Richard C Farrell

US Patent:

51601907, Nov 3, 1992

Filed:

May 20, 1991

Appl. No.:

7/703188

Inventors:

Richard B. Farrell - New York NY
David P. Orlowski - Clinton MI

Assignee:

Automated Storage & Retrieval Systems of America Inc. - New York NY

International Classification:

A47B 8800

US Classification:

312201

Abstract:

A detection system is disclosed for a mobile storage system which causes the storage system to prevent movement of a storage element whenever a person is detected in an aisle between storage elements. The detection system uses a presence or motion detector for detecting the presence of a person in an open aisle without direct contact between the person and the detection system. Preferably, a radar transceiver operating in X-band is positioned to overlie each open aisle to detect presence of movement of a person in an open aisle, even slight movement such as breathing. The storage system in which the detection system is connected prevents any closing movement of a storage element adjacent an aisle in which a person is detected so as to avoid frightening the person in the aisle.

US Patent:

41463340, Mar 27, 1979

Filed:

Sep 9, 1977

Appl. No.:

5/831807

Inventors:

Richard Farrell - Williston Park NY

International Classification:

B65D 6132

US Classification:

366192

Abstract:

The pneumatically operated apparatus includes a transparent, calibrated paint container to facilitate measuring of the required proportions of color and solvents. A vertically displaceable and rotatable member extends through and seals an opening in the bottom of the container. The member has a hollow body forming a paint passage. An agitator is sealingly mounted on the end thereof extending through the opening and into the container, the other end being opened. An aperture is provided in the wall of the member spaced a short distance from the agitator. A friction surface is provided for connecting a pneumatically operated drive to the member to rotate same. The member is vertically displaceable between a mixing position, wherein the friction surface is effective to engage the member and rotate same and the aperture is situated below the container seal to prevent paint flow and a dispensing position, wherein the friction surface is disengaged from the member and the aperture is at least partially situated above the seal in the container, so as to provide a passage to permit gravity to cause the paint to flow through the body and out the bottom opened end thereof.

US Patent:

50695134, Dec 3, 1991

Filed:

Sep 27, 1990

Appl. No.:

7/589322

Inventors:

Richard B. Farrell - New York NY
James H. Rogers - Middle Village NY

Assignee:

Automated Storage & Retrieval Systems of America - New York NY

International Classification:

A47B 5300

US Classification:

312201

Abstract:

A safety floor construction comprising plural floor sections suspended on springs such that each floor section is depressed whenever a person stands on that floor section while in an aisle between carriages. One or more safety switches are mounted on each carriage. The switch actuators engage the floor sections. When a floor section is depressed by a user, the switch is actuated and interrupts the motor drive circuit for the carriages. Thus, the adjacent carriages cannot move. The movable floor is constituted of individual reinforced plywood panels provided at their edges with metal which are contacted by the spring supports. Moreover, the floor panel spring supports are mounted under the rail attached to the sub floor and require no attachment to the panel.

US Patent:

20220236639, Jul 28, 2022

Filed:

Jan 22, 2021

Appl. No.:

17/155931

Inventors:

- Tokyo, JP
Richard Farrell - Albany NY, US

International Classification:

G03F 7/00
C09D 153/00
C08L 53/00
C08L 25/06
B81C 1/00

Abstract:

A method for forming a device includes blending, in a mixer within a fabrication facility, a first liquid including a first block copolymer with a second liquid including a second block copolymer to form a first mixture. The first block copolymer includes a first homopolymer and a second homopolymer, where the first homopolymer has a first mole fraction in the first liquid. The second block copolymer includes the first homopolymer and the second homopolymer, the first homopolymer having a second mole fraction in the second liquid, the first mole fraction being different from the second mole fraction. The method includes placing a substrate over a substrate holder of a processing chamber within the fabrication facility; and coating the substrate with the first mixture within the processing chamber.

