INC. - Jamaica Plain MA

International Classification:

C23C 14/35
C23C 14/14
C23C 14/04
C23C 14/34

US Classification:

427475, 42725528, 427569, 118723 R, 118720, 118715

Abstract:

A deposition method comprises flowing a first gas into a metallization zone maintained at a first pressure. A second gas flows into a reaction zone maintained at a second pressure. The second pressure is less than the first pressure. A rotating drum includes at least one substrate mounted to a surface of the drum. The surface alternately passes through the metallization zone and passes through the reaction zone. A target is sputtered in the metallization zone to create a film on the at least one substrate. The film on the at least one substrate is reacted in the reaction zone.

US Patent:

20200219704, Jul 9, 2020

Filed:

Mar 18, 2020

Appl. No.:

16/823046

Inventors:

Richard DEVITO - Jamaica Plain MA, US

International Classification:

H01J 37/32
C23C 14/14
C23C 14/12
C23C 14/54
C23C 14/50
C23C 14/00
H01J 37/34

Abstract:

In one aspect, a system for depositing a film on a substrate is disclosed, which comprises at least one metallization source for generating metal atoms, and at least one reactive source for generating at least one reactive species. The system further includes an inner cooling cylinder and a substrate cylinder, where the inner cooling cylinder is fixedly positioned relative to the substrate cylinder, and the substrate cylinder at least partially surrounds the inner cooling cylinder. At least one mount is coupled to the substrate cylinder for mounting one or more substrates to the substrate cylinder.

US Patent:

20190214234, Jul 11, 2019

Filed:

Mar 15, 2019

Appl. No.:

16/355405

Inventors:

Richard DEVITO - Jamaica Plain MA, US

International Classification:

H01J 37/32
C23C 14/12
H01J 37/34
C23C 14/00
C23C 14/50
C23C 14/14
C23C 14/54

Abstract:

In one aspect, a system of depositing a film on a substrate is disclosed, which includes at least one metallization source for generating metal atoms, and at least one reactive source for generating at least one reactive ionic species. The system further includes a pair of inner and outer concentric cylinders, where the outer cylinder has first and second openings positioned relative to the metallization source and the reactive source to allow entry of the metal atoms and the reactive ionic species into a metallization region and a reaction region, respectively, between the two cylinders. At least one mount is coupled to the inner cylinder for mounting the substrate thereto such that said substrate is in radiative thermal communication with the inner surface of the outer cylinder, said inner cylinder being rotatable for moving the substrate between the two regions so as to expose the substrate alternatingly to said metal atoms and said reactive ionic species. Further, the outer cylinder includes at least one cooling channel through which a cooling fluid can flow for maintaining the inner surface of the outer cylinder at a temperature suitable for radiative cooling of the substrate.

US Patent:

20170117119, Apr 27, 2017

Filed:

Oct 21, 2016

Appl. No.:

15/331091

Inventors:

Richard DeVito - Jamaica Plain MA, US

International Classification:

H01J 37/32
C23C 14/12
H01J 37/34
C23C 14/50
C23C 14/00
C23C 14/14
C23C 14/54

Abstract:

In one aspect, a system of depositing a film on a substrate is disclosed, which includes at least one metallization source for generating metal atoms, and at least one reactive source for generating at least one reactive ionic species. The system further includes a pair of inner and outer concentric cylinders, where the outer cylinder has first and second openings positioned relative to the metallization source and the reactive source to allow entry of the metal atoms and the reactive ionic species into a metallization region and a reaction region, respectively, between the two cylinders. At least one mount is coupled to the inner cylinder for mounting the substrate thereto such that said substrate is in radiative thermal communication with the inner surface of the outer cylinder, said inner cylinder being rotatable for moving the substrate between the two regions so as to expose the substrate alternatingly to said metal atoms and said reactive ionic species. Further, the outer cylinder includes at least one cooling channel through which a cooling fluid can flow for maintaining the inner surface of the outer cylinder at a temperature suitable for radiative cooling of the substrate.

US Patent:

20140262765, Sep 18, 2014

Filed:

May 23, 2014

Appl. No.:

14/286894

Inventors:

- Jamaica Plain MA, US
Richard DeVito - Jamaica Plain MA, US

Assignee:

Vaeco, Inc. - Jamaica Plain MA

International Classification:

H01J 37/32
H01J 37/34

US Classification:

20429811, 20429826, 20429816

Abstract:

A deposition method comprises flowing a first gas into a metallization zone maintained at a first pressure. A second gas flows into a reaction zone maintained at a second pressure. The second pressure is less than the first pressure. A rotating drum includes at least one substrate mounted to a surface of the drum. The surface alternately passes through the metallization zone and passes through the reaction zone. A target is sputtered in the metallization zone to create a film on the at least one substrate. The film on the at least one substrate is reacted in the reaction zone.