A method for preparing a sample includes separating a portion of substrate from a sample, performing focused ion beam milling, and removing additional sample material using an etchant.
Richard B. Irwin - Richardson TX, US Tony T. Phan - Flower Mound TX, US Jennifer S. Dumin - Wylie TX, US Patrick J. Jones - Allen TX, US Fredric D. Bailey - Irving TX, US
Assignee:
Texas Instruments Incorporated - Dallas TX
International Classification:
H01L027/95
US Classification:
257478, 257473
Abstract:
An embodiment of the invention is a Schottky diode having a semiconductor substrate , a first metal , a barrier layer , and second metal. Another embodiment of the invention is a method of manufacturing a Schottky diode that includes providing a semiconductor substrate , forming a barrier layer over the semiconductor substrate , forming a first metal layer over the semiconductor substrate , annealing the semiconductor substrate to form areas of reacted first metal and areas of un-reacted first metal, and removing selected areas of the un-reacted first metal. The method further includes forming a second metal layer over the semiconductor substrate and annealing the semiconductor substrate to form areas of reacted second metal and areas of un-reacted second metal.
Method Of Manufacturing A Dual Metal Schottky Diode
Richard B. Irwin - Richardson TX, US Tony T. Phan - Flower Mound TX, US Jennifer S. Dumin - Wylie TX, US Patrick J. Jones - Allen TX, US Fredric D. Bailey - Irving TX, US
An embodiment of the invention is a Schottky diode having a semiconductor substrate , a first metal , a barrier layer , and second metal. Another embodiment of the invention is a method of manufacturing a Schottky diode that includes providing a semiconductor substrate , forming a barrier layer over the semiconductor substrate , forming a first metal layer over the semiconductor substrate , annealing the semiconductor substrate to form areas of reacted first metal and areas of un-reacted first metal, and removing selected areas of the un-reacted first metal. The method further includes forming a second metal layer over the semiconductor substrate and annealing the semiconductor substrate to form areas of reacted second metal and areas of un-reacted second metal.
Dummy-Fill-Structure Placement For Improved Device Feature Location And Access For Integrated Circuit Failure Analysis
Jeffrey Large - Dallas TX, US Tathagata Chatterjee - Allen TX, US Richard Irwin - Richardson TX, US
Assignee:
Texas Instruments Inc. - Dallas TX
International Classification:
H01L 23/544 H01L 21/4763
US Classification:
257758000, 257797000, 438622000, 438401000
Abstract:
An integrated circuit comprising interconnects located in a layer on a semiconductor substrate. The circuit also comprises dummy-fill-structures located between the interconnects in the layer. The dummy-fill-structures form a plurality of fiducials, each of the fiducials being located in a different region of the layer. Each fiducial comprises a pre-defined recognition pattern that is different from every other fiducial in adjacent regions of the layer.
Structure And Method For Coupling Heat To An Embedded Thermoelectric Device
Richard B. Irwin - Richardson TX, US Tathagata Chatterjee - Allen TX, US
International Classification:
H01L 35/30 H01L 35/34
US Classification:
136207, 438 54, 136201
Abstract:
An integrated circuit with an embedded heat exchanger for coupling heat to an embedded thermoelectric device from a thermal source that is electrically isolated from a thermoelectric device. A method for forming an integrated circuit with an embedded heat exchanger.
Dr. Irwin graduated from the Tufts University School of Medicine in 1968. He works in Worcester, MA and specializes in Pulmonary Critical Care Medicine. Dr. Irwin is affiliated with UMASS Memorial Medical Center.