US Patent:

20210407804, Dec 30, 2021

Filed:

Jun 30, 2020

Appl. No.:

16/916452

Inventors:

- Tokyo, JP
Richard Farrell - Albany NY, US

International Classification:

H01L 21/033
G03F 7/09
G03F 7/11
G03F 7/20
G03F 7/26
H01L 21/027

Abstract:

A method of forming a device includes forming a hard mask layer over an underlying layer of a substrate, forming an anti-reflective coating layer over the hard mask layer, forming a patterned resist layer over the anti-reflective coating layer, and forming a mandrel including the anti-reflective coating layer by patterning the anti-reflective coating layer using the patterned resist layer as an etch mask. The method includes forming a sidewall spacer on the mandrel including the anti-reflective coating layer, forming a freestanding spacer on the hard mask layer by removing the mandrel from the anti-reflective coating layer, and using the freestanding spacer as an etch mask, patterning the underlying layer of the substrate.

US Patent:

20210088904, Mar 25, 2021

Filed:

Sep 17, 2020

Appl. No.:

17/023470

Inventors:

- Tokyo, JP
Jodi GRZESKOWIAK - Schenectady NY, US
Daniel FULFORD - Ballston Lake NY, US
Richard A. FARRELL - Nassau NY, US
Jeffrey SMITH - Clifton Park NY, US

Assignee:

Tokyo Electron Limited - Tokyo

International Classification:

G03F 7/039
H01L 21/027
G03F 7/16
G03F 7/30
G03F 7/20

Abstract:

A method of forming a pattern on a substrate is provided. The method includes forming a first layer on an underlying layer of the substrate, where the first layer is patterned to have a first structure. The method also includes depositing a grafting material on side surfaces of the first structure, where the grafting material includes a solubility-shifting material. The method further includes diffusing the solubility-shifting material by a predetermined distance into a neighboring structure that abuts the solubility-shifting material, where the solubility-shifting material changes solubility of the neighboring structure in a developer, and removing soluble portions of the neighboring structure using the developer to form a second structure.

US Patent:

20210057226, Feb 25, 2021

Filed:

Jul 24, 2020

Appl. No.:

16/938049

Inventors:

- Tokyo, JP
Eric Chih-Fang Liu - Albany NY, US
Richard Farrell - Albany NY, US
Soo Doo Chae - Albany NY, US

International Classification:

H01L 21/3065
H01L 21/02
H01L 21/033

Abstract:

A method of patterning a substrate includes receiving a substrate having microfabricated structures, including mandrels; executing a deposition process that deposits a first material on the mandrels, the deposition process including cyclically moving the substrate through a set of deposition modules. The substrate is moved through the set of deposition modules so that the first material is deposited at a first thickness at top portions of the mandrels and at a second thickness at bottom portions of mandrels, the first thickness being greater than the second thickness. The method includes executing a spacer deposition process that conformally deposits a second material on the substrate; executing a spacer open etch that removes depositions of the second material from over a top surface of the mandrels; removing the first material and the mandrels from the substrate, leaving sidewall spacers; and transferring a pattern defined by the sidewall spacers into an underlying layer.

US Patent:

20190295846, Sep 26, 2019

Filed:

Mar 18, 2019

Appl. No.:

16/356477

Inventors:

- Tokyo, JP
Richard Farrell - Albany NY, US
Kandabara Tapily - Albany NY, US
Angelique Raley - Albany NY, US
Sophie Thibaut - Albany NY, US

International Classification:

H01L 21/033
H01L 21/308
H01L 21/66
H01L 21/67
H01L 21/677

Abstract:

A method is provided for self-aligned multi-patterning on a semiconductor workpiece using an integrated sequence of processing steps executed on a common manufacturing platform hosting film-forming modules, etching modules, and transfer modules. A workpiece having a mandrel pattern formed thereon is received into the common manufacturing platform. A sidewall spacer pattern is formed based, at least in part, on the mandrel pattern, the sidewall spacer pattern having a plurality of second features separated by a second pitch distance with the first pitch distance being greater than the second pitch distance. The integrated sequence of processing steps is executed within the common manufacturing platform without leaving the controlled environment and the transfer modules are used to transfer the workpiece between the processing modules while maintaining the workpiece within the controlled environment. Broadly, using selective/conformal deposition, etching, or implanting techniques to form a sidewall spacer pattern on a common manufacturing platform.